Patents by Inventor Marc Smits
Marc Smits has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
-
Patent number: 11961698Abstract: Disclosed herein is a module for supporting a device configured to manipulate charged particle paths in a charged particle apparatus, the module comprising: a support arrangement configured to support the device, wherein the device is configured to manipulate a charged particle path within the charged particle apparatus; and a support positioning system configured to move the support arrangement within the module; wherein the module is arranged to be field replaceable in the charged particle apparatus.Type: GrantFiled: June 10, 2021Date of Patent: April 16, 2024Assignee: ASML Netherlands B.V.Inventors: Christiaan Otten, Peter-Paul Crans, Marc Smits, Laura Del Tin, Christan Teunissen, Yang-Shan Huang, Stijn Wilem Herman Karel Steenbrink, Xuerang Hu, Qingpo Xi, Xinan Luo, Xuedong Liu
-
METHOD AND SYSTEM FOR THE REMOVAL AND/OR AVOIDANCE OF CONTAMINATION IN CHARGED PARTICLE BEAM SYSTEMS
Publication number: 20240017301Abstract: A charged particle beam system is disclosed, comprising: a charged particle beam generator for generating a beam of charged particles; a charged particle optical column arranged in a vacuum chamber, wherein the charged particle optical column is arranged for projecting the beam of charged particles onto a target, and wherein the charged particle optical column comprises a charged particle optical element for influencing the beam of charged particles; a source for providing a cleaning agent; a conduit connected to the source and arranged for introducing the cleaning agent towards the charged particle optical element; wherein the charged particle optical element comprises: a charged particle transmitting aperture for transmitting and/or influencing the beam of charged particles, and at least one vent hole for providing a flow path between a first side and a second side of the charged particle optical element, wherein the vent hole has a cross section which is larger than a cross section of the chaType: ApplicationFiled: July 27, 2023Publication date: January 18, 2024Inventors: Marc SMITS, Johan Joost KONING, Chris Franciscus Jessica LODEWIJK, Hindrik Willem MOOK, Ludovic LATTARD -
Method and system for the removal and/or avoidance of contamination in charged particle beam systems
Patent number: 11738376Abstract: A charged particle beam system is disclosed, comprising: a charged particle beam generator for generating a beam of charged particles; a charged particle optical column arranged in a vacuum chamber, wherein the charged particle optical column is arranged for projecting the beam of charged particles onto a target, and wherein the charged particle optical column comprises a charged particle optical element for influencing the beam of charged particles; a source for providing a cleaning agent; a conduit connected to the source and arranged for introducing the cleaning agent towards the charged particle optical element; wherein the charged particle optical element comprises: a charged particle transmitting aperture for transmitting and/or influencing the beam of charged particles, and at least one vent hole for providing a flow path between a first side and a second side of the charged particle optical element, wherein the vent hole has a cross section which is larger than a cross section of the chaType: GrantFiled: April 22, 2021Date of Patent: August 29, 2023Assignee: ASML Netherlands, B.V.Inventors: Marc Smits, Johan Joost Koning, Chris Franciscus Jessica Lodewijk, Hindrik Willem Mook, Ludovic Lattard -
Publication number: 20230207252Abstract: Disclosed herein is an actuator arrangement comprising: a wall defining a cavity; a casing protruding from the wall and defining an interior in fluid communication with the cavity; an actuator comprising: a force imparter configured to impart force on a component in the cavity; and an actuation mechanism configured to drive the force imparter, wherein at least part of the actuation mechanism is within said interior of the casing and exposed to the cavity; and a control element configured to control the actuation mechanism, wherein the control element extends through the casing via a seal.Type: ApplicationFiled: February 13, 2023Publication date: June 29, 2023Applicant: ASML Netherlands B.V.Inventors: Derk Ferdinand WALVOORT, Marc SMITS, Teunis VAN DE PEUT
-
