Abstract: A flow cytometry system having a flow channel defined through the thickness of a substrate is disclosed. Fluid flowing through the flow channel is illuminated by a first plurality of surface waveguides that are arranged around the flow channel in a first plane, while a second plurality of surface waveguides arranged around the flow channel in a second plane receive light after it has interacted with the fluid. The illumination pattern provided to the fluid is controlled by controlling the phase of the light in the first plurality of surface waveguides. As a result, the fluid is illuminated with light that is uniform and has a low coefficient of variation, improving the ability to distinguish and quantify characteristics of the fluid, such as cell count, DNA content, and the like.

Abstract: A method for forming a non-linear thickness-profile in a first layer of a first material is disclosed. The method comprises forming an accelerator layer of a second material on the first layer and forming a mask layer disposed on the accelerator layer, wherein the mask layer enables the accelerator layer to expose the first layer to a first etchant in a first region, where the exposure time for each point along a first axis varies non-linearly as a function of distance from a first point on the first axis. Since the time for which the first layer is exposed to the first etch in the first region is non-linear, the thickness of the first layer in the first region changes non-linearly along the first axis.

Abstract: A flow cytometry system having a flow channel defined through the thickness of a substrate is disclosed. Fluid flowing through the flow channel is illuminated by a first plurality of surface waveguides that are arranged around the flow channel in a first plane, while a second plurality of surface waveguides arranged around the flow channel in a second plane receive light after it has interacted with the fluid. The illumination pattern provided to the fluid is controlled by controlling the phase of the light in the first plurality of surface waveguides. As a result, the fluid is illuminated with light that is uniform and has a low coefficient of variation, improving the ability to distinguish and quantify characteristics of the fluid, such as cell count, DNA content, and the like.

Abstract: A flow cytometry system having a flow channel defined through the thickness of a substrate is disclosed. Fluid flowing through the flow channel is illuminated by a first plurality of surface waveguides that are arranged around the flow channel in a first plane, while a second plurality of surface waveguides arranged around the flow channel in a second plane receive light after it has interacted with the fluid. The illumination pattern provided to the fluid is controlled by controlling the phase of the light in the first plurality of surface waveguides. As a result, the fluid is illuminated with light that is uniform and has a low coefficient of variation, improving the ability to distinguish and quantify characteristics of the fluid, such as cell count, DNA content, and the like.

Abstract: A method for forming a non-linear thickness-profile in a first layer of a first material is disclosed. The method comprises forming an accelerator layer of a second material on the first layer and forming a mask layer disposed on the accelerator layer, wherein the mask layer enables the accelerator layer to expose the first layer to a first etchant in a first region, where the exposure time for each point along a first axis varies non-linearly as a function of distance from a first point on the first axis. Since the time for which the first layer is exposed to the first etch in the first region is non-linear, the thickness of the first layer in the first region changes non-linearly along the first axis.

Abstract: A method for forming a non-linear thickness-profile in a first layer of a first material is disclosed. The method comprises forming an accelerator layer of a second material on the first layer and forming a mask layer disposed on the accelerator layer, wherein the mask layer enables the accelerator layer to expose the first layer to a first etchant in a first region, where the exposure time for each point along a first axis varies non-linearly as a function of distance from a first point on the first axis. Since the time for which the first layer is exposed to the first etch in the first region is non-linear, the thickness of the first layer in the first region changes non-linearly along the first axis.

Abstract: A flow cytometry system having a flow channel defined through the thickness of a substrate is disclosed. Fluid flowing through the flow channel is illuminated by a first plurality of surface waveguides that are arranged around the flow channel in a first plane, while a second plurality of surface waveguides arranged around the flow channel in a second plane receive light after it has interacted with the fluid. The illumination pattern provided to the fluid is controlled by controlling the phase of the light in the first plurality of surface waveguides. As a result, the fluid is illuminated with light that is uniform and has a low coefficient of variation, improving the ability to distinguish and quantify characteristics of the fluid, such as cell count, DNA content, and the like.

Abstract: A method for forming a non-linear thickness-profile in a first layer of a first material is disclosed. The method comprises forming an accelerator layer of a second material on the first layer and forming a mask layer disposed on the accelerator layer, wherein the mask layer enables the accelerator layer to expose the first layer to a first etchant in a first region, where the exposure time for each point along a first axis varies non-linearly as a function of distance from a first point on the first axis. Since the time for which the first layer is exposed to the first etch in the first region is non-linear, the thickness of the first layer in the first region changes non-linearly along the first axis.

Abstract: A method for forming a tapered region in a first layer of a first material is disclosed. The method comprises forming an accelerator layer of a second material on the first layer and forming a mask layer disposed on the accelerator layer. The accelerator layer is exposed to a first etch that removes the second material in a first region and laterally etches the accelerator layer along a second region to expose the first layer in the second region to the first etch. Since the time for which the first layer is exposed to the first etch in the second region is based on the progress of the lateral etch of the accelerator layer, the first etch tapers the first layer in the second region.

Abstract: A system having an optical-coupling region for evanescently coupling light between first and second optical-waveguiding structures is disclosed. Within the optical-coupling region, the first and second optical-waveguiding structures exhibit mirror symmetry with respect to each other across or about at least one of a plane and an axis and include a segment that is not straight.

Abstract: A system having an optical-coupling region for evanescently coupling light between first and second optical-waveguiding structures is disclosed. Within the optical-coupling region, the first and second optical-waveguiding structures exhibit mirror symmetry with respect to each other across or about at least one of a plane and an axis and include a segment that is not straight.

Abstract: The illustrative embodiment of the invention is a surface waveguide having low modal birefringence. The surface waveguide has a composite guiding region that is sandwiched by a lower cladding layer and an upper cladding layer, wherein the cladding layers serve to confine propagating light to the composite guiding region. In accordance with the illustrative embodiment, the composite guiding region is structured so that it exhibits a balanced stress configuration, wherein the stress in the direction that aligns with the TE polarization mode is substantially equal to the stress in the direction that aligns with the TM polarization mode. The balanced stress configuration results in a surface waveguide that exhibits very low modal birefringence.

Abstract: A surface waveguide is disclosed. In the illustrative embodiment, the waveguide has a core and an upper and lower cladding. The core has a thickness that is greater than the critical thickness of the material that composes the core. This is achieved by depositing/growing the core as a conformal layer within a region that is recessed from the planar surface of the lower cladding, wherein the recessed region has a width that is no more than twice the critical thickness of the core material.

Abstract: A surface waveguide is disclosed. In the illustrative embodiment, the waveguide has a core and an upper and lower cladding. The core has a thickness that is greater than the critical thickness of the material that composes the core. This is achieved by depositing/growing the core as a conformal layer within a region that is recessed from the planar surface of the lower cladding, wherein the recessed region has a width that is no more than twice the critical thickness of the core material.

Abstract: The illustrative embodiment of the invention is a surface waveguide having low modal birefringence. The surface waveguide has a composite guiding region that is sandwiched by a lower cladding layer and an upper cladding layer, wherein the cladding layers serve to confine propagating light to the composite guiding region. In accordance with the illustrative embodiment, the composite guiding region is structured so that it exhibits a balanced stress configuration, wherein the stress in the direction that aligns with the TE polarization mode is substantially equal to the stress in the direction that aligns with the TM polarization mode. The balanced stress configuration results in a surface waveguide that exhibits very low modal birefringence.