Abstract: A lithographic apparatus includes a radiation source configured to provide radiation to an illumination system, the radiation source configured to provide radiation in a first wavelength range and in a second wavelength range, the second wavelength range being different from the first wavelength range. A support is configured to support a patterning device, the patterning device is configured to impart the radiation with a pattern in its cross-section. A substrate table is configured to hold a substrate, and a projection system is configured to project the patterned radiation onto a target portion of a substrate. The first wavelength range is the primary wavelength of the lithographic apparatus. The second wavelength range is used for setup of the lithographic apparatus, the setup including one or more of calibration, qualification, performance test, and alignment. The second wavelength range may also be used for exposure of a further substrate.

Abstract: The invention pertains to a lithographic apparatus including a radiation system configured to condition a beam of radiation; a projection system configured to project the beam of radiation onto a target portion of a substrate; a displacement device configured to move the moveable object relative to the projection system in substantially a first direction and a second direction differing from the first direction; and a measuring device configured to measure a displacement of the moveable object in a third direction, which is substantially perpendicular to the first direction and to the second direction, wherein the measuring device may include an encoder system.