Patents by Inventor Marcel Niestadt

Marcel Niestadt has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11239045
    Abstract: Correctors for correcting two-fold, fifth-order parasitic aberrations in charged particle systems according to the present disclosure include a first corrective component that generates a first quadrupole field when a first excitation is applied to the first corrective component, and a second corrective component that generates a second quadrupole field when a second excitation is applied to the second corrective component. Correctors according to the present disclosure also include a quadrupole positioned between the second corrective component and the sample when used in the charged particle microscope system that generates a third quadrupole field. The third quadrupole field, in combination with at least the first quadrupole field and the second quadrupole field, corrects the fifth-order, two-fold aberrations when the charged particle microscope is in use.
    Type: Grant
    Filed: September 30, 2020
    Date of Patent: February 1, 2022
    Assignee: FEI Company
    Inventors: Alexander Henstra, Marcel Niestadt
  • Patent number: 11114271
    Abstract: Correctors for correcting axial aberrations of a particle-optical lens in a charged particle microscope system, according to the present disclosure include a first primary multipole that generates a first primary multipole field when a first excitation is applied to the first primary multipole, and a second primary multipole that generates a second primary multipole field when a second excitation is applied to the second primary multipole. The first primary multipole is not imaged onto the second primary multipole such that a combination fourth-order aberration is created. The correctors further include a secondary multipole for correcting the fourth-order aberration and the sixth-order aberration. Such correctors may further include a tertiary multipole for correcting an eighth-order aberration.
    Type: Grant
    Filed: November 22, 2019
    Date of Patent: September 7, 2021
    Assignee: FEI Company
    Inventors: Alexander Henstra, Peter Christiaan Tiemeijer, Marcel Niestadt
  • Publication number: 20210159044
    Abstract: Correctors for correcting axial aberrations of a particle-optical lens in a charged particle microscope system, according to the present disclosure include a first primary multipole that generates a first primary multipole field when a first excitation is applied to the first primary multipole, and a second primary multipole that generates a second primary multipole field when a second excitation is applied to the second primary multipole. The first primary multipole is not imaged onto the second primary multipole such that a combination fourth-order aberration is created. The correctors further include a secondary multipole for correcting the fourth-order aberration and the sixth-order aberration. Such correctors may further include a tertiary multipole for correcting an eighth-order aberration.
    Type: Application
    Filed: November 22, 2019
    Publication date: May 27, 2021
    Applicant: FEI Company
    Inventors: Alexander Henstra, Peter Christiaan Tiemeijer, Marcel Niestadt
  • Patent number: 5886463
    Abstract: The thin-type display device (1) has a transparent front wall (3), which is provided with a display screen, and a rear wall (24) which extends parallel to said front wall (3), and said display device comprises at least an electron source and a duct structure. The display device (1) is characterized in that the rear wall (24) and walls (22, 22', 22") of the ducts of the duct structure are manufactured in a single piece. Preferably, the walls (22, 22', 22") of the ducts widen in the direction of the rear wall (24), with the angle, which opposing faces of the walls (22, 22', 22") of the ducts make with each other, ranging from 1.degree. to 30.degree.. Preferably, the rear wall (24) further comprises at least an upright side wall (32), which is integral with the rear wall (24). Preferably, the walls (22, 22', 22") are made from a glass having a temperature interval between the operating temperature and the softening temperature of less than 420.degree., perferably less than 360.degree.
    Type: Grant
    Filed: January 31, 1997
    Date of Patent: March 23, 1999
    Assignee: U.S. Philips Corporation
    Inventors: Johannes H.M. Damen, Hermanus N. Tuin, Johannes T.H. Leijten, Cornelus H.M. Van Bommel, Wilhelmus N.M. Selten, Martinus G.F.C. Sanders, Franciscus M.H. Van Laarhoven, Marcel Niestadt
  • Patent number: 5455966
    Abstract: The inner surface of a cathode ray tube is roughened by blasting the surface with a suspension which comprises radiation particles, the inner surface being irradiated in such a manner that it satisfies the inequalities 0.05 .mu.m<R.sub.a <0.5 .mu.m and R.sub.z <4 .mu.m and, preferably, 0.1 .mu.m<R.sub.a <0.2 .mu.m. The reflection at such a surface is comparable to the reflection at an etched surface. The method in accordance with the invention is safer and less harmful to the environment.
    Type: Grant
    Filed: November 18, 1993
    Date of Patent: October 3, 1995
    Assignee: U.S. Philips Corporation
    Inventors: Hermanus N. Tuin, Maarten A. van Andel, Rudolf O. M. Lobel, Johannes H. M. Damen, Marcel Niestadt
  • Patent number: 5240748
    Abstract: To reduce reflection at a surface of a cathode ray tube display window, the surface is provided with a pattern of irregularities formed by ultraviolet laser radiation. Preferably the inside surface of the display window of the cathode ray tube is treated with the pattern of irregularities followed by a phosphor pattern over the treated surface. In one embodiment, a transmission grating is used to pass ultraviolet radiation to form the irregularities.
    Type: Grant
    Filed: December 13, 1991
    Date of Patent: August 31, 1993
    Assignee: U.S. Philips Corporation
    Inventors: Johannes M. A. Van Esdonk, Marcel Niestadt