Patents by Inventor Marcelino Essien

Marcelino Essien has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20220410579
    Abstract: An aerosol-based printing apparatus is provided capable of producing an aerosol stream at a constant rate and constant material deposition to a substrate to provide high-definition, high-resolution traces. The aerosol-based printing apparatus provides production, transport, and delivery of an aerosol stream at a constant rate for a period of time of at least 8 hours and other instances more than 24 continuous hours of constant operation. By inhibiting bulging and necking of the deposited trace, superior line width tolerances are achieved, and such tolerances are maintained for extended periods of time, thereby allowing for both the deposition of complex traces as well as consistent manufacture of duplicate articles that maintain the tolerances across a production ran. The accumulation of fluids in the aerosol and gas transport conduits are eliminated, thereby eliminating the need for purge or cleaning cycles and allowing for uninterrupted operation for a minimum of 24 hours.
    Type: Application
    Filed: September 25, 2020
    Publication date: December 29, 2022
    Applicant: INTEGRATED DEPOSITION SOLUTIONS, INC.
    Inventors: Marcelino Essien, David M. Keicher
  • Publication number: 20220088925
    Abstract: An apparatus for printing discrete high-resolution high-density features on a surface is provided using an aerosol stream. An aerosol chamber has a transport gas that enters through a port and entrains aerosol in an aerosol chamber to form an aerosol-laden transport gas. A flow cell is provided that has a flow cell channel and sheath gas conduits. The aerosol-laden transport gas passes through the flow cell channel and is surrounded by sheath gas passed through the sheath gas conduits. At least one aerodynamic lens receives the aerosol-laden transport gas surrounded by sheath gas. A method of printing the aerosol droplets from the aerosol-laden transport gas onto the substrate with a mean diameter of 0.5 to 8 microns is also provided.
    Type: Application
    Filed: September 21, 2021
    Publication date: March 24, 2022
    Applicant: Integrated Deposition Solutions, Inc.
    Inventors: Marcelino Essien, David M. Keicher
  • Patent number: 10124602
    Abstract: The object of the invention is the provision of apparatuses and methods for maskless direct printing of continuous films or discreet structures on a substrate using aerodynamic focusing. The method uses an interchangeable and variable aerodynamic lens system and an annularly flowing sheath gas to produce a highly collimated micrometer-size stream of aerosolized droplets. The lens system is comprised of a multi-orifice lens or a single-orifice lens or lenses coupled to a converging fluid dispense nozzle. A combined annular sheath and aerosol flow is propagated through at least two orifices. A liquid atomizer with temperature control, variable continuous or pulsed excitation, and constant or variable frequency, is used to produce an aerosol size distribution that overlaps the functional range of the aerodynamic lens system. The combined flow through the lens system produces a narrow, highly stable subsonic jet that remains collimated for as much as one centimeter beyond the orifice of the nozzle.
    Type: Grant
    Filed: October 29, 2015
    Date of Patent: November 13, 2018
    Assignee: Integrated Deposition Solutions, Inc.
    Inventor: Marcelino Essien
  • Patent number: 10086622
    Abstract: The object of the invention is the provision of apparatuses and methods for stable direct printing of continuous films or discreet structures on a substrate using an internal pneumatic shutter. The invention uses an aerodynamic focusing technique, with a print head comprising an aerosolization source, a flow cell, an aerodynamic lens system, and a pneumatic shutter assembly. The method uses an interchangeable and variable aerodynamic lens system mounted in the flow cell, and an annularly flowing sheath gas to produce a highly collimated micrometer-size stream of aerosolized droplets. The lens system is comprised of a single-orifice or multi-orifice lens coupled to a converging fluid dispense nozzle. A liquid atomizer with temperature control is used to produce an aerosol size distribution that overlaps the functional range of the aerodynamic lens system. The shutter assembly can be attached directly to the print head, or mounted external to the print head in a control module.
    Type: Grant
    Filed: June 11, 2017
    Date of Patent: October 2, 2018
    Assignee: Integrated Deposition Solutions, Inc.
    Inventors: Marcelino Essien, David Michael Keicher
  • Patent number: 10058881
    Abstract: The invention provides pneumatic shuttering of a focused or collimated aerosol particle stream. The aerosol stream can be collimated by an annular sheath of inert or non-inert gas. The apparatus propagates a sheathed aerosol stream through a series of aerodynamic lenses along the axis of a flow cell. The final lens is typically positioned above a substrate, so that direct material deposition is provided. A substantially perpendicularly-flowing gas external to the aerodynamic lens system is used to redirect the particle stream away from the flow axis and through an exhaust port, thereby shuttering the collimated aerosol stream. The pneumatic shutter enables printing of discreet structures, with on/off shuttering times of approximately 1 to 100 milliseconds.
