Patents by Inventor Marc Van De Grift

Marc Van De Grift has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Lithographic apparatus and device manufacturing method
    Patent number: 8264671
    Abstract: A detection method for detecting a property of an extended pattern formed by at least one line generally extending in a first direction. The extended pattern is formed on a substrate or on a substrate table and preferably extends over a length of at least 50× the width of the line. The extended pattern is focus sensitive. The detection method includes moving the substrate table in a first direction and measuring along that first direction a property of the extended pattern. The property can be a result of a physical property of the extended pattern in a second direction perpendicular to the first direction. In a next step a calibration of the substrate table position can be derived from the measured position of the extended pattern.
    Type: Grant
    Filed: June 2, 2009
    Date of Patent: September 11, 2012
    Assignee: ASML Netherlands B.V.
    Inventors: Igor Matheus Petronella Aarts, Engelbertus Antonius Fransiscus Van Der Pasch, Johan Hendrik Geerke, Frederik Eduard De Jong, Marc Van De Grift
  • LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD
    Publication number: 20090323037
    Abstract: A detection method for detecting a property of an extended pattern formed by at least one line generally extending in a first direction. The extended pattern is formed on a substrate or on a substrate table and preferably extends over a length of at least 50× the width of the line. The extended pattern is focus sensitive. The detection method includes moving the substrate table in a first direction and measuring along that first direction a property of the extended pattern. The property can be a result of a physical property of the extended pattern in a second direction perpendicular to the first direction. In a next step a calibration of the substrate table position can be derived from the measured position of the extended pattern.
    Type: Application
    Filed: June 2, 2009
    Publication date: December 31, 2009
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Igor Matheus Petronella AARTS, Engelbertus Antonius Fransiscus Van Der Pasch, Johan Hendrik Geerke, Frederik Eduard De Jong, Marc Van De Grift