Abstract: One embodiment of the present invention can include a flow control device that comprises an inlet, an outlet in fluid communication with the inlet, a pressure sensor, which may or may not be the only pressure sensor of the fluid control device, and a controller coupled to the pressure sensor. The controller can be configured to generate a valve control signal based on a measured pressure at a single pressure sensor.

Abstract: One embodiment of the present invention can include a flow control device a flow control device that comprises an inlet, an outlet in fluid communication with the inlet, a pressure sensor, which may or may not be the only pressure sensor of the fluid control device, and a controller coupled to the pressure sensor. The controller can be configured to generate a valve control signal based on a measured pressure at a single pressure sensor.

Abstract: Embodiments disclosed herein provide a non-intrusive thermal (NIT) monitor for sensing temperatures useful for semiconductor manufacturing applications. In some embodiments, a NIT monitor comprises a thermopile, a fluid housing with a fluid window, and an elongated member positioned between the thermopile and the fluid window for transmitting or reflecting infrared signals corresponding to a temperature of a fluid in the fluid housing. The fluid housing may have a cross-sectional profile to enable the manipulation of the fluid flow under the fluid window, enhancing the speed and accuracy of the temperature sampling. The elongated member, which may be hollow and coated with gold, may an extended piece of the fluid housing or a part of an optics housing. In some embodiments, the NIT monitor is connected to a main conditioning circuit board via a cable for processing the temperature measurements at a remote location.

Abstract: One embodiment of the present invention can include a flow control device comprising an inlet, an outlet, a pressure loss element between the inlet and outlet, a pressure sensor located upstream from the constriction configured to measure a first pressure of a fluid flowing through the flow control device, a pressure sensor located downstream from the constriction, configured to measure a second pressure of the fluid flowing through the flow control device; and a controller coupled to the first pressure sensor and the second pressure sensor to generate a valve drive signal. The controller can generate a valve control signal based on a differential between the first pressure and the second pressure during a first mode of operation. The controller can also generate a valve control signal based on a measured pressure at a particular pressure sensor during a second mode of operation. The mode of operation can automatically switch.

Abstract: Apparatus and a control system for monitoring (preferably digitally) and/or controlling pressure to a pneumatic load such as a proportional fluid control valve and using a measurement input from a fluid measurement device that responds to a flow rate, the liquid measurement input being used to control the pressure to the pneumatic load so that pneumatic load may be increased or decreased (to proportionally open or close the pneumatic valve) to change the flow rate of the fluid to a desired rate. The pneumatic load can also be adjusted (to proportionally open or close the pneumatic valve) to accommodate changes in temperature and viscosity of a fluid.

Abstract: The present invention provides a liquid filtration device with internal flow paths that facilitate the purging of air bubbles from the device. The device includes internal channels that collect bubbles from fluid entering the filtration device and more efficiently direct fluid to sweep bubbles from the device during operation. The present invention also provides for an automatic means to minimize fluid loss during a vent process.

Abstract: Apparatus and a control system for monitoring (preferably digitally) and/or controlling pressure to a pneumatic load such as a proportional fluid control valve and using a measurement input from a fluid measurement device that responds to a flow rate, the liquid measurement input being used to control the pressure to the pneumatic load so that pneumatic load may be increased or decreased (to proportionally open or close the pneumatic valve) to change the flow rate of the fluid to a desired rate. The pneumatic load can also be adjusted (to proportionally open or close the pneumatic valve) to accommodate changes in temperature and viscosity of a fluid.

Abstract: Embodiments of the present, invention provide a system and method for reducing the hold-up volume of a pump. More particularly, embodiments of the present invention provide a system and method for determining a home position to reduce hold-up volume at a dispense pump and/or a feed pump. The home position for the diaphragm can be selected such that the volume of the chamber at the dispense pump and/or feed pump contains sufficient fluid to perform the various steps of a dispense cycle while minimizing the hold-up volume. Additionally, the home position of the diaphragm can be selected to optimize the effective range of positive displacement.

Abstract: A stationary receptor for a separation module is positioned between a pump housing and the separation module. The stationary receptor has a pivot line and two shelves on its outer surface which permit fitting the separation module into the stationary receptor adjacent the pump housing. The separation module has a housing, a filter within the housing and at least one outlet and one inlet, which are positioned to mate with fittings of the pump housing.

Abstract: The present invention provides a liquid filtration device with internal flow paths that facilitate the purging of air bubbles from the device. The device includes internal channels that collect bubbles from fluid entering the filtration device and more efficiently direct fluid to sweep bubbles from the device during operation. The present invention also provides for an automatic means to minimize fluid loss during a vent process.

