Patents by Inventor Marc S. Lucas

Marc S. Lucas has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 6320644
    Abstract: Misalignment errors in a lithographic system resulting from the effect of environmental changes on the lens system itself are detected and corrected. A fiducial on the reticle adjacent to its working area is projected through the lens. A metrology plate carried by the lens holds reference mirrors and detectors. The reference mirrors receive the resultant image and reflect it to detectors in a reflected image plane. This provides feedback to the reticle alignment system as to the extent of misalignment, if any. Correction is made by moving the reticle until alignment is achieved and detected. This motion is achieved by using a reticle chuck with linear motors.
    Type: Grant
    Filed: April 18, 1994
    Date of Patent: November 20, 2001
    Inventors: Craig R. Simpson, Marc S. Lucas