Patents by Inventor Marcella Johanna Hartl

Marcella Johanna Hartl has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Method of manufacturing a semiconductor device including a dielectric structure
    Patent number: 8748317
    Abstract: A dielectric layer is deposited on a working surface of a substrate, wherein the dielectric layer contains or consists of a dielectric polymer. The dielectric layer is partially cured. A portion of the partially cured dielectric layer is removed using a chemical mechanical polishing process. Then the curing of remnant portions of the partially cured dielectric layer is continued to form a dielectric structure. The partially cured dielectric layer shows high removal rates during chemical mechanical polishing. With remnant portions of the dielectric layer provided in cavities, high volume insulating structures can be provided in an efficient manner.
    Type: Grant
    Filed: August 3, 2012
    Date of Patent: June 10, 2014
    Assignee: Infineon Technologies Austria AG
    Inventors: Gerhard Schmidt, Daniel Schloegl, Marcella Johanna Hartl, Philipp Sebastian Koch, Roland Strasser
  • Method of Manufacturing a Semiconductor Device including a Dielectric Structure
    Publication number: 20140038413
    Abstract: A dielectric layer is deposited on a working surface of a substrate, wherein the dielectric layer contains or consists of a dielectric polymer. The dielectric layer is partially cured. A portion of the partially cured dielectric layer is removed using a chemical mechanical polishing process. Then the curing of remnant portions of the partially cured dielectric layer is continued to form a dielectric structure. The partially cured dielectric layer shows high removal rates during chemical mechanical polishing. With remnant portions of the dielectric layer provided in cavities, high volume insulating structures can be provided in an efficient manner.
    Type: Application
    Filed: August 3, 2012
    Publication date: February 6, 2014
    Applicant: INFINEON TECHNOLOGIES AUSTRIA AG
    Inventors: Gerhard Schmidt, Daniel Schloegl, Marcella Johanna Hartl, Philipp Sebastian Koch, Roland Strasser