Abstract: An arrangement for depositing atomic layers on substrates produces very thin films in an evacuable reaction chamber. Substrates or wafers are arranged on a wafer chuck and the reaction chamber is connected via valves to a source for TMA, water and a cleaning gas. The invention is intended to significantly improve the coating process. This is achieved by virtue of the fact that the source for TMA and the source for water are connected to the reaction chamber via devices for directly or indirectly injecting the TMA and the water into the reaction chamber. It is preferable for the devices for injection to comprise valves, which are designed as injection valves.

Abstract: The invention relates to a method for generating ultrapure steam by oxidation of hydrogen in a closed torch with separate feed lines for hydrogen and oxygen and a discharge line for discharging the steam which is formed to a process chamber. The invention also relates to an arrangement for carrying out the method. The invention is intended to provide a method which is simple to implement and an arrangement for generating ultrapure steam which results in a significantly extended injector service life. For this purpose, oxygen and water are fed to the torch in a slightly superstoichiometric ratio, and pure additional oxygen is admixed with the steam formed during the combustion, when it enters the process chamber, in order to generate a considerable excess of oxygen in the steam. The associated device comprises a torch with feed lines for feeding hydrogen and oxygen to the closed torch and a discharge line leading to a process chamber. Each feed line being assigned a mass flow controller.

Abstract: A method for generating an oxide layer on a substrate such as a silicon wafer used for the manufacturing of microchips. The substrate is placed in an oven and an oxidising medium comprising oxygen is fed to the oven. To control the growth of the oxide layer the oxygen partial pressure in the exhaust is determined and, depending on the measured value, the feed of the components of the oxidising mediums are adjusted, so that the oxygen partial pressure in the oxygen gases is kept constant. The method allows the reproducible formation of oxide layers with a defined layer thickness.

Abstract: There is described a reactor for manufacturing a semiconductor device. The reactor includes a container for enclosing a gas and has an aperture and a surface ambient to the aperture. A seal for sealing the aperture of the container with a surface is pressed against the surface of the container. Portions of the surface of the container and corresponding portions of the surface of the seal form a combination of a beveled peak and groove surrounding the aperture. Therefore, with improved sealing a pressure variation of the gas within the container caused by a pressure variation in the ambient environment is reduced.

Abstract: The invention relates to a method for generating ultrapure steam by oxidation of hydrogen in a closed torch with separate feed lines for hydrogen and oxygen and a discharge line for discharging the steam which is formed to a process chamber. The invention also relates to an arrangement for carrying out the method. The invention is intended to provide a method which is simple to implement and an arrangement for generating ultrapure steam which results in a significantly extended injector service life. For this purpose, oxygen and water are fed to the torch in a slightly superstoichiometric ratio, and pure additional oxygen is admixed with the steam formed during the combustion, when it enters the process chamber, in order to generate a considerable excess of oxygen in the steam. The associated device comprises a torch with feed lines for feeding hydrogen and oxygen to the closed torch and a discharge line leading to a process chamber. Each feed line being assigned a mass flow controller.

Abstract: There is described a reactor for manufacturing a semiconductor device. The reactor includes a container for enclosing a gas and has an aperture and a surface ambient to the aperture. A seal for sealing the aperture of the container with a surface is pressed against the surface of the container. Portions of the surface of the container and corresponding portions of the surface of the seal form a combination of a beveled peak and groove surrounding the aperture. Therefore, with improved sealing a pressure variation of the gas within the container caused by a pressure variation in the ambient environment is reduced.