Patents by Inventor Marcel Becker
Marcel Becker has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20090059192Abstract: A lithographic apparatus includes a projection system configured to project a patterned radiation beam onto a target portion of a substrate. The apparatus also includes a barrier member, surrounding a space between the projection system and, in use, the substrate, to define in part with the projection system a reservoir for liquid. A radially outer surface of the barrier member facing a portion of projection system and a radially outer surface of the portion of the projection system facing the barrier member each have a liquidphobic outer surface. The liquidphobic outer surface of the barrier member and/or the liquidphobic outer surface of the portion of the projection system has an inner edge that defines in part the reservoir.Type: ApplicationFiled: August 1, 2008Publication date: March 5, 2009Applicant: ASML NETHERLANDS B.V.Inventors: Marcel Beckers, Marcus Adrianus Van De Kerkhof, Siebe Landheer, Wouterus Johannes Petrus Maas, Jeroen Peter Johannes Bruijstens, Ivo Adam Johannes Thomas, Franciscus Johannes Joseph Janssen, Bartholomeus Mathias Van Oerle
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Publication number: 20080273182Abstract: A protrusion is provided on a barrier member which at least partly confines a liquid between a projection system and a substrate. The protrusion is closer to the projection system than other parts of the barrier member to promote a meniscus of liquid to adhere between the protrusion and the projection system.Type: ApplicationFiled: July 9, 2008Publication date: November 6, 2008Applicant: ASML NETHERLANDS B.V.Inventors: Marcel Beckers, Johannes Henricus Wilhelmus Jacobs, Nicolaas Ten Kate, Ferdy Migchelbrink
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Publication number: 20080212051Abstract: A liquid supply system for an immersion lithographic apparatus provides a laminar flow of immersion liquid between a final element of the projection system and a substrate. A control system minimizes the chances of overflowing and an extractor includes an array of outlets configured to minimize vibrations.Type: ApplicationFiled: April 11, 2008Publication date: September 4, 2008Applicant: ASML NETHERLANDS B.V.Inventors: Marcel Beckers, Sjoerd Nicolaas Lambertus Donders, Christiaan Alexander Hoogendam, Johannes Henricus Wilhelmus Jacobs, Nicolaas Ten Kate, Nicolaas Rudolf Kemper, Ferdy Migchelbrink, Elmar Evers
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Patent number: 7411654Abstract: A liquid supply system for an immersion lithographic apparatus provides a laminar flow of immersion liquid between a final element of the projection system and a substrate. A control system minimizes the chances of overflowing and an extractor includes an array of outlets configured to minimize vibrations.Type: GrantFiled: April 5, 2005Date of Patent: August 12, 2008Assignee: ASML Netherlands B.V.Inventors: Marcel Beckers, Sjoerd Nicolaas Lambertus Donders, Christiaan Alexander Hoogendam, Johannes Henricus Wilhelmus Jacobs, Nicolaas Ten Kate, Nicolaas Rudolf Kemper, Ferdy Migchelbrink, Elmar Evers
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Patent number: 7411658Abstract: A protrusion is provided on a barrier member which at least partly confines a liquid between a projection system and a substrate. The protrusion is closer to the projection system than other parts of the barrier member to promote a meniscus of liquid to adhere between the protrusion and the projection system.Type: GrantFiled: October 6, 2005Date of Patent: August 12, 2008Assignee: ASML Netherlands B.V.Inventors: Marcel Beckers, Johannes Henricus Wilhelmus Jacobs, Nicolaas Ten Kate, Ferdy Migchelbrink
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Publication number: 20070242243Abstract: A plurality of extraction conduits are provided to remove immersion liquid into a chamber. The extraction conduits are arranged at different distances from a target portion of the substrate. From the chamber, a passage is provided to which a suction force is applied. When all the conduits are filled with immersion liquid, the extraction capacity will be greater than when one or more of the conduits comprise gas.Type: ApplicationFiled: April 14, 2006Publication date: October 18, 2007Applicant: ASML Netherlands B.V.Inventors: Nicolaas Kemper, Marcel Beckers, Stefan Belfroid, Ferdy Migchelbrink, Sergei Shulepov
