Patents by Inventor Marcel E. Josephson

Marcel E. Josephson has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 10453721
    Abstract: Methods and gas flow control assemblies configured to deliver gas to process chamber zones in desired flow ratios. In some embodiments, assemblies include one or more MFCs and a back pressure controller (BPC). Assemblies includes a controller, a process gas supply, a distribution manifold, a pressure sensor coupled to the distribution manifold and configured to sense back pressure of the distribution manifold, a process chamber, a one or more mass flow controllers connected between the distribution manifold and process chamber to control gas flow there between, and a back pressure controller provided in fluid parallel relationship to the one or more mass flow controllers, wherein precise flow ratio control is achieved. Alternate embodiments include an upstream pressure controller configured to control flow of carrier gas to control back pressure. Further methods and assemblies for controlling zonal gas flow ratios are described, as are other aspects.
    Type: Grant
    Filed: March 15, 2016
    Date of Patent: October 22, 2019
    Assignee: Applied Materials, Inc.
    Inventors: Kevin Brashear, Ashley M. Okada, Dennis L. Demars, Zhiyuan Ye, Jaidev Rajaram, Marcel E. Josephson
  • Publication number: 20190293476
    Abstract: Mass flow verification systems and apparatus verify mass flow rates of mass flow controllers (MFCs) based on pressure decay principles. Embodiments include a location for coupling a calibrated gas flow standard or a MFC to be tested in a line to receive a gas flow from a gas supply; a control volume serially coupled to the location in the line to receive the gas flow; a flow restrictor serially coupled to the control volume; a pump serially coupled to the flow restrictor; and a controller adapted to allow the gas supply to flow gas through the mass flow control verification system to achieve a stable pressure in the control volume, terminate the gas flow from the gas supply, and measure a rate of pressure decay in the control volume over time. Numerous additional aspects are disclosed.
    Type: Application
    Filed: March 26, 2018
    Publication date: September 26, 2019
    Inventors: Zhiyuan Ye, Justin Hough, Marcel E. Josephson
  • Publication number: 20190206707
    Abstract: Methods and gas flow control assemblies configured to deliver gas to process chamber zones in desired flow ratios. In some embodiments, assemblies include one or more MFCs and a back pressure controller (BPC). Assemblies includes a controller, a process gas supply, a distribution manifold, a pressure sensor coupled to the distribution manifold and configured to sense back pressure of the distribution manifold, a process chamber, a one or more mass flow controllers connected between the distribution manifold and process chamber to control gas flow there between, and a back pressure controller provided in fluid parallel relationship to the one or more mass flow controllers, wherein precise flow ratio control is achieved. Alternate embodiments include an upstream pressure controller configured to control flow of carrier gas to control back pressure. Further methods and assemblies for controlling zonal gas flow ratios are described, as are other aspects.
    Type: Application
    Filed: March 5, 2019
    Publication date: July 4, 2019
    Inventors: Kevin Brashear, Ashley M. Okada, Dennis L. Demars, Zhiyuan Ye, Jaidev Rajaram, Marcel E. Josephson
  • Patent number: 10269600
    Abstract: Methods and gas flow control assemblies configured to deliver gas to process chamber zones in desired flow ratios. In some embodiments, assemblies include one or more MFCs and a back pressure controller (BPC). Assemblies includes a controller, a process gas supply, a distribution manifold, a pressure sensor coupled to the distribution manifold and configured to sense back pressure of the distribution manifold, a process chamber, a one or more mass flow controllers connected between the distribution manifold and process chamber to control gas flow there between, and a back pressure controller provided in fluid parallel relationship to the one or more mass flow controllers, wherein precise flow ratio control is achieved. Alternate embodiment include an upstream pressure controller configured to control flow of carrier gas to control back pressure. Further methods and assemblies for controlling zonal gas flow ratios are described, as are other aspects.
    Type: Grant
    Filed: March 15, 2016
    Date of Patent: April 23, 2019
    Assignee: Applied Materials, Inc.
    Inventors: Kevin Brashear, Ashley M. Okada, Dennis L. Demars, Zhiyuan Ye, Jaidev Rajaram, Marcel E. Josephson
  • Publication number: 20170370763
    Abstract: Mass flow verification systems and apparatus may verify mass flow rates of mass flow controllers (MFCs) based on choked flow principles. These systems and apparatus may include a plurality of differently-sized flow restrictors coupled in parallel. A wide range of flow rates may be verified via selection of a flow path through one of the flow restrictors based on an MFC's set point. Mass flow rates may be determined via pressure and temperature measurements upstream of the flow restrictors under choked flow conditions. Methods of verifying a mass flow rate based on choked flow principles are also provided, as are other aspects.
