Patents by Inventor Marc Lagarde

Marc Lagarde has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 8389674
    Abstract: Disclosed are systems and methods for producing a polymer dispersion based on polychloroprene, comprising steps of polymerizing chloroprene to polychloroprene, adding the polycholoprene dispersion to a stripper column, and removing chloroprene from the polychloroprene dispersion.
    Type: Grant
    Filed: June 7, 2012
    Date of Patent: March 5, 2013
    Assignee: Lanxess Deutschland GmbH
    Inventors: Pascal Debayle, Peter Hoeltzenbein, Renke Mottweiler, Eberhardt Muller, Rainer Grafe, Christian Mahner-Wolfarth, Thomas-Oliver Neuner, Mesut Fidan, Marc Lagarde
  • Publication number: 20120309893
    Abstract: Disclosed are systems and methods for producing a polymer dispersion based on polychloroprene, comprising steps of polymerizing chloroprene to polychloroprene, adding the polycholoprene dispersion to a stripper column, and removing chloroprene from the polychloroprene dispersion.
    Type: Application
    Filed: June 7, 2012
    Publication date: December 6, 2012
    Applicant: LANXESS DEUTSCHLAND GMBH
    Inventors: Pascal DEBAYLE, Peter HOELTZENBEIN, Renke MOTTWEILER, Eberhardt MULLER, Rainer GRAFE, Christian MAHNER-WOLFARTH, Thomas-Oliver NEUNER, Mesut FIDAN, Marc LAGARDE
  • Patent number: 5209955
    Abstract: Disclosed is a spatial light modulator of the type associating a layer of liquid crystal (2) with a layer of a photoconductive material (1), the photoconductive material being based on polysilane or polygermane.
    Type: Grant
    Filed: April 25, 1991
    Date of Patent: May 11, 1993
    Assignee: Thomson-CSF
    Inventors: Dominique Broussoux, Jean-Luc Ayral, Marc Lagarde
  • Patent number: 5200487
    Abstract: Disclosed is a process for the synthesizing of polysilsesquioxane, including a first step for the hydrolysis, in the presence of ether, of trichlorosilane with the general formula RSiCl.sub.3 where R represents an organic radical, notably an alkyl, an aryl, a vinyl or an allyl, said process further including the following steps;2nd step: the dissolving of the solid product obtained at the end of the first step in an anhydrous ketonic solvent and the addition of a base, the reaction taking place under heat, a solid product being obtained after evaporation and drying;3rd step: the dissolving of the solid product obtained at the end of the second step in an anyhydrous ketone, the addition of a chain-terminating agent, the reaction taking place under heat and the solution obtained being filtered, evaporated and dried to give the desired polysilsesquioxane,wherein the second step is repeated several times.
    Type: Grant
    Filed: December 20, 1990
    Date of Patent: April 6, 1993
    Assignee: Thomson-CSF
    Inventors: Marc Lagarde, Dominique Broussoux, Jean-Claude Dubois