Patents by Inventor Marcin Zelechowski

Marcin Zelechowski has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 10431437
    Abstract: Methods, apparatus and systems for detecting an arc during supplying a plasma process in a plasma chamber with a power are provided. An example plasma power supply includes: a DC source, an output signal generator, a first signal sequence measurement device for measuring a first signal sequence present between the DC source and the output signal generator, a second signal sequence measurement device for measuring a second signal sequence present at an output of the output signal generator, and a controller configured to generate a reference signal sequence based on one of the first and second signal sequences, to compare the reference signal sequence and the other of the first and second signal sequences that has not been used to determine the reference signal sequence, and to generate a detection signal if the reference signal sequence and the other of the first and second signal sequences cross.
    Type: Grant
    Filed: June 19, 2017
    Date of Patent: October 1, 2019
    Assignee: TRUMPF Huettinger Sp. z o. o.
    Inventors: Cezary Gapi{right arrow over (n)}ski, Andrzej Gieraltowski, Adam Grabowski, Piotr Lach, Marcin Zelechowski
  • Patent number: 10297431
    Abstract: An arc treatment device includes an arc detector operable to detect whether an arc is present in a plasma chamber, an arc energy determiner operable to determine an arc energy value based on an energy supplied to the plasma chamber while the arc is present in the plasma chamber, and a break time determiner operable to determine a break time based on the determined arc energy value.
    Type: Grant
    Filed: August 3, 2017
    Date of Patent: May 21, 2019
    Assignee: TRUMPF Huettinger Sp. z o. o.
    Inventors: Marcin Zelechowski, Piotr Lach
  • Patent number: 10290477
    Abstract: Systems and methods of monitoring a discharge in a plasma process are disclosed. The methods include supplying the plasma process with a periodic power supply signal, determining a first signal waveform in a first time interval within a first period of the power supply signal, determining a second signal waveform in a second time interval within a second period of the power supply signal, the second time interval being at a position within the second period corresponding to a position of the first time interval within the first period, comparing the second signal waveform with a reference signal waveform to obtain a first comparison result, determining that the first comparison result corresponds to a given first comparison result, and in response, time-shifting one of the second signal waveform and the reference signal waveform, and comparing the time-shifted signal waveform with the non-time-shifted signal waveform to obtain a second comparison result.
    Type: Grant
    Filed: August 5, 2016
    Date of Patent: May 14, 2019
    Assignee: TRUMPF Huettinger Sp. z o. o.
    Inventors: Andrzej Gieraltowski, Adam Grabowski, Piotr Lach, Marcin Zelechowski
  • Publication number: 20170330737
    Abstract: An arc treatment device includes an arc detector operable to detect whether an arc is present in a plasma chamber, an arc energy determiner operable to determine an arc energy value based on an energy supplied to the plasma chamber while the arc is present in the plasma chamber, and a break time determiner operable to determine a break time based on the determined arc energy value.
    Type: Application
    Filed: August 3, 2017
    Publication date: November 16, 2017
    Inventors: Marcin Zelechowski, Piotr Lach
  • Patent number: 9818579
    Abstract: According to a first aspect of the present invention, reducing electrical energy stored in a load or in one or more leads for connecting a power supply with the load is achieved by plasma process power circuitry including a switch in operative connection with at least one of the leads for enabling/interrupting power to the load; a first electrical nonlinear device; an energy storing device arranged in series with the first electrical nonlinear device; and a pre-charging circuit in operative connection with the energy storing device, the pre-charging circuit configured to charge the energy storing device to a pre-determined energy level while power to the load is enabled.
    Type: Grant
    Filed: July 8, 2014
    Date of Patent: November 14, 2017
    Assignee: TRUMPF Huettinger Sp. z o. o.
    Inventors: Pawel Ozimek, Rafal Bugyi, Robert Dziuba, Andrzej Klimczak, Marcin Zelechowski
  • Publication number: 20170287684
    Abstract: Methods, apparatus and systems for detecting an arc during supplying a plasma process in a plasma chamber with a power are provided. An example plasma power supply includes: a DC source, an output signal generator, a first signal sequence measurement device for measuring a first signal sequence present between the DC source and the output signal generator, a second signal sequence measurement device for measuring a second signal sequence present at an output of the output signal generator, and a controller configured to generate a reference signal sequence based on one of the first and second signal sequences, to compare the reference signal sequence and the other of the first and second signal sequences that has not been used to determine the reference signal sequence, and to generate a detection signal if the reference signal sequence and the other of the first and second signal sequences cross.
    Type: Application
    Filed: June 19, 2017
    Publication date: October 5, 2017
    Inventors: Cezary GapiƱski, Andrzej Gieraltowski, Adam Grabowski, Piotr Lach, Marcin Zelechowski
  • Publication number: 20160343549
    Abstract: Systems and methods of monitoring a discharge in a plasma process are disclosed. The methods include supplying the plasma process with a periodic power supply signal, determining a first signal waveform in a first time interval within a first period of the power supply signal, determining a second signal waveform in a second time interval within a second period of the power supply signal, the second time interval being at a position within the second period corresponding to a position of the first time interval within the first period, comparing the second signal waveform with a reference signal waveform to obtain a first comparison result, determining that the first comparison result corresponds to a given first comparison result, and in response, time-shifting one of the second signal waveform and the reference signal waveform, and comparing the time-shifted signal waveform with the non-time-shifted signal waveform to obtain a second comparison result.
