Patents by Inventor Marcel Trimpl

Marcel Trimpl has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20230230800
    Abstract: A scanning electron microscopy (SEM) system is disclosed. The SEM system includes an electron source configured to generate an electron beam and a set of electron optics configured to scan the electron beam across the sample and focus electrons scattered by the sample onto one or more imaging planes. The SEM system includes a first detector module positioned at the one or more imaging planes, wherein the first detector module includes a multipixel solid-state sensor configured to convert scattered particles, such as electrons and/or x-rays, from the sample into a set of equivalent signal charges. The multipixel solid-state sensor is connected to two or more Application Specific Integrated Circuits (ASICs) configured to process the set of signal charges from one or more pixels of the sensor.
    Type: Application
    Filed: March 20, 2023
    Publication date: July 20, 2023
    Inventor: Marcel Trimpl
  • Patent number: 11699607
    Abstract: A segmented detector device with backside illumination. The detector is able to collect and differentiate between secondary electrons and backscatter electrons. The detector includes a through-hole for passage of a primary electron beam. After hitting a sample, the reflected secondary and backscatter electrons are collected via a vertical structure having a P+/P?/N+ or an N+/N?/P+ composition for full depletion through the thickness of the device. The active area of the device is segmented using field isolation insulators located on the front side of the device.
    Type: Grant
    Filed: September 23, 2021
    Date of Patent: July 11, 2023
    Assignee: KLA Corporation
    Inventors: John Gerling, Lawrence Muray, Alan Brodie, James Spallas, Marcel Trimpl
  • Patent number: 11610757
    Abstract: A scanning electron microscopy (SEM) system is disclosed. The SEM system includes an electron source configured to generate an electron beam and a set of electron optics configured to scan the electron beam across the sample and focus electrons scattered by the sample onto one or more imaging planes. The SEM system includes a first detector module positioned at the one or more imaging planes, wherein the first detector module includes a multipixel solid-state sensor configured to convert scattered particles, such as electrons and/or x-rays, from the sample into a set of equivalent signal charges. The multipixel solid-state sensor is connected to two or more Application Specific Integrated Circuits (ASICs) configured to process the set of signal charges from one or more pixels of the sensor.
    Type: Grant
    Filed: August 21, 2020
    Date of Patent: March 21, 2023
    Assignee: KLA Corporation
    Inventor: Marcel Trimpl
  • Publication number: 20220399220
    Abstract: A segmented detector device with backside illumination. The detector is able to collect and differentiate between secondary electrons and backscatter electrons. The detector includes a through-hole for passage of a primary electron beam. After hitting a sample, the reflected secondary and backscatter electrons are collected via a vertical structure having a P+/P?/N+ or an N+/N?/P+ composition for full depletion through the thickness of the device. The active area of the device is segmented using field isolation insulators located on the front side of the device.
    Type: Application
    Filed: September 23, 2021
    Publication date: December 15, 2022
    Applicant: KLA Corporation
    Inventors: John Gerling, Lawrence Muray, Alan Brodie, James Spallas, Marcel Trimpl
  • Publication number: 20210066035
    Abstract: A scanning electron microscopy (SEM) system is disclosed. The SEM system includes an electron source configured to generate an electron beam and a set of electron optics configured to scan the electron beam across the sample and focus electrons scattered by the sample onto one or more imaging planes. The SEM system includes a first detector module positioned at the one or more imaging planes, wherein the first detector module includes a multipixel solid-state sensor configured to convert scattered particles, such as electrons and/or x-rays, from the sample into a set of equivalent signal charges.
