Patents by Inventor Marcello Binetti

Marcello Binetti has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

Method for calibrating a pyrometer, method for determining the temperature of a semiconducting wafer and system for determining the temperature of a semiconducting wafer

Patent number: 8388219

Abstract: A method for calibrating a pyrometer a temperature of a calibration sample is determined from the ratio of a first reflectance and a second reflectance and the pyrometer is calibrated by assigning the determined temperature of the calibration sample with a thermal radiation signal measured by the pyrometer.

Type: Grant

Filed: May 11, 2010

Date of Patent: March 5, 2013

Assignee: Laytec Aktiengesellschaft

Inventors: Joerg-Thomas Zettler, Tobias Schenk, Steffen Uredat, Jens Zilian, Bernd Henninger, Marcello Binetti, Kolja Haberland
METHOD FOR CALIBRATING A PYROMETER, METHOD FOR DETERMINING THE TEMPERATURE OF A SEMICONDUCTING WAFER AND SYSTEM FOR DETERMINING THE TEMPERATURE OF A SEMICONDUCTING WAFER

Publication number: 20100290500

Abstract: The present invention relates to a method for calibrating a pyrometer, a method for determining the temperature of a semiconducting wafer and a system for determining the temperature of a semiconducting wafer. It is an object of the present invention to provide a method for calibrating a pyrometer which overcomes the disadvantages of the prior art.

Type: Application

Filed: May 11, 2010

Publication date: November 18, 2010

Applicant: LayTec GmbH

Inventors: Joerg-Thomas ZETTLER, Tobias SCHENK, Steffen UREDAT, Jens ZILIAN, Bernd HENNINGER, Marcello BINETTI, Kolja HABERLAND

Method for calibrating a pyrometer, method for determining the temperature of a semiconducting wafer and system for determining the temperature of a semiconducting wafer

METHOD FOR CALIBRATING A PYROMETER, METHOD FOR DETERMINING THE TEMPERATURE OF A SEMICONDUCTING WAFER AND SYSTEM FOR DETERMINING THE TEMPERATURE OF A SEMICONDUCTING WAFER