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Patent number: 7271873Abstract: A lithographic apparatus is disclosed. The apparatus includes an illuminator for conditioning a beam of radiation, and a first support for supporting a patterning device that serves to pattern the beam of radiation according to a desired pattern. The apparatus also includes a second support for supporting a substrate, a projection system for projecting the patterned beam onto a target portion of the substrate, and at least one gas generator for generating a conditioned gas flow. The gas generator includes a guiding element for guiding the gas flow to a lower volume generally located below a lower surface of the projection system and to a volume between the lower surface and the substrate. The guiding element directs the gas flow in a generally downward direction and then in a direction generally parallel to the lower surface.Type: GrantFiled: May 22, 2006Date of Patent: September 18, 2007Assignee: ASML Netherlands B.V.Inventors: Nicolas Alban Lallemant, Martinus Cornelis Maria Verhagen, Marcel Beckers, Ronald Stultiens, Pascal Antonius Smits, Wladimir Fransiscus Gerardus Maria Hertog, David Theodorus Willy Van Der Plas, Stephan Koelink, Henk Krus
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Publication number: 20070139629Abstract: A lithographic apparatus is disclosed. The apparatus includes a substrate table constructed to hold a substrate. The substrate table is moveable to transfer the substrate between a substrate measuring position and a substrate processing position. The apparatus also includes a measuring system configured to measure at least one aspect or characteristic of the substrate when the substrate table holds the substrate in the measuring position. The measuring system is configured to direct at least one measuring beam and/or field towards a surface of the substrate. A projection system is configured to project a patterned radiation beam onto a target portion of the substrate when the substrate table holds the substrate in the substrate processing position, and a conditioning system is configured to supply a conditioning fluid to at least part of a path of the measuring beam and/or field of the measuring system to condition the part of the path.Type: ApplicationFiled: December 21, 2005Publication date: June 21, 2007Applicant: ASML NETHERLANDS B.V.Inventors: Timotheus Sengers, Nicolaas Johannes Van Asten, Wilhelmus Box, Tjarko Van Empel, Leon Levasier, Erik Loopstra, Marcel Hubertus Muitjens, Luberthus Ouwehand, Leon Van Den Schoor, Marcel Beckers, Rob Jansen, Elke Van Loenhout
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Publication number: 20070110213Abstract: A barrier member is disclosed for use in immersion lithography. The barrier member comprises an extractor assembly on a bottom surface configured to face the substrate. The extractor assembly includes a plate configured to split the space between a liquid removal device and the substrate in two such that a meniscus is formed in an upper channel between the liquid removal device and the plate and below the plate between the plate and the substrate.Type: ApplicationFiled: March 29, 2006Publication date: May 17, 2007Applicant: ASML NETHERLANDS B.V.Inventors: Martinus Hendrikus Leenders, Nicolaas Kate, Nicolaas Kemper, Joost Ottens, Marcel Beckers, Johannes Smeulers, Michel Riepen, Sergei Shulepov
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Publication number: 20070081140Abstract: A protrusion is provided on a barrier member which at least partly confines a liquid between a projection system and a substrate. The protrusion is closer to the projection system than other parts of the barrier member to promote a meniscus of liquid to adhere between the protrusion and the projection system.Type: ApplicationFiled: October 6, 2005Publication date: April 12, 2007Applicant: ASML NETHERLANDS B.V.Inventors: Marcel Beckers, Johannes Jacobs, Nicolaas Kate, Ferdy Migchelbrink
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Patent number: 7148951Abstract: A lithographic apparatus includes a radiation system for providing a beam of radiation, and a first support for supporting a patterning device. The patterning device serves to pattern the beam of radiation. The apparatus includes a second support for supporting a substrate, a projection system for projecting the patterned beam onto a target portion of the substrate, and an interferometer measurement system for providing an interferometric measurement beam extending along an axis in an elongated volume of gas extending below the projection system. The apparatus also includes a gas conditioning structure for providing a conditioned gas flow in the volume. The gas conditioning structure includes a plurality of gas guiding vanes disposed at an outlet of the structure for guiding the gas flow to the volume. The gas guiding vanes are shaped continuously and are oriented diverging away from the axis of the volume.Type: GrantFiled: October 25, 2004Date of Patent: December 12, 2006Assignee: ASML Netherlands B.V.Inventors: Nicolas Lallemant, Marcel Beckers, Stephan Koelink, Rob Jansen, Wladimir Fransiscus Gerardus Maria Hertog, David Theodorus Willy Van Der Plas