Publication number: 20230107989Abstract: Disclosed herein is a module for supporting a device configured to manipulate charged particle paths in a charged particle apparatus, the module comprising: a support arrangement configured to support the device, wherein the device is configured to manipulate a charged particle path within the charged particle apparatus; and a support positioning system configured to move the support arrangement within the module; wherein the module is arranged to be field replaceable in the charged particle apparatus.Type: ApplicationFiled: December 9, 2022Publication date: April 6, 2023Applicant: ASML Netherlands B.V.Inventors: Christiaan OTTEN, Peter-Paul CRANS, Marc SMITS, Laura DEL TIN, Christan TEUNISSEN, Yang-Shan HUANG, Stijn Wilem Herman Karel STEENBRINK, Xuerang HU, Qingpo XI, Xinan LUO, Xuedong LIU
-
Patent number: 11599028Abstract: Methods and arrangement for clamping substrates to a support using adhesive material area disclosed. The method comprises providing a support comprising a first surface defining a plane; applying adhesive material on at least portions of the first surface; and placing the substrate onto the adhesive material, wherein the adhesive material forms a plurality of support locations supporting the substrate. Preferably the adhesive material is cured at least partly during the application of a substantially uniformly distributed force to the substrate in the direction of the support. The arrangements comprise a support comprising a first surface, for supporting the substrate via adhesive material, whereby the first surface defines a plane. Preferably it also comprises an arrangement for providing electromagnetic radiation, thermal energy, and/or a chemical substance to the adhesive material, and an arrangement for providing a substantially uniformly distributed force to the substrate in the direction of the support.Type: GrantFiled: March 6, 2020Date of Patent: March 7, 2023Assignee: ASML Netherlands B.V.Inventor: Marc Smits
-
Publication number: 20230020745Abstract: Disclosed herein is a substrate stack comprising a plurality of substrates, wherein: each substrate in the substrate stack comprises at least one alignment opening set; the at least one alignment opening set in each substrate is aligned for a light beam to pass through corresponding alignment openings in each substrate; and each substrate comprises at least one alignment opening that has a smaller diameter than the corresponding alignment openings in the other substrates.Type: ApplicationFiled: September 23, 2022Publication date: January 19, 2023Applicant: ASML Netherlands B.V.Inventors: Arjen Benjamin STORM, Johan Frederik Cornelis VAN GURP, Johannes Cornelis Jacobus DE LANGEN, Aaron Yang-Fay AYAL, Michiel Matthieu BRUININK, Christiaan Ruben VAN DEN BERG, Christiaan OTTEN, Laura DINU GURTLER, Marc SMITS
-
Publication number: 20210391139Abstract: Disclosed herein is a module for supporting a device configured to manipulate charged particle paths in a charged particle apparatus, the module comprising: a support arrangement configured to support the device, wherein the device is configured to manipulate a charged particle path within the charged particle apparatus; and a support positioning system configured to move the support arrangement within the module; wherein the module is arranged to be field replaceable in the charged particle apparatus.Type: ApplicationFiled: June 10, 2021Publication date: December 16, 2021Inventors: Christiaan OTTEN, Peter-Paul CRANS, Marc SMITS, Laura DEL TIN, Christan TEUNISSEN, Yang-Shan HUANG, Stijn Wilem, Herman, Karel STEENBRINK, Xuerang HU, Qingpo XI, Xinan LUO, Xuedong LIU
-
METHOD AND SYSTEM FOR THE REMOVAL AND/OR AVOIDANCE OF CONTAMINATION IN CHARGED PARTICLE BEAM SYSTEMS
Publication number: 20210237129Abstract: A charged particle beam system is disclosed, comprising: a charged particle beam generator for generating a beam of charged particles; a charged particle optical column arranged in a vacuum chamber, wherein the charged particle optical column is arranged for projecting the beam of charged particles onto a target, and wherein the charged particle optical column comprises a charged particle optical element for influencing the beam of charged particles; a source for providing a cleaning agent; a conduit connected to the source and arranged for introducing the cleaning agent towards the charged particle optical element; wherein the charged particle optical element comprises: a charged particle transmitting aperture for transmitting and/or influencing the beam of charged particles, and at least one vent hole for providing a flow path between a first side and a second side of the charged particle optical element, wherein the vent hole has a cross section which is larger than a cross section of the chaType: ApplicationFiled: April 22, 2021Publication date: August 5, 2021Inventors: Marc SMITS, Johan Joost KONING, Chris Franciscus Jessica LODEWIJK, Hindrik Willem MOOK, Ludovic LATTARD -
