Patents by Inventor Marcel Mathijs Dierichs

Marcel Mathijs Dierichs has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20070115449
    Abstract: A lithographic apparatus includes a device having a blade selectively insertable into the beam. The device is in a first plane intermediate a second plane conjugate to a plane of the substrate and a third plane conjugate to a pupil plane of the projection system. The blade may include a partially opaque blade and a solid blade or have a predetermined transmissibility pattern. The transmissibility may vary in a second direction perpendicular to the first direction in which the substrate and the patterning device are movable. In an illumination system including a field faceted mirror and a pupil faceted mirror, a reflecting blade is selectively insertable into the beam to reflect a portion of the beam to a beam dump that may be cooled to reduce a heat load. The reflecting element may have a coating that scatters the portion of radiation or changes the phase.
    Type: Application
    Filed: December 11, 2006
    Publication date: May 24, 2007
    Applicant: ASML Netherlands B.V.
    Inventors: Marcel Mathijs Dierichs, Hans Van Der Laan, Hendrikus Van Greevenbroek
  • Publication number: 20070103655
    Abstract: A substrate is provided with a coating of material which is substantially transparent to the wavelength of the projection beam. The coating may be thicker than the wavelength of the projection beam and have a refractive index of the coating such that the wavelength of the projection beam is shortened as it passes through it. This allows the imaging of smaller features on the substrate. Alternatively, the coating may be used with a liquid supply system and act to keep bubbles away from a radiation sensitive layer of the substrate.
    Type: Application
    Filed: December 21, 2006
    Publication date: May 10, 2007
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Marcel Mathijs Dierichs, Johannes Catharinus Mulkens, Bob Streefkerk
  • Publication number: 20070046915
    Abstract: A lithographic apparatus and device manufacturing method is provided in which exposure is carried out by projecting through a liquid having a pH of less than 7, the liquid being in contact with a substrate to be exposed. The liquid advantageously comprises an anti-reflective topcoat.
    Type: Application
    Filed: February 16, 2006
    Publication date: March 1, 2007
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Bob Streefkerk, Marcel Mathijs Dierichs, Wendy Gehoel-Van Ansem
  • Publication number: 20060119824
    Abstract: A lithographic projection apparatus includes an illumination system configured to provide a beam of radiation; a support configured to support a patterning device, the patterning device configured to impart the beam of radiation with a pattern in its cross section; a substrate table configured to hold a substrate, and a projection system configured to project the patterned radiation onto a target portion of the substrate. The illumination system includes a plurality of radiation sources; a pupil facet mirror; and a plurality of field facet mirrors, each field facet mirror being associated with one of the radiation sources and each field facet of a given field facet mirror being configured to image the associated source onto one of a plurality of pupil facets on the pupil facet mirror, each pupil facet being adapted to direct the source image received to a predetermined area to form the beam of radiation.
    Type: Application
    Filed: December 2, 2004
    Publication date: June 8, 2006
    Applicant: ASML NETHERLANDS B.V.
    Inventor: Marcel Mathijs Dierichs
  • Publication number: 20060072088
    Abstract: A lithographic apparatus is provided in which exposure is carried out by projecting through an aqueous solution of alkali metal halide(s), the solution being in contact with the substrate to be exposed.
    Type: Application
    Filed: October 5, 2004
    Publication date: April 6, 2006
    Applicants: ASML NETHERLANDS B.V., ASML HOLDING N.V.
    Inventors: Matthew Lipson, Marcel Mathijs Dierichs, Sjoerd Nicolaas Donders, Johannes Catharinus Mulkens, Bob Streefkerk, Ronald Wilklow, Roel De Jonge
  • Publication number: 20060012770
    Abstract: A lithographic apparatus is provided with a diffuser unit including a fluid that includes diffuser particles that are able to diffuse rays in a beam of radiation used to illuminate an object, for example a mask or a wafer. The diffuser particles may be solid particles or gas bubbles in a liquid. The fluid and the diffuser particles may be moved, for example perpendicularly to the beam of radiation, or perpendicularly to a scanning direction of the beam of radiation in a scanning lithographic apparatus, in order to improve the diffusion action. As the radiation to illuminate is diffused and homogenized, subsequent illumination is improved. The apparatus may be used to manufacture CCD's and the like, since when viewed by the human eye they show a homogeneity preferably better than 0.02%.
    Type: Application
    Filed: July 14, 2004
    Publication date: January 19, 2006
    Applicant: ASML NETHERLANDS B.V.
    Inventor: Marcel Mathijs Dierichs
  • Publication number: 20050221238
    Abstract: A lithographic apparatus comprising a patterning reticle which has an aluminium absorber layer which improves imaging by eliminating or at least minimising the formation of aberrations in a patterned beam.
    Type: Application
    Filed: April 2, 2004
    Publication date: October 6, 2005
    Applicant: ASML NETHERLANDS B.V.
