Patents by Inventor Marcel Maurice Hemerik

Marcel Maurice Hemerik has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Sensor and lithographic apparatus
    Patent number: 7459669
    Abstract: A sensor for use in a lithographic apparatus, the sensor having a liquid to prevent optical losses, especially when receiving radiation with a high NA. The liquid is fixed between two surfaces by capillary forces in an area through which radiation passes.
    Type: Grant
    Filed: December 30, 2005
    Date of Patent: December 2, 2008
    Assignee: ASML Netherlands B.V.
    Inventors: Rob Adrianus Antonius Maria Bastiaensen, Marcel Maurice Hemerik, Marcus Adrianus Van De Kerkhof, Jeroen Johannes Sophia Maria Mertens, Jacob Sonneveld
  • Lithographic apparatus, device manufacturing method, and device manufactured thereby
    Patent number: 6906787
    Abstract: A lithographic projection apparatus includes a radiation system for providing a projection beam of primary radiation, a support structure for supporting patterning structure, the patterning structure serving to pattern the projection beam according to a desired pattern, a substrate table for holding a substrate, a projection system for projecting the patterned beam onto a target portion of the substrate, a radiation sensor which is moveable in a path traversed by the projection beam, for receiving primary radiation out of the projection beam, the sensor including a radiation-sensitive material which converts incident primary radiation into secondary radiation, a radiation detector capable of detecting said secondary radiation emerging from said material, and a filter material for preventing secondary radiation from traveling in a direction away from the radiation detector.
    Type: Grant
    Filed: November 20, 2003
    Date of Patent: June 14, 2005
    Assignee: ASML Netherlands B.V.
    Inventors: Marcus Adrianus Van De Kerhof, Wilhelmus Petrus De Boeij, Marcel Maurice Hemerik
  • Lithographic apparatus, device manufacturing method, and device manufactured thereby
    Publication number: 20040114120
    Abstract: A lithographic projection apparatus includes a radiation system for providing a projection beam of primary radiation, a support structure for supporting patterning structure, the patterning structure serving to pattern the projection beam according to a desired pattern, a substrate table for holding a substrate, a projection system for projecting the patterned beam onto a target portion of the substrate, a radiation sensor which is moveable in a path traversed by the projection beam, for receiving primary radiation out of the projection beam, the sensor including a radiation-sensitive material which converts incident primary radiation into secondary radiation, a radiation detector capable of detecting said secondary radiation emerging from said material, and a filter material for preventing secondary radiation from traveling in a direction away from the radiation detector.
    Type: Application
    Filed: November 20, 2003
    Publication date: June 17, 2004
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Marcus Adrianus Van De Kerhof, Wilhelmus Petrus De Boeij, Marcel Maurice Hemerik