Method and system for the removal and/or avoidance of contamination in charged particle beam systems
Patent number: 10987705Abstract: A charged particle beam system is disclosed, comprising: a charged particle beam generator for generating a beam of charged particles; a charged particle optical column arranged in a vacuum chamber, wherein the charged particle optical column is arranged for projecting the beam of charged particles onto a target, and wherein the charged particle optical column comprises a charged particle optical element for influencing the beam of charged particles; a source for providing a cleaning agent; a conduit connected to the source and arranged for introducing the cleaning agent towards the charged particle optical element; wherein the charged particle optical element comprises: a charged particle transmitting aperture for transmitting and/or influencing the beam of charged particles, and at least one vent hole for providing a flow path between a first side and a second side of the charged particle optical element, wherein the vent hole has a cross section which is larger than a cross section of the charged parType: GrantFiled: April 6, 2020Date of Patent: April 27, 2021Assignee: ASML Netherlands B.V.Inventors: Marc Smits, Johan Joost Koning, Chris Franciscus Jessica Lodewijk, Hindrik Willem Mook, Ludovic Lattard -
METHOD AND SYSTEM FOR THE REMOVAL AND/OR AVOIDANCE OF CONTAMINATION IN CHARGED PARTICLE BEAM SYSTEMS
Publication number: 20200230665Abstract: A charged particle beam system is disclosed, comprising: a charged particle beam generator for generating a beam of charged particles; a charged particle optical column arranged in a vacuum chamber, wherein the charged particle optical column is arranged for projecting the beam of charged particles onto a target, and wherein the charged particle optical column comprises a charged particle optical element for influencing the beam of charged particles; a source for providing a cleaning agent; a conduit connected to the source and arranged for introducing the cleaning agent towards the charged particle optical element; wherein the charged particle optical element comprises: a charged particle transmitting aperture for transmitting and/or influencing the beam of charged particles, and at least one vent hole for providing a flow path between a first side and a second side of the charged particle optical element, wherein the vent hole has a cross section which is larger than a cross section of the charged parType: ApplicationFiled: April 6, 2020Publication date: July 23, 2020Inventors: Marc SMITS, Johan Joost KONING, Chris Franciscus Jessica LODEWIJK, Hindrik Willem MOOK, Ludovic LATTARD -
Publication number: 20200209763Abstract: Methods and arrangement for clamping substrates to a support using adhesive material area disclosed. The method comprises providing a support comprising a first surface defining a plane; applying adhesive material on at least portions of the first surface; and placing the substrate onto the adhesive material, wherein the adhesive material forms a plurality of support locations supporting the substrate. Preferably the adhesive material is cured at least partly during the application of a substantially uniformly distributed force to the substrate in the direction of the support. The arrangements comprise a support comprising a first surface, for supporting the substrate via adhesive material, whereby the first surface defines a plane. Preferably it also comprises an arrangement for providing electromagnetic radiation, thermal energy, and/or a chemical substance to the adhesive material, and an arrangement for providing a substantially uniformly distributed force to the substrate in the direction of the support.Type: ApplicationFiled: March 6, 2020Publication date: July 2, 2020Inventor: Marc SMITS
-
Method and system for the removal and/or avoidance of contamination in charged particle beam systems
