Patents by Inventor Marcel Joseph Louis BOONEN

Marcel Joseph Louis BOONEN has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Particle suppression systems and methods
    Patent number: 11137694
    Abstract: A lithographic apparatus that includes an illumination system that conditions a radiation beam, a first stationary plate having a first surface, and a reticle stage defining, along with the first stationary plate, a first chamber. The reticle stage supports a reticle in the first chamber, and the reticle stage includes a first surface spaced apart from a second surface of the first stationary plate, thereby defining a first gap configured to suppress an amount of contamination passing from a second chamber to the first chamber. The first stationary plate is between the reticle stage and both the illumination system and a projection system configured to project a pattern imparted to the radiation beam by the patterning device onto a substrate.
    Type: Grant
    Filed: July 18, 2018
    Date of Patent: October 5, 2021
    Assignees: ASML Netherlands B.V., ASML Holding N V.
    Inventors: Yang-Shan Huang, Marcel Joseph Louis Boonen, Han-Kwang Nienhuys, Jacob Brinkert, Richard Joseph Bruls, Peter Conrad Kochersperger
  • PARTICLE SUPPRESSION SYSTEMS AND METHODS
    Publication number: 20210173315
    Abstract: A lithographic apparatus that includes an illumination system that conditions a radiation beam, a first stationary plate having a first surface, and a reticle stage defining, along with the first stationary plate, a first chamber. The reticle stage supports a reticle in the first chamber, and the reticle stage includes a first surface spaced apart from a second surface of the first stationary plate, thereby defining a first gap configured to suppress an amount of contamination passing from a second chamber to the first chamber. The first stationary plate is between the reticle stage and both the illumination system and a projection system configured to project a pattern imparted to the radiation beam by the patterning device onto a substrate.
    Type: Application
    Filed: July 18, 2018
    Publication date: June 10, 2021
    Applicants: ASML NETHERLANDS B.V., ASML HOLDING N.V.
    Inventors: Yang-Shan HUANG, Marcel Joseph Louis BOONEN, Han-Kwang NIENHUYS, Jacob BRINKERT, Richard Joseph BRULS, Peter Conrad KOCHERSPERGER