Patents by Inventor Marco Beleggia

Marco Beleggia has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20200402793
    Abstract: The invention relates to a method for creating an organic resist on a surface of a cooled substrate, the method comprising the steps of condensing a vapour into a solid film on the surface of the cooled substrate; patterning at least part of the solid film by exposing selected portions of said solid film to at least one electron beam thereby creating the organic resist on 5 the surface of the cooled substrate in accordance with a predetermined pattern; wherein the created organic resist remains essentially intact at ambient conditions; and using the created organic resist as a mask for creating semiconductor structures and/or semiconductor devices.
    Type: Application
    Filed: May 1, 2017
    Publication date: December 24, 2020
    Applicant: Danmarks Tekniske Universitet
    Inventors: Anpan HAN, William TIDDI, Marco BELEGGIA
  • Patent number: 8785850
    Abstract: New methods for phase contrast imaging in transmission electron microscopy use the imaging electron beam itself to prepare a hole-free thin film for use as an effective phase plate, in some cases eliminating the need for ex-situ fabrication of a hole and reducing requirements for the precision of the ZPP hardware. The electron optical properties of the ZPP hardware are modified primarily in two ways: by boring a hole using the electron beam; and/or by modifying the electro-optical properties by charging induced by the primary beam. Furthermore a method where the sample is focused by a lens downstream from the ZPP hardware is disclosed. A method for transferring a back focal plane of the objective lens to a selected area aperture plane and any plane conjugated with the back focal plane of the objective lens is also provided.
    Type: Grant
    Filed: January 15, 2011
    Date of Patent: July 22, 2014
    Assignees: National Research Counsel of Canada, Jeol Ltd
    Inventors: Marek Malac, Marco Beleggia, Masahiro Kawasaki, Ray Egerton
  • Publication number: 20110174971
    Abstract: New methods for phase contrast imaging in transmission electron microscopy use the imaging electron beam itself to prepare a hole-free thin film for use as an effective phase plate, in some cases eliminating the need for ex-situ fabrication of a hole and reducing requirements for the precision of the ZPP hardware. The electron optical properties of the ZPP hardware are modified primarily in two ways: by boring a hole using the electron beam; and/or by modifying the electro-optical properties by charging induced by the primary beam. Furthermore a method where the sample is focused by a lens downstream from the ZPP hardware is disclosed. A method for transferring a back focal plane of the objective lens to a selected area aperture plane and any plane conjugated with the back focal plane of the objective lens is also provided.
    Type: Application
    Filed: January 15, 2011
    Publication date: July 21, 2011
    Inventors: Marek Malac, Marco Beleggia, Masahiro Kawasaki, Ray Egerton