Abstract: Disclosed herein is a composition for copper bump electrodeposition including copper ions and at least one additive including a polyalkyleneimine backbone including N-hydrogen atoms, where (a) the polyalkyleneimine backbone has a mass average molecular weight Mw of from 900 g/mol to 100 000 g/mol, (b) the N-hydrogen atoms are each substituted by a C2 to C6 polyoxyalkylene group, and (c) the average number of oxyalkylene units in the polyoxyalkylene group is from more than 10 to less than 30 per N-hydrogen atoms in the polyalkyleneimine.

Abstract: An aqueous composition including (a) metal ions including tin ions and silver ions and (b) at least one complexing agent of formula C11 RC12-XC11-RC11 ??(C11) and their salts, where XC11 is selected from (a) a divalent 5 or 6 membered aromatic N-heterocyclic group; (b) a divalent 6 membered aromatic carbocyclic group; and (c) a divalent 5 or 6 membered aliphatic N-heterocyclic group including one N atom and optionally a second heteroatom selected from N and O; ?all of which may be unsubstituted or substituted by one or more OH or one or more RC14; RC11 is selected from ?; and RC12 is selected from RC11, XC11-RC11, H, OH, NRC142, C1 to C10 alkyl, and C1 to C10 alkoxy

Abstract: Disclosed herein is a A polyalkanolamine including the structure of formula L1 [AL]n[BL]m??(L1) wherein XL1, XL2, XL3 are independently selected from a C1 to C6 alkanediyl; ArL is a 5 or 6 membered N-heteroaromatic ring system including from 1 to 4 N atoms, which may be unsubstituted or substituted by C1 to C6 alkyl; n is an integer of from 2 to 350; m is 0 or an integer of from 1 to 600; o is 1 or an integer of from 2 to 25; BL1 is a continuation of the backbone BL by branching; XL11, XL12, XL13 are independently selected from a C1 to C6 alkanediyl; XL21 is a C1 to C6 alkanediyl; and derivatives thereof obtainable by N-protonation, N-quaternization, substitution, or polyalkoxylation.

Abstract: Described herein is an aqueous composition including tin ions, optionally alloy metal ions selected from the group consisting of silver, copper, indium, and bismuth ions and at least one additive of formula L1

Abstract: Disclosed herein is an aqueous composition including tin ions, optionally alloy metal ions selected from the group consisting of silver, indium, and bismuth ions and at least one additive of formula L1a or of formula L1b

Abstract: Described herein is a method of using a polyaminoamide including a group of formula N1 in a composition for electrodepositing nanotwinned copper, that is obtained by reacting a diamine compound including two primary or secondary amino groups with an aminoacid in a molar ratio of approx. 1:2 to form an aminoamide compound that is afterwards reacted with a coupling agent and optionally with a diamine or other co-monomers.

Abstract: The present invention relates to a resin composition, comprising (a) an epoxy resin; (b) a curing agent comprising the structure of formula C1; (c) an inorganic filler; wherein RC1 is (a) a siloxane group of formula C1a or (b) or both a siloxane group of formula C1a and an ester group of formula C1b; RC2 is selected from a bulky C4 to C12 alkyl group comprising at least one tertiary or quaternary carbon atom; RC11, RC12, RC13 are independently selected from methyl, ethyl and 1-propyl; RC14 is selected from a linear or branched C1 to C8 alkyl; XC1 is selected from a divalent C1 to C4 alkanediyl group; and n is an average number of repeating units and is from 1.05 to 200.

Abstract: Described herein is a copper electroplating composition including copper ions, an acid, and at least one polyaminoamide including a group of formula L1 [B-A-B?—Z]n[Y—Z]m??(L1) that is obtainable by reacting a diamine compound including two primary or secondary amino groups with an amino acid in a molar ratio of approx. 1:2 to form an aminoamide compound that is afterwards reacted with a coupling agent and optionally with a diamine co-monomer.

Abstract: Disclosed herein is an aqueous composition including tin ions, optionally alloy metal ions, and at least one antioxidant of formula X1a or of formula L1b or of formula L1c or of formula L1d or of formula L1e or the tautomeric forms of formulas X1b, X1c, X1d, and X1e, where no further metal ions are present in the composition besides tin ions and at least one of silver, indium, and bismuth ions; and where the composition does not include any reducing agents besides the compounds of formulas X1a to X1e.

Abstract: Disclosed is a method of oxidizing welding fume residues of an additive manufacturing apparatus adapted to process a metal-based building material. The additive manufacturing apparatus includes a process chamber for manufacturing a three-dimensional object and a circulation system having a gas circuit for a protective gas which is passed through the process chamber. The welding fume residues are exposed for a passivation time period to a gas atmosphere containing an oxidizing agent in a chamber, where the passivation time period is ended depending on a difference between oxidizing agent concentrations in the chamber detected by at least one sensor at two points in time having a predetermined distance from one another.

Abstract: Described herein is a composition including copper ions, an acid, and at least one polyaminoamide including, a group of formula L1 [A-B-A?-Z]n[Y—Z]m??(L1) where B is a diacid fragment of formula L2 A, A? are amine fragments independently selected from the group consisting of formula L3a and formula L3b Y is a co-monomer fragment; Z is a coupling fragment of formula L4 n is an integer of from 1 to 400; and m is 0 or an integer of from 1 to 400.

