Abstract: A method optimizing a deposition process for creating an electrically conductive layer with an electron or ion beam-induced deposition system, comprising: selecting at least one deposition specific setting parameter of the system; determining several parameter values of at least one setting parameter defining a first generation parameter value population; depositing a layer for each first generation parameter value population using the deposition system; detecting an electrical characteristic for each layer of each parameter value of said parameter value population; using a genetic algorithm to provide an optimization evaluation of the detected characteristics using a predetermined target characteristic, and using said evaluation determining a further generation parameter value population; repeating said deposition step through said determination step by using the parameter values of a second generation or a further generation, until said target characteristic is reached or the genetic algorithm is concluded