Patents by Inventor Marcel Theodorus Maria VAN KESSEL

Marcel Theodorus Maria VAN KESSEL has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Method of determining a position of a feature
    Patent number: 11392044
    Abstract: A method, system and program for determining a position of a feature referenced to a substrate. The method includes measuring a position of the feature, receiving an intended placement of the feature and determining an estimate of a placement error based on knowledge of a relative position of a first reference feature referenced to a first layer on a substrate with respect to a second reference feature referenced to a second layer on a substrate. The updated position may be used to position the layer of the substrate having the feature, or another layer of the substrate, or another layer of another substrate.
    Type: Grant
    Filed: January 16, 2020
    Date of Patent: July 19, 2022
    Assignee: ASML Netherlands B.V.
    Inventors: Ralph Timotheus Huijgen, Marc Jurian Kea, Marcel Theodorus Maria Van Kessel, Masashi Ishibashi, Chi-Hsiang Fan, Hakki Ergün Cekli, Youping Zhang, Maurits Van Der Schaar, Liping Ren
  • METHOD OF DETERMINING A POSITION OF A FEATURE
    Publication number: 20200150547
    Abstract: A method, system and program for determining a position of a feature referenced to a substrate. The method includes measuring a position of the feature, receiving an intended placement of the feature and determining an estimate of a placement error based on knowledge of a relative position of a first reference feature referenced to a first layer on a substrate with respect to a second reference feature referenced to a second layer on a substrate. The updated position may be used to position the layer of the substrate having the feature, or another layer of the substrate, or another layer of another substrate.
    Type: Application
    Filed: January 16, 2020
    Publication date: May 14, 2020
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Ralph Timotheus HUIJGEN, Marc Jurian Kea, Marcel Theodorus Maria Van Kessel, Masashi Ishibashi, Chi-Hsiang Fan, Hakki Ergün Cekli, Youping Zhang, Maurits Van Der Schaar, Liping Ren
  • Method of determining a position of a feature
    Patent number: 10578980
    Abstract: A method, system and program for determining a position of a feature referenced to a substrate. The method includes measuring a position of the feature, receiving an intended placement of the feature and determining an estimate of a placement error based on knowledge of a relative position of a first reference feature referenced to a first layer on a substrate with respect to a second reference feature referenced to a second layer on a substrate. The updated position may be used to position the layer of the substrate having the feature, or another layer of the substrate, or another layer of another substrate.
    Type: Grant
    Filed: November 23, 2017
    Date of Patent: March 3, 2020
    Assignee: ASML Netherlands B.V.
    Inventors: Ralph Timotheus Huijgen, Marc Jurian Kea, Marcel Theodorus Maria Van Kessel, Masashi Ishibashi, Chi-Hsiang Fan, Hakki Ergün Cekli, Youping Zhang, Maurits Van Der Schaar, Liping Ren
  • METHOD OF DETERMINING PELLICLE DEGRADATION COMPENSATION CORRECTIONS, AND ASSOCIATED LITHOGRAPHIC APPARATUS AND COMPUTER PROGRAM
    Publication number: 20190384164
    Abstract: A method for mitigating an effect of non-uniform pellicle degradation on control of a substrate patterning process and an associated lithographic apparatus. The method includes quantifying an effect of the non-uniform pellicle degradation on one or more properties of patterned features, such as one or more metrology targets, formed on the substrate by the substrate patterning process. A process control correction is then determined based on the quantification of the effect of the non-uniform pellicle degradation.
    Type: Application
    Filed: February 16, 2018
    Publication date: December 19, 2019
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Marcel Theodorus Maria VAN KESSEL, Frederik Eduard DE JONG, Cornelis Melchior BROUWER, Kevin VAN DE RUIT, Chung-Hsun LI
  • METHOD OF DETERMINING A POSITION OF A FEATURE
    Publication number: 20190339211
    Abstract: A method, system and program for determining a position of a feature referenced to a substrate. The method includes measuring a position of the feature, receiving an intended placement of the feature and determining an estimate of a placement error based on knowledge of a relative position of a first reference feature referenced to a first layer on a substrate with respect to a second reference feature referenced to a second layer on a substrate. The updated position may be used to position the layer of the substrate having the feature, or another layer of the substrate, or another layer of another substrate.
    Type: Application
    Filed: November 23, 2017
    Publication date: November 7, 2019
    Inventors: Ralph Timotheus HUIJGEN, Marc Jurian KEA, Marcel Theodorus Maria VAN KESSEL, Masashi ISHIBASHI, Chi-Hsiang FAN, Hakki Ergün CEKLI, Youping ZHANG, Maurits VAN DER SCHAAR, Liping REN