    Type: Grant
    Filed: February 27, 2017
    Date of Patent: August 28, 2018
    Assignee: National Technology & Engineering Solutions of Sandia, LLC
    Inventors: David M. Keicher, Adam Cook, Eloy Phillip Baldonado, Marcelino Essien
  • Publication number: 20180015730
    Abstract: The object of the invention is the provision of apparatuses and methods for stable direct printing of continuous films or discreet structures on a substrate using an internal pneumatic shutter. The invention uses an aerodynamic focusing technique, with a print head comprising an aerosolization source, a flow cell, an aerodynamic lens system, and a pneumatic shutter assembly. The method uses an interchangeable and variable aerodynamic lens system mounted in the flow cell, and an annularly flowing sheath gas to produce a highly collimated micrometer-size stream of aerosolized droplets. The lens system is comprised of a single-orifice or multi-orifice lens coupled to a converging fluid dispense nozzle. A liquid atomizer with temperature control is used to produce an aerosol size distribution that overlaps the functional range of the aerodynamic lens system. The shutter assembly can be attached directly to the print head, or mounted external to the print head in a control module.
    Type: Application
    Filed: June 11, 2017
    Publication date: January 18, 2018
    Applicant: Integrated Deposition Solutions, Inc.
    Inventors: Marcelino Essien, David Michael Keicher
  • Patent number: 9694389
    Abstract: The object of the invention is the provision of methods for controlled production of continuous multi-component filaments or discreet structures using a multi-component liquid jet issuing from an orifice. A multi-component jet consists of two or more liquids. The liquids may be miscible or immiscible, and form a co-axially propagating flow along the central axis of a flow cell. The working distance between the exit orifice and a substrate can be as large as 50 mm, so that in-flight processing of the jet is possible. The coaxial flow consists of an outer sheath liquid and an inner sample liquid or composite of liquids. The flow cell and the exit channel of the deposition head are heated so that the pressurized sheath liquid temperature is raised to near or above the boiling point of the sheath liquid at the local atmospheric pressure. The jet exits the deposition head through the orifice, and the outer liquid is evaporated as the jet falls at atmospheric pressure.
    Type: Grant
    Filed: May 10, 2013
    Date of Patent: July 4, 2017
    Assignee: Integrated Deposition Solutions, Inc.
    Inventors: Fa-Gung Fan, David Bohling, David Michael Keicher, Marcelino Essien
  • Publication number: 20160193627
    Abstract: The object of the invention is the provision of apparatuses and methods for maskless direct printing of continuous films or discreet structures on a substrate using aerodynamic focusing. The method uses an interchangeable and variable aerodynamic lens system and an annularly flowing sheath gas to produce a highly collimated micrometer-size stream of aerosolized droplets. The lens system is comprised of a multi-orifice lens or a single-orifice lens or lenses coupled to a converging fluid dispense nozzle. A combined annular sheath and aerosol flow is propagated through at least two orifices. A liquid atomizer with temperature control, variable continuous or pulsed excitation, and constant or variable frequency, is used to produce an aerosol size distribution that overlaps the functional range of the aerodynamic lens system. The combined flow through the lens system produces a narrow, highly stable subsonic jet that remains collimated for as much as one centimeter beyond the orifice of the nozzle.
    Type: Application
    Filed: October 29, 2015
    Publication date: July 7, 2016
    Applicant: INTEGRATED DEPOSITION SOLUTIONS, INC.
    Inventor: Marcelino Essien
  • Patent number: 8919899
    Abstract: The object of the invention is the provision of methods and apparatuses for controlled direct printing of continuous films or discreet structures using a two-component liquid jet issuing from an orifice. The two liquids may be miscible or immiscible, and form an annularly propagating flow along the axis of a deposition head. The flow consists of an outer sheath liquid with a boiling point temperature that is approximately 10 to 40 degrees lower than that of an inner sample liquid. The exit channel of the head is heated so that the pressurized outer sheath liquid is raised to a temperature greater than the boiling point of the sheath liquid at the local atmospheric pressure. The outer liquid is evaporated as the jet exits the orifice and falls at atmospheric pressure. Deposited sample line widths are produced in the range from approximately 1 to 1000 microns.
    Type: Grant
    Filed: May 10, 2013
    Date of Patent: December 30, 2014
    Assignee: Integrated Deposition Solutions
    Inventors: Marcelino Essien, David Michael Keicher
  • Patent number: 8887658
    Abstract: Apparatus and method for depositing aerosolized material, wherein an aerosol flow is surrounded and focused by more than one consecutive sheath gas flows. The combined sheath and aerosol flows may consecutively flow through more than one capillary, thereby narrowing the flow further. Linewidths of less than one micron may be achieved.
