Abstract: A system and method for optimizing and implementing a metrology sampling plan. A system is provided that includes a system for collecting historical metrology data from a metrology tool; and a reduction analysis system that compares an initial capability calculated from the historical metrology data with a recalculated capability for a reduced data set, wherein the reduced data set is obtained by removing a subset of data from the historical metrology data.

Abstract: A method for correcting misalignment between a reticle and a stage in a MICRASCAN step-and-repeat exposure system. In such a system, the reticle and the stage lie in parallel X-Y planes and there are at least two temperature sensors associated with the reticle, sensor 1 and sensor 2, sensor 1 having a sensor 1 temperature output and sensor 2 having a sensor 2 temperature output. The method comprises the steps of estimating an X shift and a Y shift of the reticle relative to the stage using the sensor 1 temperature output and sensor 2 temperature output and correcting misalignment between the reticle and the stage using the estimated X and Y shifts.