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Patent number: 7136142Abstract: A lithographic apparatus is disclosed. The apparatus includes an illumination system to provide a beam of radiation, and a support structure for supporting a patterning device. The patterning device serves to impart the beam with a pattern in its cross-section. The apparatus also includes a gas flushing device for flushing a substantially laminar flow of gas across the beam of radiation and/or along a surface of an optical component. The gas flushing device includes a single gas outlet that has an inner rim at a downstream end of the gas outlet. The inner rim defines a total gas outlet area. The gas outlet is provided with a laminator that has an effective area out of which, in use, the substantially laminar flow of gas flows. The laminator effective area includes material that has laminator openings and is at least as large as the total gas outlet area.Type: GrantFiled: May 25, 2004Date of Patent: November 14, 2006Assignee: ASML Netherlands B.V.Inventors: Marcel Beckers, Ronald Johannes Hultermans, Nicolaas Ten Kate, Nicolaas Rudolf Kemper, Nicolaas Franciscus Koppelaars, Jan-Marius Schotsman, Ronald Van Der Ham, Johannes Antonius Maria Martina Van Uijtregt
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Publication number: 20060232754Abstract: A lithographic apparatus is disclosed. The apparatus includes an illuminator for conditioning a beam of radiation, and a first support for supporting a patterning device that serves to pattern the beam of radiation according to a desired pattern. The apparatus also includes a second support for supporting a substrate, a projection system for projecting the patterned beam onto a target portion of the substrate, and at least one gas generator for generating a conditioned gas flow. The gas generator includes a guiding element for guiding the gas flow to a lower volume generally located below a lower surface of the projection system and to a volume between the lower surface and the substrate. The guiding element directs the gas flow in a generally downward direction and then in a direction generally parallel to the lower surface.Type: ApplicationFiled: May 22, 2006Publication date: October 19, 2006Applicant: ASML Netherlands B.V.Inventors: Nicolas Lallemant, Martinus Verhagen, Marcel Beckers, Ronald Stultiens, Pascal Smits, Wladimir Fransiscus Hertog, David Van Der Plas, Stephan Koelink, Henk Krus
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Publication number: 20060221315Abstract: A liquid supply system for an immersion lithographic apparatus provides a laminar flow of immersion liquid between a final element of the projection system and a substrate. A control system minimizes the chances of overflowing and an extractor includes an array of outlets configured to minimize vibrations.Type: ApplicationFiled: April 5, 2005Publication date: October 5, 2006Applicant: ASML NETHERLANDS B.V.Inventors: Marcel Beckers, Sjoerd Donders, Christiaan Hoogendam, Johannes Jacobs, Nicolaas Kate, Nicolaas Kemper, Ferdy Migchelbrink, Elmar Evers
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Patent number: 7072021Abstract: A lithographic apparatus is disclosed. The apparatus includes an illuminator for conditioning a beam of radiation, and a first support for supporting a patterning device that serves to pattern the beam of radiation according to a desired pattern. The apparatus also includes a second support for supporting a substrate, a projection system for projecting the patterned beam onto a target portion of the substrate, and at least one gas generator for generating a conditioned gas flow. The gas generator includes a guiding element for guiding the gas flow to a lower volume generally located below a lower surface of the projection system and to a volume between the lower surface and the substrate. The guiding element directs the gas flow in a generally downward direction and then in a direction generally parallel to the lower surface.Type: GrantFiled: June 28, 2004Date of Patent: July 4, 2006Assignee: ASML Netherlands B.V.Inventors: Nicolas Alban Lallemant, Martinus Cornelis Maria Verhagen, Marcel Beckers, Ronald Stultiens, Pascal Antonius Smits, Wladimir Franciscus Gerardus Maria Hertog, David Theodorus Willy Van Der Plas, Stephan Koelink, Henk Krus
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Patent number: 7057702Abstract: A lithographic projection apparatus is disclosed. The apparatus includes an illumination system configured to condition a beam of radiation, and a support structure configured to support a patterning device. The patterning device serves to impart the beam of radiation with a pattern in its cross-section. The apparatus also includes a substrate table configured to hold a substrate, a projection system configured to project the patterned beam onto a target portion of the substrate, and a fluid supply system configured to provide a fluid to a volume. The volume includes at least a portion of the projection system and/or at least a portion of the illumination system. The apparatus further includes a coupling device configured to couple the fluid supply system to the substrate table, substrate, support structure, patterning device, or any combination thereof.Type: GrantFiled: June 23, 2004Date of Patent: June 6, 2006Assignee: ASML Netherlands B.V.Inventors: Joeri Lof, Johannes Catharinus Hubertus Mulkens, Jeroen Johannes Sophia Maria Mertens, Antonius Johannes Van Der Net, Ronald Van Der Ham, Nicolas Lallemant, Marcel Beckers