Patent number: 10632509Abstract: A charged particle beam system is disclosed, comprising: a charged particle beam generator for generating a beam of charged particles; a charged particle optical column arranged in a vacuum chamber, wherein the charged particle optical column is arranged for projecting the beam of charged particles onto a target, and wherein the charged particle optical column comprises a charged particle optical element for influencing the beam of charged particles; a source for providing a cleaning agent; a conduit connected to the source and arranged for introducing the cleaning agent towards the charged particle optical element; wherein the charged particle optical element comprises: a charged particle transmitting aperture for transmitting and/or influencing the beam of charged particles, and at least one vent hole for providing a flow path between a first side and a second side of the charged particle optical element, wherein the vent hole has a cross section which is larger than a cross section of the charged parType: GrantFiled: April 26, 2018Date of Patent: April 28, 2020Assignee: ASML Netherlands B.V.Inventors: Marc Smits, Johan Joost Koning, Chris Franciscus Jessica Lodewijk, Hindrik Willem Mook, Ludovic Lattard -
METHOD AND SYSTEM FOR THE REMOVAL AND/OR AVOIDANCE OF CONTAMINATION IN CHARGED PARTICLE BEAM SYSTEMS
Publication number: 20180236505Abstract: A charged particle beam system is disclosed, comprising: a charged particle beam generator for generating a beam of charged particles; a charged particle optical column arranged in a vacuum chamber, wherein the charged particle optical column is arranged for projecting the beam of charged particles onto a target, and wherein the charged particle optical column comprises a charged particle optical element for influencing the beam of charged particles; a source for providing a cleaning agent; a conduit connected to the source and arranged for introducing the cleaning agent towards the charged particle optical element; wherein the charged particle optical element comprises: a charged particle transmitting aperture for transmitting and/or influencing the beam of charged particles, and at least one vent hole for providing a flow path between a first side and a second side of the charged particle optical element, wherein the vent hole has a cross section which is larger than a cross section of the charged parType: ApplicationFiled: April 26, 2018Publication date: August 23, 2018Inventors: Marc SMITS, Johan Joost KONING, Chris Franciscus Jessica LODEWIJK, Hindrik Willem MOOK, Ludovic LATTARD -
Method and system for the removal and/or avoidance of contamination in charged particle beam systems
Patent number: 9981293Abstract: A charged particle beam system is disclosed, comprising: a charged particle beam generator for generating a beam of charged particles; a charged particle optical column arranged in a vacuum chamber, wherein the charged particle optical column is arranged for projecting the beam of charged particles onto a target, and wherein the charged particle optical column comprises a charged particle optical element for influencing the beam of charged particles; a source for providing a cleaning agent; a conduit connected to the source and arranged for introducing the cleaning agent towards the charged particle optical element; wherein the charged particle optical element comprises: a charged particle transmitting aperture for transmitting and/or influencing the beam of charged particles, and at least one vent hole for providing a flow path between a first side and a second side of the charged particle optical element, wherein the vent hole has a cross section which is larger than a cross section of the charged parType: GrantFiled: April 21, 2016Date of Patent: May 29, 2018Assignee: MAPPER LITHOGRAPHY IP B.V.Inventors: Marc Smits, Johan Joost Koning, Chris Franciscus Jessica Lodewijk, Hindrik Willem Mook, Ludovic Lattard -
METHOD AND SYSTEM FOR THE REMOVAL AND/OR AVOIDANCE OF CONTAMINATION IN CHARGED PARTICLE BEAM SYSTEMS
Publication number: 20170304878Abstract: A charged particle beam system is disclosed, comprising: a charged particle beam generator for generating a beam of charged particles; a charged particle optical column arranged in a vacuum chamber, wherein the charged particle optical column is arranged for projecting the beam of charged particles onto a target, and wherein the charged particle optical column comprises a charged particle optical element for influencing the beam of charged particles; a source for providing a cleaning agent; a conduit connected to the source and arranged for introducing the cleaning agent towards the charged particle optical element; wherein the charged particle optical element comprises: a charged particle transmitting aperture for transmitting and/or influencing the beam of charged particles, and at least one vent hole for providing a flow path between a first side and a second side of the charged particle optical element, wherein the vent hole has a cross section which is larger than a cross section of the chaType: ApplicationFiled: April 21, 2016Publication date: October 26, 2017Inventors: Marc Smits, Johan Joost Koning, Chris Franciscus Jessica Lodewijk, Hindrik Willem Mook, Ludovic Lattard -