    Type: Grant
    Filed: October 8, 2008
    Date of Patent: November 18, 2014
    Assignee: Optomec, Inc.
    Inventors: Marcelino Essien, Bruce H. King
  • Publication number: 20140035975
    Abstract: The object of the invention is the provision of methods and apparatuses for controlled direct printing of continuous films or discreet structures using a two-component liquid jet issuing from an orifice. The two liquids may be miscible or immiscible, and form an annularly propagating flow along the axis of a deposition head. The flow consists of an outer sheath liquid with a boiling point temperature that is approximately 10 to 40 degrees lower than that of an inner sample liquid. The exit channel of the head is heated so that the pressurized outer sheath liquid is raised to a temperature greater than the boiling point of the sheath liquid at the local atmospheric pressure. The outer liquid is evaporated as the jet exits the orifice and falls at atmospheric pressure. Deposited sample line widths are produced in the range from approximately 1 to 1000 microns.
    Type: Application
    Filed: May 10, 2013
    Publication date: February 6, 2014
    Applicant: INTEGRATED DEPOSITION SOLUTIONS, INC.
    Inventors: Marcelino Essien, David Michael Keicher
  • Publication number: 20140027952
    Abstract: The object of the invention is the provision of methods for controlled production of continuous multi-component filaments or discreet structures using a multi-component liquid jet issuing from an orifice. A multi-component jet consists of two or more liquids. The liquids may be miscible or immiscible, and form a co-axially propagating flow along the central axis of a flow cell. The working distance between the exit orifice and a substrate can be as large as 50 mm, so that in-flight processing of the jet is possible. The coaxial flow consists of an outer sheath liquid and an inner sample liquid or composite of liquids. The flow cell and the exit channel of the deposition head are heated so that the pressurized sheath liquid temperature is raised to near or above the boiling point of the sheath liquid at the local atmospheric pressure. The jet exits the deposition head through the orifice, and the outer liquid is evaporated as the jet falls at atmospheric pressure.
    Type: Application
    Filed: May 10, 2013
    Publication date: January 30, 2014
    Applicant: INTEGRATED DEPOSITION SOLUTIONS, INC.
    Inventors: Fa-Gung Fan, David Bohling, David Michael Keicher, Marcelino Essien
  • Publication number: 20130260056
    Abstract: Apparatuses and processes for maskless deposition of electronic and biological materials. The process is capable of direct deposition of features with linewidths varying from the micron range up to a fraction of a millimeter, and may be used to deposit features on substrates with damage thresholds near 100° C. Deposition and subsequent processing may be carried out under ambient conditions, eliminating the need for a vacuum atmosphere. The process may also be performed in an inert gas environment. Deposition of and subsequent laser post processing produces linewidths as low as 1 micron, with sub-micron edge definition. The apparatus nozzle has a large working distance—the orifice to substrate distance may be several millimeters—and direct write onto non-planar surfaces is possible.
    Type: Application
    Filed: June 4, 2013
    Publication date: October 3, 2013
    Inventors: Michael J. Renn, Bruce H. King, Marcelino Essien, Gregory J. Marquez, Manampathy G. Giridharan, Jyh-Cherng Sheu
  • Patent number: 8455051
    Abstract: Apparatuses and processes for maskless deposition of electronic and biological materials. The process is capable of direct deposition of features with linewidths varying from the micron range up to a fraction of a millimeter, and may be used to deposit features on substrates with damage thresholds near 100° C. Deposition and subsequent processing may be carried out under ambient conditions, eliminating the need for a vacuum atmosphere. The process may also be performed in an inert gas environment. Deposition of and subsequent laser post processing produces linewidths as low as 1 micron, with sub-micron edge definition. The apparatus nozzle has a large working distance—the orifice to substrate distance may be several millimeters—and direct write onto non-planar surfaces is possible.
    Type: Grant
    Filed: December 22, 2010
    Date of Patent: June 4, 2013
    Assignee: Optomec, Inc.
    Inventors: Michael J. Renn, Bruce H. King, Marcelino Essien, Gregory J. Marquez, Manampathy G. Giridharan, Jyh-Cherng Sheu
  • Patent number: 8110247
    Abstract: A method of depositing various materials onto heat-sensitive targets, particularly oxygen-sensitive materials. Heat-sensitive targets are generally defined as targets that have thermal damage thresholds that are lower than the temperature required to process a deposited material. The invention uses precursor solutions and/or particle or colloidal suspensions, along with optional pre-deposition treatment and/or post-deposition treatment to lower the laser power required to drive the deposit to its final state. The present invention uses Maskless Mesoscale Material Deposition (M3D™) to perform direct deposition of material onto the target in a precise, highly localized fashion. Features with linewidths as small as 4 microns may be deposited, with little or no material waste. A laser is preferably used to heat the material to process it to obtain the desired state, for example by chemical decomposition, sintering, polymerization, and the like.
