Abstract: Methods of photoaltering a region of a material using a pulsed laser beam. The method includes scanning the pulsed laser beam in a first portion of the region with a first pattern, scanning the pulsed laser beam in a second portion of the region with a second pattern, and separating a flap of the material at the region. The system includes a laser, a controller selecting at least first and second patterns, and a scanner operable in response to the controller. The first pattern has a first maximum acceleration associated with the second portion, and the second pattern has a second maximum acceleration associated with the second portion. The second maximum acceleration is less than the first maximum acceleration. The scanner scans the pulsed laser beam from the laser in the first portion with the first pattern and in the second portion with the second pattern.

Abstract: Systems and methods of photoaltering a region of a material using a pulsed laser beam. The method includes scanning the pulsed laser beam in a first portion of the region with a first pattern, scanning the pulsed laser beam in a second portion of the region with a second pattern, and separating a flap of the material at the region. The system includes a laser, a controller selecting at least first and second patterns, and a scanner operable in response to the controller. The first pattern has a first maximum acceleration associated with the second portion, and the second pattern has a second maximum acceleration associated with the second portion. The second maximum acceleration is less than the first maximum acceleration. The scanner scans the pulsed laser beam from the laser in the first portion with the first pattern and in the second portion with the second pattern.

Abstract: System and method of photoaltering a region of a material using a pulsed laser beam. The method includes scanning the pulsed laser beam in a first portion of the region with a first pattern, scanning the pulsed laser beam in a second portion of the region with a second pattern, and separating a flap of the material at the region. The system includes a laser, a controller selecting at least first and second patterns, and a scanner operable in response to the controller. The first pattern has a first maximum acceleration associated with the second portion, and the second pattern has a second maximum acceleration associated with the second portion. The second maximum acceleration is less than the first maximum acceleration. The scanner scans the pulsed laser beam from the laser in the first portion with the first pattern and in the second portion with the second pattern.

Abstract: Systems and methods of photoaltering a region of a material using a pulsed laser beam. The method includes scanning the pulsed laser beam in a first portion of the region with a first pattern, scanning the pulsed laser beam in a second portion of the region with a second pattern, and separating a flap of the material at the region. The system includes a laser, a controller selecting at least first and second patterns, and a scanner operable in response to the controller. The first pattern has a first maximum acceleration associated with the second portion, and the second pattern has a second maximum acceleration associated with the second portion. The second maximum acceleration is less than the first maximum acceleration. The scanner scans the pulsed laser beam from the laser in the first portion with the first pattern and in the second portion with the second pattern.

Abstract: Systems and methods of photoaltering a region of a material using a pulsed laser beam. The method includes scanning the pulsed laser beam in a first portion of the region with a first pattern, scanning the pulsed laser beam in a second portion of the region with a second pattern, and separating a flap of the material at the region. The system includes a laser, a controller selecting at least first and second patterns, and a scanner operable in response to the controller. The first pattern has a first maximum acceleration associated with the second portion, and the second pattern has a second maximum acceleration associated with the second portion. The second maximum acceleration is less than the first maximum acceleration. The scanner scans the pulsed laser beam from the laser in the first portion with the first pattern and in the second portion with the second pattern.

Abstract: Methods of photoaltering a region of a material using a pulsed laser beam. The method includes scanning the pulsed laser beam in a first portion of the region with a first pattern, scanning the pulsed laser beam in a second portion of the region with a second pattern, and separating a flap of the material at the region. The system includes a laser, a controller selecting at least first and second patterns, and a scanner operable in response to the controller. The first pattern has a first maximum acceleration associated with the second portion, and the second pattern has a second maximum acceleration associated with the second portion. The second maximum acceleration is less than the first maximum acceleration. The scanner scans the pulsed laser beam from the laser in the first portion with the first pattern and in the second portion with the second pattern.

Abstract: The present invention provides a method for minimizing fluence distribution of a laser over a predetermined pattern. In particular, the method is useful for minimizing fluence variance over a predetermined pattern for lasers used in ophthalmic surgery.

Abstract: System and method of photoaltering a region of a material using a pulsed laser beam. The method includes scanning the pulsed laser beam in a first portion of the region with a first pattern, scanning the pulsed laser beam in a second portion of the region with a second pattern, and separating a flap of the material at the region. The system includes a laser, a controller selecting at least first and second patterns, and a scanner operable in response to the controller. The first pattern has a first maximum acceleration associated with the second portion, and the second pattern has a second maximum acceleration associated with the second portion. The second maximum acceleration is less than the first maximum acceleration. The scanner scans the pulsed laser beam from the laser in the first portion with the first pattern and in the second portion with the second pattern.

Abstract: The present invention provides a method for minimizing fluence distribution of a laser over a predetermined pattern. In particular, the method is useful for minimizing fluence variance over a predetermined pattern for lasers used in ophthalmic surgery.

Abstract: A sweep generator circuit generates a primary pulsed voltage and a secondary voltage which are applied to the deflection plates of a streak camera. A primary pulsed voltage generator includes at least one light operated switch for producing deflection of an electron beam in one direction. A secondary voltage generator means generates the secondary voltage which causes deflection of the electron beam in an opposite direction. Variations in the incident light intensity create substantially identical fluctuations in the deflection of the electron beam produced by the primary pulsed voltage and the secondary voltage. Additionally, any variations with respect to time in the deflection of the electron beam produced by the secondary voltage are small in comparison with variations in the deflection of the electron beam produced by the primary pulsed voltage. The sweep generator circuit has an operating point that is stable with respect to variations in the light intensity.

Abstract: An apparatus and method for enabling the creation of multiple extended conduction paths in the atmosphere including a chirped-pulse amplification laser system having a high peak-power laser capable of transmitting through the atmosphere a high-peak power ultrashort laser pulse. The laser pulse is configured to have a rough spacial profile and is of sufficient energy to create multiple electrically conductive ionized channels in the atmosphere.

Abstract: A Pockels cell driver using a microwave triode which transfers charge from a high voltage source to a Pockels cell via a storage capacitor. The microwave tube is controlled, through its grid voltage, by two pulse amplifiers each having a plurality of tandem field effect transistor (FET) stages so as to increase the voltage across the cell in two steps having a selected delay therebetween. The driver is especially useful for seeding and extracting output pulses from a regenerative laser amplifier having the Pockels cell within its cavity. The driver may be used to operate a Pockels cell as a switchout or shutter to select a single pulse from a pulse laser such as a mode-locked Q-switched laser.