Patents by Inventor Marco Jan-Jaco Weiland

Marco Jan-Jaco Weiland has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Pattern data conversion for lithography system
    Patent number: 8710465
    Abstract: A method and system for exposing a target according to pattern data in a maskless lithography machine generating a plurality of exposure beamlets for exposing the target. The method comprises providing input pattern data in a vector format, rendering and quantizing the input pattern data to generate intermediate pattern data, and re-sampling and re-quantizing the intermediate pattern data to generate output pattern data. The output pattern data is supplied to the lithography machine, and the beamlets generated by the lithography machine are modulated on the basis of the output pattern data.
    Type: Grant
    Filed: November 10, 2011
    Date of Patent: April 29, 2014
    Assignee: Mapper Lithography IP B.V.
    Inventors: Teunis Van De Peut, Marco Jan-Jaco Weiland