Abstract: Methods, systems, and techniques for annotating large amounts of data are provided. Example embodiments provide a Scalable Annotation Architecture (a “SAS”), which builds predictive models for an annotation from the ground up, without knowledge of the data. The SAS operates by performing in an iterative fashion a process that seeds training data and hypothesizes a predictive model based upon that data, then sends samples of the data to a crowdsourcing environment to provide selective verification. This process is repeated iteratively until a desired precision is reached and then the model is employed independently in a production system. In one embodiment, the SAS is used to annotate data provided by an open data platform.

Abstract: A method for obtaining mask and source patterns for printing integrated circuit patterns includes providing initial representations of a plurality of mask and source patterns. The method identifies long-range and short-range factors in the representations of the plurality of mask and source patterns, and provides a plurality of clips including a specified number of mask patterns. Short-range factors having overlapping ranges for each of the clips are specified. The method includes determining an initial processing priority for the plurality of clips, and determining a patterning relationship between integrated circuit patterns and the mask and source patterns. A primary objective is determined which expresses the printability of the integrated circuit patterns in terms of the patterning relationship.

Abstract: A method for obtaining mask and source patterns for printing integrated circuit patterns includes providing initial representations of a plurality of mask and source patterns. The method identifies long-range and short-range factors in the representations of the plurality of mask and source patterns, and provides a plurality of clips including a specified number of mask patterns. Short-range factors having overlapping ranges for each of the clips are specified. The method includes determining an initial processing priority for the plurality of clips, and determining a patterning relationship between integrated circuit patterns and the mask and source patterns. A primary objective is determined which expresses the printability of the integrated circuit patterns in terms of the patterning relationship.