    Inventor: Marcel Mathijs Dierichs
  • Publication number: 20050175776
    Abstract: An immersion lithographic projection apparatus is disclosed in which liquid is provided between a projection system of the apparatus and a substrate. The use of both liquidphobic and liquidphilic layers on various elements of the apparatus is provided to help prevent formation of bubbles in the liquid and to help reduce residue on the elements after being in contact with the liquid.
    Type: Application
    Filed: November 12, 2004
    Publication date: August 11, 2005
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Bod Streefkerk, Johannes Baselmans, Richard Bruls, Marcel Mathijs Dierichs, Sjoerd Donders, Christiaan Hoogendam, Hans Jansen, Erik Loopstra, Jeroen Johannes Mertens, Johannes Mulkens, Ronald Severijns, Sergei Shulepov, Herman Boom, Timotheus Sengers
  • Publication number: 20050175940
    Abstract: A method of reducing the effect of bubbles on the imaging quality of an immersion lithography apparatus, in which a top coating is applied to a substrate to keep bubbles away from a radiation sensitive layer of the substrate.
    Type: Application
    Filed: February 11, 2004
    Publication date: August 11, 2005
    Applicant: ASML NETHERLANDS B.V.
    Inventor: Marcel Mathijs Dierichs
  • Publication number: 20050146702
    Abstract: The present invention provides a lithographic apparatus comprising an illumination system for providing a projection beam of radiation. The illumination system comprises at least one movable optical element (7), such that a projection beam of radiation (4) can be shifted around a central position. This ensures that inhomogeneities in the intensity distribution in the projection beam (4) will be smeared out, which in turn provides an improved homogeneity of the exposure of a surface to be illuminated by the system, such as a wafer or other substrate. The optical element (7) may comprise a motor movable mirror, prism, filter, lens, axicon, diffuser, diffractive optical array, optical integrator, etc. The invention further provides a device manufacturing method, using a lithographic apparatus according to the invention, wherein the optical element is moved, in order to provide an optimum homogeneity for the projection beam of radiation.
    Type: Application
    Filed: October 29, 2004
    Publication date: July 7, 2005
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Markus Eurlings, Johannes Baselmans, Hako Botma, Jan Bruining, Marcel Mathijs Dierichs, Antonius Johannes Dijsseldonk, Judocus Stoeldraijer
  • Publication number: 20050133727
    Abstract: An assembly for detection of at least one of radiation flux and contamination on an optical component includes a detector configured to receive at least one of the radiation flux and contamination, and when the assembly is in use, to generate a detector signal correlated to at least one of the radiation flux and contamination on the component. A meter is configured to measure the detector signal. The detector includes at least one wire.
    Type: Application
    Filed: December 22, 2003
    Publication date: June 23, 2005
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Vadim Banine, Levinus Bakker, Johannes Hubertus Moors, Lucas Henricus Johannes Stevens, Yurii Sidelnikov, Marcel Mathijs Dierichs, Marius Ravensbergen
  • Publication number: 20050042554
    Abstract: A substrate is provided with a coating of material which is substantially transparent to the wavelength of the projection beam. The coating may be thicker than the wavelength of the projection beam and have a refractive index of the coating such that the wavelength of the projection beam is shortened as it passes through it. This allows the imaging of smaller features on the substrate. Alternatively, the coating may be used with a liquid supply system and act to keep bubbles away from a radiation sensitive layer of the substrate.
    Type: Application
    Filed: July 26, 2004
    Publication date: February 24, 2005
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Marcel Mathijs Dierichs, Johannes Catharinus Mulkens, Bob Streefkerk
  • Publication number: 20050024609
    Abstract: A lithographic apparatus and device manufacturing method makes use of a liquid confined in a reservoir between the projection system and the substrate. Bubbles forming in the liquid from dissolved atmospheric gases or from out-gassing from apparatus elements exposed to the liquid are detected and/or removed so that they do not interfere with exposure and lead to printing defects on the substrate. Detection may be carried out by measuring the frequency dependence of ultrasonic attenuation in the liquid and bubble removal may be implemented by degassing and pressurizing the liquid, isolating the liquid from the atmosphere, using liquids of low surface tension, providing a continuous flow of liquid through the imaging field, and/or phase shifting ultrasonic standing-wave node patterns.
    Type: Application
    Filed: June 4, 2004
    Publication date: February 3, 2005
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Joannes De Smit, Vadim Banine, Theodorus Josephus Bisschops, Marcel Mathijs Dierichs, Theodorus Modderman
  • Publication number: 20050007570
    Abstract: A lithographic apparatus and device manufacturing method is provided in which exposure is carried out by projecting through a liquid having a pH of less than 7, the liquid being in contact with a substrate to be exposed. The liquid advantageously comprises an anti-reflective topcoat.
    Type: Application
    Filed: May 25, 2004
    Publication date: January 13, 2005
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Bob Streefkerk, Marcel Mathijs Dierichs, Wendy Gehoel-Van Ansem