    Type: Application
    Filed: August 21, 2020
    Publication date: March 4, 2021
    Inventor: Marcel Trimpl
  • Patent number: 10466212
    Abstract: A scanning electron microscope incorporates a multi-pixel solid-state electron detector. The multi-pixel solid-state detector may detect back-scattered and/or secondary electrons. The multi-pixel solid-state detector may incorporate analog-to-digital converters and other circuits. The multi-pixel solid state detector may be capable of approximately determining the energy of incident electrons and/or may contain circuits for processing or analyzing the electron signals. The multi-pixel solid state detector is suitable for high-speed operation such as at a speed of about 100 MHz or higher. The scanning electron microscope may be used for reviewing, inspecting or measuring a sample such as unpatterned semiconductor wafer, a patterned semiconductor wafer, a reticle or a photomask. A method of reviewing or inspecting a sample is also described.
    Type: Grant
    Filed: August 2, 2017
    Date of Patent: November 5, 2019
    Assignee: KLA—Tencor Corporation
    Inventors: David L. Brown, Yung-Ho Alex Chuang, John Fielden, Marcel Trimpl, Jingjing Zhang, Devis Contarato, Venkatraman Iyer
  • Publication number: 20170329025
    Abstract: A scanning electron microscope incorporates a multi-pixel solid-state electron detector. The multi-pixel solid-state detector may detect back-scattered and/or secondary electrons. The multi-pixel solid-state detector may incorporate analog-to-digital converters and other circuits. The multi-pixel solid state detector may be capable of approximately determining the energy of incident electrons and/or may contain circuits for processing or analyzing the electron signals. The multi-pixel solid state detector is suitable for high-speed operation such as at a speed of about 100 MHz or higher. The scanning electron microscope may be used for reviewing, inspecting or measuring a sample such as unpatterned semiconductor wafer, a patterned semiconductor wafer, a reticle or a photomask. A method of reviewing or inspecting a sample is also described.
    Type: Application
    Filed: August 2, 2017
    Publication date: November 16, 2017
    Inventors: David L. Brown, Yung-Ho Alex Chuang, John Fielden, Marcel Trimpl, Jingjing Zhang, Devis Contarato, Venkatraman Iyer
  • Patent number: 9767986
    Abstract: A scanning electron microscope incorporates a multi-pixel solid-state electron detector. The multi-pixel solid-state detector may detect back-scattered and/or secondary electrons. The multi-pixel solid-state detector may incorporate analog-to-digital converters and other circuits. The multi-pixel solid state detector may be capable of approximately determining the energy of incident electrons and/or may contain circuits for processing or analyzing the electron signals. The multi-pixel solid state detector is suitable for high-speed operation such as at a speed of about 100 MHz or higher. The scanning electron microscope may be used for reviewing, inspecting or measuring a sample such as unpatterned semiconductor wafer, a patterned semiconductor wafer, a reticle or a photomask. A method of reviewing or inspecting a sample is also described.
    Type: Grant
    Filed: August 25, 2015
    Date of Patent: September 19, 2017
    Assignee: KLA-Tencor Corporation
    Inventors: David L. Brown, Yung-Ho Alex Chuang, John Fielden, Marcel Trimpl, Jingjing Zhang, Devis Contarato, Venkatraman Iyer
  • Publication number: 20160064184
    Abstract: A scanning electron microscope incorporates a multi-pixel solid-state electron detector. The multi-pixel solid-state detector may detect back-scattered and/or secondary electrons. The multi-pixel solid-state detector may incorporate analog-to-digital converters and other circuits. The multi-pixel solid state detector may be capable of approximately determining the energy of incident electrons and/or may contain circuits for processing or analyzing the electron signals. The multi-pixel solid state detector is suitable for high-speed operation such as at a speed of about 100 MHz or higher. The scanning electron microscope may be used for reviewing, inspecting or measuring a sample such an unpatterned semiconductor wafer, a patterned semiconductor wafer, a reticle or a photomask. A method of reviewing or inspecting a sample is also described.
    Type: Application
    Filed: August 25, 2015
    Publication date: March 3, 2016
    Inventors: David L. Brown, Yung-Ho Alex Chuang, John Fielden, Marcel Trimpl, Jingjing Zhang, Devis Contarato, Venkatraman Iyer