Patents by Inventor Marc Léon Van Der Gaag

Marc Léon Van Der Gaag has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patterning device cooling systems in a lithographic apparatus
    Patent number: 10281830
    Abstract: A lithographic apparatus (100) includes a patterning device support structure (104) configured to support a patterning device (110), a gas inlet (116) configured to provide a gas flow (114) across a surface of the patterning device, and a temperature conditioning device (134) configured to condition the temperature of the gas flow based on a set point. The apparatus also includes a sensor (132) configured to measure a parameter indicative of an amount of heat added to at least one of the patterning device and a volume (126) between the patterning device and a lens (124) of a projection system (106) during operational use of the lithographic system. Further, the apparatus includes a controller (130) operatively coupled to the sensor and configured to adjust the set point based on the parameter measured by the sensor to control a temperature of the patterning device.
    Type: Grant
    Filed: June 17, 2016
    Date of Patent: May 7, 2019
    Assignees: ASML Netherlands B.V., ASML Holding N.V.
    Inventors: Laurentius Johannes Adrianus Van Bokhoven, Christopher Charles Ward, Marc Léon Van Der Gaag, Johan Gertrudis Cornelis Kunnen
  • PATTERNING DEVICE COOLING SYSTEMS IN A LITHOGRAPHIC APPARATUS
    Publication number: 20180196360
    Abstract: A lithographic apparatus (100) includes a patterning device support structure (104) configured to support a patterning device (110), a gas inlet (116) configured to provide a gas flow (114) across a surface of the patterning device, and a temperature conditioning device (134) configured to condition the temperature of the gas flow based on a set point. The apparatus also includes a sensor (132) configured to measure a parameter indicative of an amount of heat added to at least one of the patterning device and a volume (126) between the patterning device and a lens (124) of a projection system (106) during operational use of the lithographic system. Further, the apparatus includes a controller (130) operatively coupled to the sensor and configured to adjust the set point based on the parameter measured by the sensor to control a temperature of the patterning device.
    Type: Application
    Filed: June 17, 2016
    Publication date: July 12, 2018
    Applicants: ASML Netherlands B.V., ASML Holding N.V.
    Inventors: Laurentius Johannes Adrianus VAN BOKHOVEN, Christopher Charles WARD, Marc Léon VAN DER GAAG, Johan Gertrudis Cornelis KUNNEN
  • Pump system, a carbon dioxide supply system, an extraction system, a lithographic apparatus and a device manufacturing method
    Patent number: 9575406
    Abstract: An extraction system, including a pump to pump gas along a conduit to a check valve configured to open at an upstream pressure over a certain magnitude, a pressure sensor to generate a signal indicative of a pressure of gas between the pump and the check valve, and a controller configured to generate a stop signal if a signal from the pressure sensor indicates that the pressure of gas between the pump and the check valve is below a certain magnitude.
    Type: Grant
    Filed: December 13, 2012
    Date of Patent: February 21, 2017
    Assignee: ASML NETHERLANDS B.V.
    Inventors: Marc Léon Van Der Gaag, Leonarda Hendrika Van Den Heuvel, Arjan Hubrecht Josef Anna Martens, Frank Johannes Jacobus Van Boxtel
  • PUMP SYSTEM, A CARBON DIOXIDE SUPPLY SYSTEM, AN EXTRACTION SYSTEM, A LITHOGRAPHIC APPARATUS AND A DEVICE MANUFACTURING METHOD
    Publication number: 20130155380
    Abstract: An extraction system, including a pump to pump gas along a conduit to a check valve configured to open at an upstream pressure over a certain magnitude, a pressure sensor to generate a signal indicative of a pressure of gas between the pump and the check valve, and a controller configured to generate a stop signal if a signal from the pressure sensor indicates that the pressure of gas between the pump and the check valve is below a certain magnitude.
    Type: Application
    Filed: December 13, 2012
    Publication date: June 20, 2013
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Marc Léon Van Der Gaag, Leonarda Hendrika Van Den Heuvel, Arjan Hubrecht Josef Anna Martens, Frank Johannes Jacobus Van Boxtel