Patents by Inventor Marcelian F. Gautreaux

Marcelian F. Gautreaux has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 4981102
    Abstract: A reactor having a heated liner for producing silicon by chemical vapor deposition (CVD) and means for supplying a gas stream in the turbulent flow region. A gas stream including a silicon-containing compound is passed through a deposition chamber at turbulent flow rates for deposition of silicon on a non-reactive substrate liner heated above the decomposition temperature of the silicon-containing compound. Optionally, the liner is removable from the reactor for separation of deposited metal. Also optionally, the temperature of the liner in situ may be raised above the melting point of the deposited metal for melt out and recovery.
    Type: Grant
    Filed: February 27, 1986
    Date of Patent: January 1, 1991
    Assignee: Ethyl Corporation
    Inventors: Marcelian F. Gautreaux, Walter W. Lawrence, Jr., George A. Daniels, Gordon A. Hughmark
  • Patent number: 4883687
    Abstract: Silicon of high purity is made by decomposing silane in a fluidized bed reactor. To obtain good process economics, two modes of operation are used. In a first mode, the reactor is operated under high productivity conditions which also result in co-production of silicon dust or fines. The dust on the particles can cause problems in handling. For example, in bagging the particles, or removing the particles from a bag, the dust can become airborne from the larger particle surfaces and form an objectionable cloud of silicon dust. The invention provides a method for uniting dust to the larger silicon particles. In a second process mode, a thin (0.1-5.0 micron) layer of high purity silicon is deposited on the dust laden particles. This second mode is most preferably carried out by (a) treating the dust-laden particles with a deposition gas comprising 1 to 5 mole % silicon admixed with an inert carrier gas such as hydrogen, (b) in a fluidized bed reactor, and (c) at a process temperature of 620.degree.-650.degree.
    Type: Grant
    Filed: December 27, 1988
    Date of Patent: November 28, 1989
    Assignee: Ethyl Corporation
    Inventors: Marcelian F. Gautreaux, Robert H. Allen
  • Patent number: 4820587
    Abstract: Silicon of high purity is made by decomposing silane in a fluidized bed reactor. To obtain good process economics, two modes of operation are used. In a first mode, the reactor is operated under high productivity conditions which also result in co-production of silicon dust or fines. The dust on the particles can cause problems in handling. For example, in bagging the particles, or removing the particles from a bag, the dust can become airborne from the larger particle surfaces and form an objectionable cloud of silicon dust. The invention provides a method for uniting dust to the larger silicon particles. In a second process mode, a thin (0.1-5.0 micron) layer of high purity silicon is deposited on the dust laden particles. This second mode is most preferably carried out by (a) treating the dust-laden particles with a deposition gas comprising 1 to 5 mole % silicon admixed with an inert carrier gas such as hydrogen, (b) in a fluidized bed reactor, and (c) at a process temperature of 620.degree.650.degree. C.
    Type: Grant
    Filed: January 16, 1987
    Date of Patent: April 11, 1989
    Assignee: Ethyl Corporation
    Inventors: Marcelian F. Gautreaux, Robert H. Allen
  • Patent number: 4784840
    Abstract: Silicon of high purity is used in making semiconductor devices. Silicon for this purpose is made by decomposing silane in a fluidized bed reactor. This process entails thermal decomposition of silane to deposit additional metallic silicon on particles of high purity silicon. To obtain good process economics, two modes of operation are used. In a first mode, the reactor is operated under high productivity conditions which also result in co-production of silicon dust or fines. Some of the dust is deposited on the product silicon particles and some of it is elutriated by gas flow in the reactor and removed through an exit point near the top of the reactor apparatus. The dust on the particles can cause problems in handling. For example, in bagging the particles, or removing the particles from a bag, the dust can become airborne from the larger particle surfaces and form an objectionable cloud of silicon dust.
    Type: Grant
    Filed: October 28, 1987
    Date of Patent: November 15, 1988
    Assignee: Ethyl Corporation
    Inventors: Marcelian F. Gautreaux, Robert H. Allen
  • Patent number: 4456584
    Abstract: To improve reactor throughput and raw material utilization, the direct synthesis process for producing sodium aluminum tetrahydride is conducted in a semi-continuous manner whereby in at least one run (and preferably in each of a plurality of successive runs) the reaction is conducted (and preferably the respective reactions are conducted) to a stage at or before which the reaction rate would begin to significantly decrease due to consumption of the sodium. At that stage at least a portion of the liquid reaction solution is separated from the unreacted aluminum and sodium to leave a highly active sodium- and aluminum- containing heel for use in initiating the ensuing run. Preferably the aluminum used in at least some of the runs contains a reaction-promoting amount of another metal such as titanium. Use of an ether reaction medium (which need not be pre-treated to remove small amounts of alcohols and/or water) is also preferred. Sodium aluminum tetrahydride is a well-known chemical reducing agent.
    Type: Grant
    Filed: May 20, 1983
    Date of Patent: June 26, 1984
    Assignee: Ethyl Corporation
    Inventor: Marcelian F. Gautreaux
  • Patent number: 3958955
    Abstract: Gasoline compositions and additive mixtures of carboxymethoxy propanedioic acid, its salts, esters, or other gasoline soluble derivatives in amount sufficient to alleviate the plugging of certain catalysts being used in an engine exhaust system to lower the amount of undesirable constituents in exhaust gas from an engine being operated on gasoline containing a cyclopentadienyl manganese antiknock.
    Type: Grant
    Filed: July 7, 1975
    Date of Patent: May 25, 1976
    Assignee: Ethyl Corporation
    Inventor: Marcelian F. Gautreaux
  • Patent number: 3954443
    Abstract: A process for producing aluminum from raw aluminum silicate ore, especially kyanite, including comminuting a natural or raw mined kyanite ore to a desired particle size, beneficiating the ore to form a kyanite concentrate, compacting the concentrate along with a carbon reductant into agglomerates such as briquettes, pellets or other suitable form and to a desired size, carbothermically reducing the compacts in an electric arc furnace into an aluminum-silicon alloy, comminuting the aluminum-silicon alloy into a desired particle size, reacting the aluminum-silicon alloy particles with hydrogen and propylene to form tripropylaluminum and dipropylaluminum hydride, pyrolyzing or decomposing the tripropylaluminum and dipropylaluminum hydride in an oil medium or bath to form an aluminum powder, filtering, washing and drying the aluminum powder, and fluxing and casting the aluminum powder into pigs or other suitable form, thereby forming a substantially pure aluminum product.
    Type: Grant
    Filed: July 1, 1974
    Date of Patent: May 4, 1976
    Assignee: Ethyl Corporation
    Inventors: Marcelian F. Gautreaux, John H. McCarthy, Walter E. Foster, Donald O. Hutchinson, Frederick W. Frey
  • Patent number: RE29488
    Abstract: Gasoline compositions and additive mixtures of carboxymethoxysuccinic acid, its salts, esters, or other derivatives in amount sufficient to alleviate the plugging of certain catalysts being used in an engine exhaust system to lower the amount of undesirable constituents in exhaust gas from an engine being operated on gasoline containing a cyclopentadienyl manganese antiknock.
    Type: Grant
    Filed: September 30, 1976
    Date of Patent: December 6, 1977
    Assignee: Ethyl Corporation
    Inventor: Marcelian F. Gautreaux