Abstract: Systems and methods for controlling fluid flow in an immersion lithography system. The system includes a fluid flow path that allows fluid to flow from a source through a fluid retention hood and then a fluid control valve. The system includes a pressure sensing system for determining a pressure drop across the fluid retention hood. The pressure drop across the fluid retention hood changes with the fluid flow rate. A control system receives signals indicating the pressure drop across the fluid retention hood and produces control signals for the fluid control valve. The control signals adjust the fluid flow rate through the fluid control valve to drive the flow rate to a desired rate, thereby driving the sensed pressure drop across the fluid retention hood to a desired pressure drop.

Abstract: Embodiments disclosed herein provide a non-intrusive thermal (NIT) monitor for sensing temperatures useful for semiconductor manufacturing applications. In some embodiments, a NIT monitor comprises a thermopile, a fluid housing with a fluid window, and an elongated member positioned between the thermopile and the fluid window for transmitting or reflecting infrared signals corresponding to a temperature of a fluid in the fluid housing. The fluid housing may have a cross-sectional profile to enable the manipulation of the fluid flow under the fluid window, enhancing the speed and accuracy of the temperature sampling. The elongated member, which may be hollow and coated with gold, may an extended piece of the fluid housing or a part of an optics housing. In some embodiments, the NIT monitor is connected to a main conditioning circuit board via a cable for processing the temperature measurements at a remote location.

Abstract: Embodiments of the present invention provide a system and method for rapid calibration of a flow device. A flow device can be provided with a calibration flow curve (e.g., represented by an nth degree polynomial) by the manufacturer or a third party. The calibration curve can be adjusted for a process fluid and the system for which the flow device is actually installed using one or more correction factors. The correction factors can be determined for the flow curve based on a simple empirical test or fluid properties of the process fluid. The corrected flow curve is then saved at the flow device so that it can be used for future flow control.

Abstract: Embodiments disclosed herein provide a pump or a multiple-pump system that can mix chemicals without dilution tanks and can dispense the mixture of chemicals in a precise and highly controllable manner, particularly useful in semiconductor manufacturing processes. In some embodiments, one or more piston pumps of similar displacement are used to mix and dispense the chemical directly. A first valve is opened to a first chemical source. A piston is moved in a first direction to a selected position in a chamber to draw the first chemical into the chamber. The first valve is closed and a second valve is opened to a second chemical source. The piston is moved in the first direction to a second position in the chamber to draw in the second chemical and mix the chemicals. The second valve is closed and the piston is moved to dispense the fluids through a dispense port.

Abstract: The present invention provides a liquid filtration device with internal flow paths that facilitate the purging of air bubbles from the device. The device includes internal channels that collect bubbles from fluid entering the filtration device and more efficiently direct fluid to sweep bubbles from the device during operation. The present invention also provides for an automatic means to minimize fluid loss during a vent process.

Abstract: Embodiments of the present invention provide systems and methods of controlling fluid dispense to ensure clean break off of fluid at the end of a dispense process and to reduce crystallization of fluid in the dispense nozzle. One embodiment of the present invention can include a controller that can, generate a flow control signal to cause a control valve to close according to a first close rate parameter for a first segment of the close range and to generate the flow control signal to cause the control valve to close according to a second close rate parameter for a second segment of the close range.

Abstract: Systems and methods for controlling fluid flow in an immersion lithography system. The system includes a fluid flow path that allows fluid to flow from a source through a fluid retention hood and then a fluid control valve. The system includes a pressure sensing system for determining a pressure drop across the fluid retention hood. The pressure drop across the fluid retention hood changes with the fluid flow rate. A control system receives signals indicating the pressure drop across the fluid retention hood and produces control signals for the fluid control valve. The control signals adjust the fluid flow rate through the fluid control valve to drive the flow rate to a desired rate, thereby driving the sensed pressure drop across the fluid retention hood to a desired pressure drop.

Abstract: Embodiments of the present invention provide systems and methods of controlling fluid dispense to ensure clean break off of fluid at the end of a dispense process and to reduce crystallization of fluid in the dispense nozzle. One embodiment of the present invention can include a controller that can, generate a flow control signal to cause a control valve to close according to a first close rate parameter for a first segment of the close range and to generate the flow control signal to cause the control valve to close according to a second close rate parameter for a second segment of the close range.

Abstract: Systems and methods for reducing temperature variations induced by fluid handling equipment in process fluids by separating heat-producing portions of the control equipment from portions of the equipment which handle or are in close proximity to a fluid flow path. In one embodiment, the fluid handling components are contained in a first enclosure, while the heat-generating components are contained in a second enclosure. An air gap is maintained between the two enclosures to provide thermal isolation of the fluid handling components from the heat-generating components. In one embodiment, the air gap is maintained by connecting the two enclosures using insulating spacers. Interconnects between components in the two enclosures may be routed through an insulating tube that is sealed at each end to prevent heat transfer through the tube.

Abstract: The present invention provides a liquid filtration device with internal flow paths that facilitate the purging of air bubbles from the device. The device includes internal channels that collect bubbles from fluid entering the filtration device and more efficiently direct fluid to sweep bubbles from the device during operation. The present invention also provides for an automatic means to minimize fluid loss during a vent process.