Patent number: 9506881Abstract: A lithography system (10) comprising a radiation projection system (20) for projecting radiation onto a substrate, a substrate transport system (30) for loading and positioning the substrate to be processed in the path of the projected radiation, a control system (40) for controlling the substrate transport system to move the substrate, and a resist characterization system (50) arranged for determining whether a specific type of resist is suitable to be exposed by radiation within the lithography system. The resist characterization system (50) may be arranged for exposing the resist on a surface of the substrate with one or more radiation beams, measuring a mass distribution of molecular fragments emitted from the resist, predicting a growth rate of deposited molecular fragments on the basis of a growth rate model and the measured mass distribution, and comparing the expected growth rate with a predetermined threshold growth rate.Type: GrantFiled: September 19, 2012Date of Patent: November 29, 2016Assignee: MAPPER LITHOGRAPHY IP B.V.Inventor: Marc Smits
-
Patent number: 9484187Abstract: The invention relates to an arrangement for transporting radicals. An electron beam system is presented comprising a beamlet generator; a beamlet manipulator (204) comprising an array of apertures; a plasma generator comprising a chamber for forming a plasma, an inlet receiving input gas and outlets removing plasma or radicals created therein, the plasma generator further comprising outlets in flow connection with the plasma chamber outlets; and a hollow guiding body (309b) guiding radicals formed in the plasma towards the array of apertures for removing contaminant deposition. The hollow guiding body (309b) is removably connectable to an extended portion (307b) of the plasma generator outlet. A cover (400) can be placed over a connection between the hollow guiding body (309b) and the extended portion (307b). The extended portion (307b) of the plasma generator outlet and the hollow guiding body (309b) can be similarly formed as a slit.Type: GrantFiled: July 22, 2015Date of Patent: November 1, 2016Assignee: MAPPER LITHOGRAPHY IP B.V.Inventors: Pieter Kruit, Marc Smits
-
Patent number: 9224580Abstract: An arrangement for generating plasma, the arrangement comprising a primary plasma source (1) comprising a primary source chamber (15) and a first coil (4) for generating plasma in the primary source chamber, a secondary plasma source (25) comprising a secondary source chamber (16) and a second coil (26) for enhancing plasma generated by the primary plasma source and/or generating plasma in the secondary source chamber generating plasma in the primary source chamber, a hollow guiding body (11) arranged for guiding at least a portion of the plasma generated by the primary plasma source to the secondary plasma source, and an outlet (14) for emitting at least a portion of the plasma generated by the arrangement.Type: GrantFiled: September 28, 2012Date of Patent: December 29, 2015Assignee: MAPPER LITOHGRAPHY IP B.V.Inventors: Marc Smits, Chris Franciscus Jessica Lodewijk
-
Publication number: 20150332899Abstract: The invention relates to an arrangement for transporting radicals. An electron beam system is presented comprising a beamlet generator; a beamlet manipulator (204) comprising an array of apertures; a plasma generator comprising a chamber for forming a plasma, an inlet receiving input gas and outlets removing plasma or radicals created therein, the plasma generator further comprising outlets in flow connection with the plasma chamber outlets; and a hollow guiding body (309b) guiding radicals formed in the plasma towards the array of apertures for removing contaminant deposition. The hollow guiding body (309b) is removably connectable to an extended portion (307b) of the plasma generator outlet. A cover (400) can be placed over a connection between the hollow guiding body (309b) and the extended portion (307b). The extended portion (307b) of the plasma generator outlet and the hollow guiding body (309b) can be similarly formed as a slit.Type: ApplicationFiled: July 22, 2015Publication date: November 19, 2015Inventors: Pieter KRUIT, Marc SMITS