Patents by Inventor Marcin Janaszewski

Marcin Janaszewski has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 10468231
    Abstract: A particle microscope includes a particle beam system directing a particle beam onto a sample. The particle beam system includes a magnetic lens energized by an adjustable lens current. The sample is positioned at an adjustable distance from the lens, and particles of the beam have an adjustable kinetic energy. A method of operating such microscope includes positioning a sample at a distance from the lens, adjusting the kinetic energy, changing the lens current at plural different lens current change rates, determining a lens current at focus for each of the plural different lens current change rates, and determining an optimized lens current based on the determined lens currents at focus and the lens current change rates.
    Type: Grant
    Filed: June 13, 2018
    Date of Patent: November 5, 2019
    Assignee: Carl Zeiss Microscopy GmbH
    Inventors: Rainer Arnold, Marcin Janaszewski
  • Patent number: 9558911
    Abstract: The application relates to a method for analyzing, in particular for imaging, and/or processing of an object as well as a particle beam device for carrying out this method. In particular, the particle beam device of this application is an electron beam device and/or an ion beam device.
    Type: Grant
    Filed: August 1, 2014
    Date of Patent: January 31, 2017
    Assignee: Carl Zeiss Microscopy GmbH
    Inventors: Josef Biberger, Lorenz Lechner, Michal Postolski, Ralph Pulwey, Marcin Janaszewski
  • Publication number: 20160035534
    Abstract: The application relates to a method for analyzing, in particular for imaging, and/or processing of an object as well as a particle beam device for carrying out this method. In particular, the particle beam device of this application is an electron beam device and/or an ion beam device.
    Type: Application
    Filed: August 1, 2014
    Publication date: February 4, 2016
    Inventors: Josef Biberger, Lorenz Lechner, Michal Postolski, Ralph Pulwey, Marcin Janaszewski