Abstract: Described herein is a composition including metal ions consisting essentially of cobalt ions, and a specific monomeric and polymeric suppressing agent including a carboxylic, sulfonic, sulfinic, phosphonic, or phosphinic acid functional groups which show a suppressing effect that is required for void-free bottom-up filling of nanometer-sized recessed features.

Abstract: An aqueous composition comprising (a) metal ions comprising tin ions and silver ions and (b) at least one complexing agent of formula (C1) R1—X1—S—X21[D1-X22—]n—S—X3—R2, (C2) R1—X1—S—X31-D2-[X32—S—]nX3—R2, (C3) R3—X1—S—X41-[D3-X42—]nS—X3—R4 wherein X1, X3 are independently selected from a linear or branched C1-C12 alkanediyl, which may be unsubstituted or substituted by OH; X21, X22 are independently selected from X1, which may be further substituted by —X5—COOR12, —X5—SO2—O—R12, a C2 to C6 polyoxyalkylene group of formula —(O—CH2—CHR11)z—OH, or a combination thereof, and —X1—NH—CO—X6—CO—NH—X1—; X31, X32 are independently selected from a chemical bond and X1; X41, X42 are independently selected from X1; X5 is a linear or branched Ci to C10 alkyl; X6 is selected from X1 and a divalent 5 or 6 membered aromatic group; R1, R2 are independently selected from a monovalent 5 or 6 membered aromatic N-heterocyclic group comprising one N atom or two N atoms which are separated by at least one C atom, and its derivative

Abstract: The invention relates to a polyamine-based or polyhydric alcohol-based suppressing agent. The suppressing agent is modified by reaction with a compound that introduces a branching group into the suppressing agent before they are reacted with an alkylene oxide. The suppressing agent shows extraordinary superfilling properties, particularly when used to fill in features having extremely small aperture sizes and/or high aspect ratios.

Abstract: An aqueous composition including (a) metal ions including tin ions and silver ions and (b) at least one complexing agent of formula C11 RC12-XC11-RC11 ??(C11) and their salts, where XC11 is selected from (a) a divalent 5 or 6 membered aromatic N-heterocyclic group; (b) a divalent 6 membered aromatic carbocyclic group; and (c) a divalent 5 or 6 membered aliphatic N-heterocyclic group including one N atom and optionally a second heteroatom selected from N and O; ?all of which may be unsubstituted or substituted by one or more OH or one or more RC14; RC11 is selected from ?; and RC12 is selected from RC11, XC11-RC11, H, OH, NRC142, C1 to C10 alkyl, and C1 to C10 alkoxy

Abstract: Disclosed herein is an aqueous composition including tin ions, optionally alloy metal ions selected from the group consisting of silver, indium, and bismuth ions and at least one additive of formula L1a or of formula L1b

Abstract: Described herein is an aqueous composition including tin ions and at least one compound of formula I wherein X1 is selected from a linear or branched C1-C12 alkanediyl, which may optionally be interrupted by O or S or a C5 to C12 aromatic moiety, R11 is a copolymer of ethylene oxide and a further C3 to C6 alkylene oxide, wherein the content of ethylene oxide is from 5 to 30% by weight, R11 is selected from H, R11, R40, R13, R14 are (a) independently selected from H, R11, R40, or (b) may together form a divalent group X13; X13 is selected from a linear or branched C1-C12 alkanediyl, which may optionally be interrupted by O, S or NR43; R40 is H or a linear or branched C1-C20 alkyl, R43 is selected from H, R11 and a linear or branched C1-C20 alkyl.

Abstract: Disclosed herein is a A polyalkanolamine including the structure of formula L1 A L n B L m wherein AL is BL is - O-X L21 o -, XL1, XL2, XL3 are independently selected from a C1 to C6 alkanediyl; ArL is a 5 or 6 membered N-heteroaromatic ring system including from 1 to 4 N atoms, which may be unsubstituted or substituted by C1 to C6 alkyl; n is an integer of from 2 to 350; m is 0 or an integer of from 1 to 600; o is 1 or an integer of from 2 to 25; BL1 is a continuation of the backbone BL by branching; XL11, XL12, XL13 are independently selected from a C1 to C6 alkanediyl; XL21 is a C1 to C6 alkanediyl; and derivatives thereof obtainable by N-protonation, N-quaternization, substitution, or polyalkoxylation.

Abstract: Described herein is a composition including copper ions, an acid, and at least one polyaminoamide including, a group of formula L1 [A-B-A?-Z]n[Y—Z]m??(L1) where B is a diacid fragment of formula L2 A, A? are amine fragments independently selected from the group consisting of formula L3a and formula L3b Y is a co-monomer fragment; Z is a coupling fragment of formula L4 n is an integer of from 1 to 400; and m is 0 or an integer of from 1 to 400.

Abstract: The present invention relates to a resin composition, comprising (a) an epoxy resin; (b) a curing agent comprising the structure of formula C1; (c) an inorganic filler; wherein RC1 is (a) a siloxane group of formula C1a or (b) or both a siloxane group of formula C1a and an ester group of formula C1b; RC2 is selected from a bulky C4 to C12 alkyl group comprising at least one tertiary or quaternary carbon atom; RC11, RC12, RC13 are independently selected from methyl, ethyl and 1-propyl; RC14 is selected from a linear or branched C1 to C8 alkyl; XC1 is selected from a divalent C1 to C4 alkanediyl group; and n is an average number of repeating units and is from 1.05 to 200.