    Type: Application
    Filed: June 27, 2016
    Publication date: December 28, 2017
    Inventors: Kevin M. Brashear, Zhiyuan Ye, Justin Hough, Jaidev Rajaram, Marcel E. Josephson, Ashley M. Okada
  • Publication number: 20170271183
    Abstract: Methods and gas flow control assemblies configured to deliver gas to process chamber zones in desired flow ratios. In some embodiments, assemblies include one or more MFCs and a back pressure controller (BPC). Assemblies includes a controller, a process gas supply, a distribution manifold, pressure sensor coupled to the distribution manifold and configured to sense back pressure of the distribution manifold, a process chamber, a one or more mass flow controllers connected between the distribution manifold and process chamber to control gas flow there between, and a back pressure controller provided in fluid parallel relationship to the one or more mass flow controllers, wherein precise flow ratio control is achieved. Alternate embodiment include an upstream pressure controller configured to control flow of carrier gas to control back pressure. Further methods and assemblies for controlling zonal gas flow ratios are described, as are other aspects.
    Type: Application
    Filed: March 15, 2016
    Publication date: September 21, 2017
    Inventors: Kevin Brashear, Ashley M. Okada, Dennis L. Demars, Zhiyuan Ye, Jaidev Rajaram, Marcel E. Josephson
  • Publication number: 20170271184
    Abstract: Methods and gas flow control assemblies configured to deliver gas to process chamber zones in desired flow ratios. In some embodiments, assemblies include one or more MFCs and a back pressure controller (BPC). Assemblies includes a controller, a process gas supply, a distribution manifold, a pressure sensor coupled to the distribution manifold and configured to sense back pressure of the distribution manifold, a process chamber, a one or more mass flow controllers connected between the distribution manifold and process chamber to control gas flow there between, and a back pressure controller provided in fluid parallel relationship to the one or more mass flow controllers, wherein precise flow ratio control is achieved. Alternate embodiments include an upstream pressure controller configured to control flow of carrier gas to control back pressure. Further methods and assemblies for controlling zonal gas flow ratios are described, as are other aspects.
    Type: Application
    Filed: March 15, 2016
    Publication date: September 21, 2017
    Inventors: Kevin Brashear, Ashley M. Okada, Dennis L. Demars, Zhiyuan Ye, Jaidev Rajaram, Marcel E. Josephson
  • Patent number: 9347696
    Abstract: Apparatus for thermal management of a precursor for use in substrate processing are provided herein. In some embodiments, an apparatus for thermal management of a precursor for use in substrate processing may include a body having an opening sized to receive a storage container having a liquid or solid precursor disposed therein, the body fabricated from thermally conductive material; one or more thermoelectric devices coupled to the body proximate the opening; and a heat sink coupled to the one or more thermoelectric devices.
    Type: Grant
    Filed: May 24, 2013
    Date of Patent: May 24, 2016
    Assignee: APPLIED MATERIALS, INC.
    Inventors: David K. Carlson, Errol Antonio C. Sanchez, Kenric Choi, Marcel E. Josephson, Dennis Demars
  • Patent number: 9279604
    Abstract: Methods and apparatus for thermal management of a precursor for use in substrate processing are provided herein. In some embodiments, an apparatus for thermal management of a precursor for use in substrate processing may include a body having an opening sized to receive a storage container having a liquid or solid precursor disposed therein, the body fabricated from thermally conductive material; one or more thermoelectric devices coupled to the body proximate the opening; a heat sink coupled to the one or more thermoelectric devices; and a fan disposed proximate to a back side of the heat sink to provide a flow of air to the heat sink.
    Type: Grant
    Filed: May 24, 2013
    Date of Patent: March 8, 2016
    Assignee: APPLIED MATERIALS, INC.
    Inventors: David K. Carlson, Errol Antonio C. Sanchez, Kenric Choi, Marcel E. Josephson, Dennis Demars, Emre Cuvalci, Mehmet Tugrul Samir
  • Patent number: 9032990
    Abstract: Embodiments of chemical delivery systems disclosed herein may include an enclosure; a first compartment disposed within the enclosure and having a plurality of first conduits to carry a first set of chemical species, the first compartment further having a first draw opening and a first exhaust opening to facilitate flow of a purge gas through the first compartment; and a second compartment disposed within the enclosure and having a plurality of second conduits to carry a second set of chemical species, the second compartment further having a second draw opening and a second exhaust opening to facilitate flow of the purge gas through the second compartment, wherein the first set of chemical species is different than the second set of chemical species, and wherein a draw velocity of the purge gas through the second compartment is higher than the draw velocity of the purge gas through the first compartment.
    Type: Grant
    Filed: April 6, 2012
    Date of Patent: May 19, 2015
    Assignee: APPLIED MATERIALS, INC.