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Publication number: 20060087631Abstract: A lithographic apparatus includes a radiation system for providing a beam of radiation, and a first support for supporting a patterning device. The patterning device serves to pattern the beam of radiation. The apparatus includes a second support for supporting a substrate, a projection system for projecting the patterned beam onto a target portion of the substrate, and an interferometer measurement system for providing an interferometric measurement beam extending along an axis in an elongated volume of gas extending below the projection system. The apparatus also includes a gas conditioning structure for providing a conditioned gas flow in the volume. The gas conditioning structure includes a plurality of gas guiding vanes disposed at an outlet of the structure for guiding the gas flow to the volume. The gas guiding vanes are shaped continuously and are oriented diverging away from the axis of the volume.Type: ApplicationFiled: October 25, 2004Publication date: April 27, 2006Applicant: ASML NETHERLANDS B.V.Inventors: Nicolas Lallemant, Marcel Beckers, Stephan Koelink, Rob Jansen, Wladimir Fransiscus Hertog, David Van Der Plas
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Publication number: 20060066826Abstract: An immersion lithographic projection apparatus has a liquid confinement structure configured to at least partly confine liquid to a space between a projection system and a substrate, the confinement structure having a buffer surface, when in use, positioned in close proximity to a plane substantially comprising the upper surface of the substrate and of a substrate table holding the substrate, to define a passage having a flow resistance. A recess is provided in the buffer surface, the recess, when in use, being normally full of immersion liquid to enable rapid filling of a gap between the substrate and substrate table as the gap moves under the buffer surface. The recess may be annular or radial and a plurality of recesses may be provided.Type: ApplicationFiled: September 24, 2004Publication date: March 30, 2006Applicant: ASML NETHERLANDS B.V.Inventors: Carlo Maria Luijten, Sjoerd Lambertus Donders, Nicolaas Kemper, Martinus Antonius Leenders, Erik Loopstra, Bob Streefkerk, Marcel Beckers, Herman Boom, Richard Moerman
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Publication number: 20050286032Abstract: A lithographic projection apparatus is disclosed. The apparatus includes an illumination system configured to condition a beam of radiation, and a support structure configured to support a patterning device. The patterning device serves to impart the beam of radiation with a pattern in its cross-section. The apparatus also includes a substrate table configured to hold a substrate, a projection system configured to project the patterned beam onto a target portion of the substrate, and a fluid supply system configured to provide a fluid to a volume. The volume includes at least a portion of the projection system and/or at least a portion of the illumination system. The apparatus further includes a coupling device configured to couple the fluid supply system to the substrate table, substrate, support structure, patterning device, or any combination thereof.Type: ApplicationFiled: June 23, 2004Publication date: December 29, 2005Applicant: ASML NETHERLANDS B.V.Inventors: Joeri Lof, Johannes Catharinus Mulkens, Jeroen Johannes Mertens, Antonius Van Der Net, Ronald Van Der Ham, Nicolas Lallemant, Marcel Beckers
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Publication number: 20050264773Abstract: A lithographic apparatus is disclosed. The apparatus includes an illumination system to provide a beam of radiation, and a support structure for supporting a patterning device. The patterning device serves to impart the beam with a pattern in its cross-section. The apparatus also includes a gas flushing device for flushing a substantially laminar flow of gas across the beam of radiation and/or along a surface of an optical component. The gas flushing device includes a single gas outlet that has an inner rim at a downstream end of the gas outlet. The inner rim defines a total gas outlet area. The gas outlet is provided with a laminator that has an effective area out of which, in use, the substantially laminar flow of gas flows. The laminator effective area includes material that has laminator openings and is at least as large as the total gas outlet area.Type: ApplicationFiled: May 25, 2004Publication date: December 1, 2005Applicant: ASML NETHERLANDS B.V.Inventors: Marcel Beckers, Ronald Hultermans, Nicolaas Kate, Nicolaas Kemper, Nicolaas Koppelaars, Jan-Marius Schotsman, Ronald Der Ham, Johannes Antonius Van Uijtregt