    Type: Application
    Filed: August 5, 2016
    Publication date: November 24, 2016
    Inventors: Andrzej Gieraltowski, Adam Grabowski, Piotr Lach, Marcin Zelechowski
  • Patent number: 9368328
    Abstract: An apparatus for generating and maintaining plasma for plasma processing using inductively coupled RF power. The apparatus includes a resonant circuit having a resonant capacitance and a resonant inductance, an excitation circuit for exciting the resonant circuit, and a coupling element for coupling RF power from the inductance into a plasma chamber.
    Type: Grant
    Filed: July 24, 2013
    Date of Patent: June 14, 2016
    Assignee: TRUMPF Huettinger Sp. z o. o.
    Inventors: Pawel Ozimek, Andrzej Klimczak, Marcin Zelechowski, Marcin Golan
  • Publication number: 20150206711
    Abstract: An apparatus for generating and maintaining plasma for plasma processing using inductively coupled RF power. The apparatus includes a resonant circuit having a resonant capacitance and a resonant inductance, an excitation circuit for exciting the resonant circuit, and a coupling dement for coupling RF power from the inductance into a plasma chamber.
    Type: Application
    Filed: July 24, 2013
    Publication date: July 23, 2015
    Applicant: TRUMPF Huettinger Sp. z.o.o.
    Inventors: Pawel Ozimek, Andrzej Klimczak, Marcin Zelechowski, Marcin Golan
  • Publication number: 20140320015
    Abstract: According to a first aspect of the present invention, reducing electrical energy stored in a load or in one or more leads for connecting a power supply with the load is achieved by plasma process power circuitry including a switch in operative connection with at least one of the leads for enabling/interrupting power to the load; a first electrical nonlinear device; an energy storing device arranged in series with the first electrical nonlinear device; and a pre-charging circuit in operative connection with the energy storing device, the pre-charging circuit configured to charge the energy storing device to a pre-determined energy level while power to the load is enabled.
    Type: Application
    Filed: July 8, 2014
    Publication date: October 30, 2014
    Inventors: Pawel Ozimek, Rafal Bugyi, Robert Dziuba, Andrzej Klimczak, Marcin Zelechowski
  • Patent number: 8786263
    Abstract: According to a first aspect of the present invention, reducing electrical energy stored in a load or in one or more leads for connecting a power supply with the load is achieved by plasma process power circuitry including a switch in operative connection with at least one of the leads for enabling/interrupting power to the load; a first electrical nonlinear device; an energy storing device arranged in series with the first electrical nonlinear device; and a pre-charging circuit in operative connection with the energy storing device, the pre-charging circuit configured to charge the energy storing device to a pre-determined energy level while power to the load is enabled.
    Type: Grant
    Filed: November 12, 2009
    Date of Patent: July 22, 2014
    Assignee: TRUMPF Huettinger Sp. z o. o.
    Inventors: Pawel Ozimek, Rafal Bugyi, Robert Dziuba, Andrzej Klimczak, Marcin Zelechowski
  • Publication number: 20100213903
    Abstract: According to a first aspect of the present invention, reducing electrical energy stored in a load or in one or more leads for connecting a power supply with the load is achieved by plasma process power circuitry including a switch in operative connection with at least one of the leads for enabling/interrupting power to the load; a first electrical nonlinear device; an energy storing device arranged in series with the first electrical nonlinear device; and a pre-charging circuit in operative connection with the energy storing device, the pre-charging circuit configured to charge the energy storing device to a pre-determined energy level while power to the load is enabled.
    Type: Application
    Filed: November 12, 2009
    Publication date: August 26, 2010
    Applicant: HUETTINGER ELECTRONIC SP. Z O.O.
    Inventors: Pawel Ozimek, Rafal Bugyi, Robert Dziuba, Andrzej Klimczak, Marcin Zelechowski
  • Publication number: 20080309402
    Abstract: A circuit configuration reduces electrical energy stored in a lead inductance formed by a plurality of leads that connect a power supply unit with a load. The circuit configuration includes a switching device in operative connection with at least one of the leads for enabling or interrupting power to the load. The circuit configuration also includes a first electrical nonlinear device arranged in parallel with the switching device; an energy storing device arranged in parallel with the switching device and in series with the first electrical nonlinear device; and a pre-charging circuit in operative connection with the energy storing device for charging the energy storing device to a pre-determined voltage level while power to the load is enabled.
    Type: Application
    Filed: May 12, 2008
    Publication date: December 18, 2008
    Applicant: HUETTINGER ELECTRONIC SP. Z O.O.
    Inventors: Pawel Ozimek, Rafal Bugyi, Robert Dziuba, Andrzej Klimczak, Marcin Zelechowski