    Inventors: Marcel E. Josephson, David K. Carlson, Steve Jumper, Errol Antonio C. Sanchez
  • Publication number: 20130319015
    Abstract: Methods and apparatus for thermal management of a precursor for use in substrate processing are provided herein. In some embodiments, an apparatus for thermal management of a precursor for use in substrate processing may include a body having an opening sized to receive a storage container having a liquid or solid precursor disposed therein, the body fabricated from thermally conductive material; one or more thermoelectric devices coupled to the body proximate the opening; a heat sink coupled to the one or more thermoelectric devices; and a fan disposed proximate to a back side of the heat sink to provide a flow of air to the heat sink.
    Type: Application
    Filed: May 24, 2013
    Publication date: December 5, 2013
    Inventors: DAVID K. CARLSON, ERROL ANTONIO C. SANCHEZ, KENRIC CHOI, MARCEL E. JOSEPHSON, DENNIS DEMARS, EMRE CUVALCI, MEHMET TUGRUL SAMIR
  • Publication number: 20130319013
    Abstract: Apparatus for thermal management of a precursor for use in substrate processing are provided herein. In some embodiments, an apparatus for thermal management of a precursor for use in substrate processing may include a body having an opening sized to receive a storage container having a liquid or solid precursor disposed therein, the body fabricated from thermally conductive material; one or more thermoelectric devices coupled to the body proximate the opening; and a heat sink coupled to the one or more thermoelectric devices.
    Type: Application
    Filed: May 24, 2013
    Publication date: December 5, 2013
    Inventors: DAVID K. CARLSON, ERROL ANTONIO C. SANCHEZ, KENRIC CHOI, MARCEL E. JOSEPHSON, DENNIS DEMARS
  • Publication number: 20120266984
    Abstract: Embodiments of chemical delivery systems disclosed herein may include an enclosure; a first compartment disposed within the enclosure and having a plurality of first conduits to carry a first set of chemical species, the first compartment further having a first draw opening and a first exhaust opening to facilitate flow of a purge gas through the first compartment; and a second compartment disposed within the enclosure and having a plurality of second conduits to carry a second set of chemical species, the second compartment further having a second draw opening and a second exhaust opening to facilitate flow of the purge gas through the second compartment, wherein the first set of chemical species is different than the second set of chemical species, and wherein a draw velocity of the purge gas through the second compartment is higher than the draw velocity of the purge gas through the first compartment.
    Type: Application
    Filed: April 6, 2012
    Publication date: October 25, 2012
    Applicant: APPLIED MATERIALS, INC.
    Inventors: MARCEL E. JOSEPHSON, DAVID K. CARLSON, STEVE JUMPER, ERROL ANTONIO C. SANCHEZ
  • Patent number: 7798388
    Abstract: The present invention relates to a method of diffusion bonding of steel and steel alloys, to fabricate a fluid delivery system of the kind which would be useful in semiconductor processing and in other applications which require high purity fluid handling.
    Type: Grant
    Filed: May 31, 2007
    Date of Patent: September 21, 2010
    Assignee: Applied Materials, Inc.
    Inventors: Mark Crockett, John W. Lane, Vincent Kirchhoff, Marcel E. Josephson, Hong P. Gao, Bhaswan Manjunath
  • Publication number: 20090072009
    Abstract: The present invention relates to diffusion bonding of patterned sheets to form a fluid flow handling structure, and to a method of preventing bonding between a load distribution block and a plate set of stacked sheets during the diffusion bonding process.
    Type: Application
    Filed: October 21, 2008
    Publication date: March 19, 2009
    Inventors: Mark Crockett, John W. Lane, Vincent Kirchhoff, Marcel E. Josephson, Hong P. Gao, Bhaswan Manjunath
  • Publication number: 20090057375
    Abstract: The present invention relates to a method of diffusion bonding sheets of patterned material to fabricate a fluid delivery system; and particularly relates to a method of improving the interior surface roughness of fluid flow conduits formed within the diffusion bonded fluid delivery system structure.
    Type: Application
    Filed: October 21, 2008
    Publication date: March 5, 2009
    Inventors: Mark Crockett, John W. Lane, Vincent Kirchhoff, Marcel E. Josephson, Hong P. Gao, Bhaswan Manjunath
  • Publication number: 20080296354
    Abstract: The present invention relates to stainless steel sheets which would be useful in semiconductor processing and in other applications which require high purity fluid handling. The invention also relates to a method of selecting and processing such sheets.
    Type: Application
    Filed: May 31, 2007
    Publication date: December 4, 2008
    Inventors: MARK CROCKETT, John W. Lane, Vincent Kirchhoff, Marcel E. Josephson, Hong P. Gao, Bhaswan Manjunath
  • Publication number: 20080296351
    Abstract: The present invention relates to a method of diffusion bonding of steel and steel alloys, to fabricate a fluid delivery system of the kind which would be useful in semiconductor processing and in other applications which require high purity fluid handling.
    Type: Application
    Filed: May 31, 2007
    Publication date: December 4, 2008
    Inventors: Mark Crockett, John W. Lane, Vincent Kirchhoff, Marcel E. Josephson, Hong P. Gao, Bhaswan Manjunath