Patents by Inventor Marcel Dierichs

Marcel Dierichs has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Illumination system for a wavelength of ? 193 nm, with sensors for determining an illumination
    Patent number: 7473907
    Abstract: There is provided an illumination system that includes (a) a light source that emits light having a wavelength ?193 nm, where the light provides a predetermined illumination in a plane distant from the light source and defines a used area in the plane, and (b) a sensor, situated in or near the plane, for detecting light outside the used area.
    Type: Grant
    Filed: March 28, 2005
    Date of Patent: January 6, 2009
    Assignees: Carl Zeiss SMT AG, ASML Netherlands
    Inventors: Wolfgang Singer, Martin Antoni, Johannes Wangler, Markus Weiss, Vadim Yevgenyevich Banine, Marcel Dierichs, Roel Moors, Karl Heinz Schuster, Axel Scholz, Philipp Bosselmann, Bernd Warm
  • Illumination system for a wavelength of less than or equal to 193 nm, with sensors for determining an illumination
    Publication number: 20050274897
    Abstract: There is provided an illumination system that includes (a) a light source that emits light having a wavelength ?193 nm, where the light provides a predetermined illumination in a plane distant from the light source and defines a used area in the plane, and (b) a sensor, situated in or near the plane, for detecting light outside the used area.
    Type: Application
    Filed: March 28, 2005
    Publication date: December 15, 2005
    Inventors: Wolfgang Singer, Martin Antoni, Johannes Wangler, Markus Weiss, Vadim Banine, Marcel Dierichs, Roel Moors, Karl Schuster, Axel Scholz, Philipp Bosselmann, Bernd Warm
  • Lithographic apparatus and device manufacturing method
    Publication number: 20050270513
    Abstract: A lithographic apparatus includes an illumination system including a field faceted mirror including a plurality of field facets and configured to receive radiation from a radiation source and form a plurality of images of the radiation source on corresponding pupil facets of a pupil faceted mirror. Each of the field facets is configured to provide an illumination slit at a level of a patterning device. The illumination slits are summed together at the level of the patterning device to illuminate the patterning device. First blades are configured to block radiation from a radiation source and each first blade is selectively actuable to cover a portion of a selectable number of field facets. The field faceted mirror further comprises partial field facets, the partial field facets being configured to produce a partial illumination slit at the level of the patterning device, and the pupil faceted mirror further includes pupil facets corresponding to the partial field facets.
    Type: Application
    Filed: May 31, 2005
    Publication date: December 8, 2005
    Applicant: ASML Netherlands B.V.
    Inventors: Marcel Dierichs, Hako Botma, Markus Franciscus Eurlings
  • Lithographic apparatus, device manufacturing method, device manufactured thereby, control system, computer program, and computer program product
    Patent number: 6737662
    Abstract: A lithographic projection system has an illumination system. A plurality of directing elements reflect different sub-beams of an incident projection beam into adjustable, individually controllable directions. By using of re-directing optics any desired spatial intensity distribution of the projection beam can be produced in its cross-sectional plane.
    Type: Grant
    Filed: May 30, 2002
    Date of Patent: May 18, 2004
    Assignee: ASML Netherlands B.V.
    Inventors: Heine Melle Mulder, Jan Bernard Plechelmus Van Schoot, Markus Franciscus Antonius Eurlings, Antonius Johannes Josephus Van Dijsseldonk, Marcel Dierichs
  • Method of operating a lithographic apparatus, lithographic apparatus, method of manufacturing a device, and device manufactured thereby
    Patent number: 6710856
    Abstract: A method of operating a lithographic projection apparatus including forming a spot of radiation at the wafer level using a pinhole at reticle level. A sensor is defocused with respect to the spot such that it is spaced apart from the wafer level. The sensor is scanned beneath the spot to measure the angular intensity distribution of radiation at the spot and to determine the intensity distribution at the pupil plane of the projection lens system.
    Type: Grant
    Filed: August 31, 2001
    Date of Patent: March 23, 2004
    Assignee: ASML Netherlands B.V.
    Inventors: Hans Van Der Laan, Marcel Dierichs, Hendrikus Robertus Marie Van Greevenbroek, Markus Franciscus Antonius Eurlings
  • Lithographic apparatus, device manufacturing method, device manufactured thereby, control system, computer program, and computer program product
    Publication number: 20030038225
    Abstract: A lithographic projection system has an illumination system. A plurality of directing elements reflect different sub-beams of an incident projection beam into adjustable, individually controllable directions. By using of re-directing optics any desired spatial intensity distribution of the projection beam can be produced in its cross-sectional plane.
    Type: Application
    Filed: May 30, 2002
    Publication date: February 27, 2003
    Inventors: Heine Melle Mulder, Jan Bernard Plechelmus Van Schoot, Markus Franciscus Antonius Eurlings, Antonius Johannes Josephus Van Dijsseldonk, Marcel Dierichs
  • Method of operating a lithographic apparatus, lithographic apparatus, method of manufacturing a device, and device manufactured thereby
    Publication number: 20020027648
    Abstract: A method of operating a lithographic projection apparatus comprises forming a spot of radiation at the wafer level using a pinhole at reticle level. A sensor is defocused with respect to said spot such that it is spaced apart from said wafer level. The sensor is scanned beneath the spot to measure the angular intensity distribution of radiation at the spot and to determine the intensity distribution at the pupil plane of the projection lens system.
    Type: Application
    Filed: August 31, 2001
    Publication date: March 7, 2002
    Inventors: Hans Van Der Laan, Marcel Dierichs, Hendrikus Robertus Marie Van Greevenbroek, Markus Franciscus Antonius Eurlings