    Type: Grant
    Filed: May 8, 2006
    Date of Patent: February 7, 2012
    Assignee: Optomec Design Company
    Inventors: Michael J. Renn, Bruce H. King, Marcelino Essien, Manampathy G. Giridharan, Jyh-Cherng Sheu
  • Patent number: 7987813
    Abstract: Apparatuses and processes for maskless deposition of electronic and biological materials. The process is capable of direct deposition of features with linewidths varying from the micron range up to a fraction of a millimeter, and may be used to deposit features on substrates with damage thresholds near 100° C. Deposition and subsequent processing may be carried out under ambient conditions, eliminating the need for a vacuum atmosphere. The process may also be performed in an inert gas environment. Deposition of and subsequent laser post processing produces linewidths as low as 1 micron, with sub-micron edge definition. The apparatus nozzle has a large working distance—the orifice to substrate distance may be several millimeters—and direct write onto non-planar surfaces is possible.
    Type: Grant
    Filed: January 6, 2009
    Date of Patent: August 2, 2011
    Assignee: Optomec, Inc.
    Inventors: Michael J. Renn, Bruce H. King, Marcelino Essien, Gregory J. Marquez, Manampathy G. Giridharan, Jyh-Cherng Sheu
  • Publication number: 20110129615
    Abstract: Apparatuses and processes for maskless deposition of electronic and biological materials. The process is capable of direct deposition of features with linewidths varying from the micron range up to a fraction of a millimeter, and may be used to deposit features on substrates with damage thresholds near 100° C. Deposition and subsequent processing may be carried out under ambient conditions, eliminating the need for a vacuum atmosphere. The process may also be performed in an inert gas environment. Deposition of and subsequent laser post processing produces linewidths as low as 1 micron, with sub-micron edge definition. The apparatus nozzle has a large working distance—the orifice to substrate distance may be several millimeters—and direct write onto non-planar surfaces is possible.
    Type: Application
    Filed: December 22, 2010
    Publication date: June 2, 2011
    Applicant: OPTOMEC, INC. FKA OPTOMEC DESIGN COMPANY
    Inventors: Michael J. Renn, Bruce H. King, Marcelino Essien, Gregory J. Marquez, Manampathy G. Giridharan, Jyh-Cherng Sheu
  • Patent number: 7938079
    Abstract: Method and apparatus for improved maskless deposition of electronic and biological materials using an extended nozzle. The process is capable of direct deposition of features with linewidths varying from a few microns to a fraction of a millimeter, and can be used to deposit features on targets with damage thresholds near 100° C. or less. Deposition and subsequent processing may be performed under ambient conditions and produce linewidths as low as 1 micron, with sub-micron edge definition. The extended nozzle reduces particle overspray and has a large working distance; that is, the orifice to target distance may be several millimeters or more, enabling direct write onto non-planar surfaces. The nozzle allows for deposition of features with linewidths that are approximately as small as one-twentieth the size of the nozzle orifice diameter, and is preferably interchangeable, enabling rapid variance of deposited linewidth.
    Type: Grant
    Filed: December 13, 2004
    Date of Patent: May 10, 2011
    Assignee: Optomec Design Company
    Inventors: Bruce H. King, Michael J. Renn, Marcelino Essien, Gregory J. Marquez, Manampathy G. Giridharan, Jyh-Cherng Sheu
  • Patent number: 7674671
    Abstract: Method and apparatus for direct writing of passive structures having a tolerance of 5% or less in one or more physical, electrical, chemical, or optical properties. The present apparatus is capable of extended deposition times. The apparatus may be configured for unassisted operation and uses sensors and feedback loops to detect physical characteristics of the system to identify and maintain optimum process parameters.
    Type: Grant
    Filed: December 12, 2005
    Date of Patent: March 9, 2010
    Assignee: Optomec Design Company
    Inventors: Michael J. Renn, Marcelino Essien, Bruce H. King, Jason A. Paulsen
  • Publication number: 20090252874
    Abstract: Apparatus and method for depositing aerosolized material, wherein an aerosol flow is surrounded and focused by more than one consecutive sheath gas flows. The combined sheath and aerosol flows may consecutively flow through more than one capillary, thereby narrowing the flow further. Linewidths of less than one micron may be achieved.
    Type: Application
    Filed: October 8, 2008
    Publication date: October 8, 2009
    Applicant: OPTOMEC, INC.
    Inventors: Marcelino Essien, Bruce H. King