Patents by Inventor Marco Jan-Jaco Wieland

Marco Jan-Jaco Wieland has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 10297420
    Abstract: A charged particle lithography system for exposing a wafer according to pattern data. The system comprises an electron optical column for generating a plurality of electron beamlets for exposing the wafer, the electron optical column including a beamlet blanker array for switching the beamlets on or off, a data path for transmitting beamlet control data for control of the switching of the beamlets, and a wafer positioning system for moving the wafer under the electron optical column in a scan direction. The wafer positioning system is provided with synchronization signals from the data path to align the wafer with the electron beams from the electron-optical column. The data path further comprises one or more processing units for generating the beamlet control data and one or more transmission channels for transmitting the beamlet control data to the beamlet blanker array.
    Type: Grant
    Filed: May 27, 2014
    Date of Patent: May 21, 2019
    Assignee: MAPPER LITHOGRAPHY IP B.V.
    Inventors: Teunis Van De Peut, Marco Jan-Jaco Wieland
  • Patent number: 10110343
    Abstract: The present invention relates to a method and encoding device for encoding a sequence of m-bit pattern words and outputting as a bit-stream a frame comprising corresponding n-bit symbols as well as a predetermined comma symbol, wherein m<n, wherein occurrences of false commas in the output bitstream are avoided. The output bitstream may further be optimized based on CID count and DC balance.
    Type: Grant
    Filed: June 29, 2016
    Date of Patent: October 23, 2018
    Assignee: MAPPER LITHOGRAPHY IP B.V.
    Inventor: Marco Jan-Jaco Wieland
  • Publication number: 20180277334
    Abstract: A lens element of a charged particle system comprises an electrode having a central opening. The lens element is configured for functionally cooperating with an aperture array that is located directly adjacent said electrode, wherein the aperture array is configured for blocking part of a charged particle beam passing through the central opening of said electrode. The electrode is configured to operate at a first electric potential and the aperture array is configured to operate at a second electric potential different from the first electric potential. The electrode and the aperture array together form an aberration correcting lens.
    Type: Application
    Filed: May 22, 2018
    Publication date: September 27, 2018
    Inventors: Alexander Hendrik Vincent VAN VEEN, Willem Henk URBANUS, Marco Jan-Jaco WIELAND
  • Patent number: 10079206
    Abstract: Method of manufacturing electronic devices using a maskless lithographic exposure system using a maskless pattern writer, wherein beamlet control data is generated for controlling the maskless pattern writer to expose a wafer for creation of the electronic devices. The beamlet control data is generated based on design layout data defining a plurality of structures, such as vias, for the electronic devices to be manufactured from the wafer, and selection data defining which of the structures of the design layout data are applicable for each electronic device to be manufactured from the wafer, the selection data defining a different set of the structures for different subsets of the electronic devices. Exposure of the wafer according to the beamlet control data results in exposing a pattern having a different set of the structures for different subsets of the electronic devices.
    Type: Grant
    Filed: December 23, 2016
    Date of Patent: September 18, 2018
    Assignee: MAPPER LITHOGRAPHY IP B.V.
    Inventors: Marcel Nicolaas Jacobus van Kervinck, Vincent Sylvester Kuiper, Marco Jan-Jaco Wieland
  • Patent number: 10078274
    Abstract: The invention relates to a substrate handling and exposure arrangement comprising a plurality of lithography apparatus, a clamp preparation unit for clamping a wafer on a wafer support structure, a wafer track, wherein the clamp preparation unit is configured for accepting a wafer from the wafer track, and an additional wafer track for transferring the clamp towards the plurality of lithography apparatus.
    Type: Grant
    Filed: August 30, 2016
    Date of Patent: September 18, 2018
    Assignee: MAPPER LITHOGRAPHY IP B.V.
    Inventors: Hendrik Jan De Jong, Marco Jan-Jaco Wieland
  • Patent number: 9978562
    Abstract: A method for exposing a wafer according to pattern data using a charged particle lithography machine generating a plurality of charged particle beamlets for exposing the wafer. The method comprises providing the pattern data in a vector format, rendering the vector pattern data to generate multi-level pattern data, dithering the multi-level pattern data to generate two-level pattern data, supplying the two-level pattern data to the charged particle lithography machine, and switching on and off the beamlets generated by the charged particle lithography machine on the basis of the two-level pattern data, wherein the pattern data is adjusted on the basis of corrective data.
    Type: Grant
    Filed: May 27, 2014
    Date of Patent: May 22, 2018
    Assignee: MAPPER LITHOGRAPHY IP B.V.
    Inventors: Teunis Van De Peut, Marco Jan-Jaco Wieland
  • Publication number: 20180120704
    Abstract: Method of manufacturing electronic devices using a maskless lithographic exposure system using a maskless pattern writer. The method comprises generating beamlet control data for controlling the maskless pattern writer to expose a wafer for creation of the electronic devices, wherein the beamlet control data is generated based on a feature data set defining features selectable for individualizing the electronic devices, wherein exposure of the wafer according to the beamlet control data results in exposing a pattern having a different selection of the features from the feature data set for different subsets of the electronic devices.
    Type: Application
    Filed: December 23, 2016
    Publication date: May 3, 2018
    Inventors: Marcel Nicolaas Jacobus van Kervinck, Vincent Sylvester Kuiper, Marco Jan-Jaco Wieland
  • Publication number: 20180122737
    Abstract: Method of manufacturing electronic devices using a maskless lithographic exposure system using a maskless pattern writer, wherein beamlet control data is generated for controlling the maskless pattern writer to expose a wafer for creation of the electronic devices. The beamlet control data is generated based on design layout data defining a plurality of structures, such as vias, for the electronic devices to be manufactured from the wafer, and selection data defining which of the structures of the design layout data are applicable for each electronic device to be manufactured from the wafer, the selection data defining a different set of the structures for different subsets of the electronic devices. Exposure of the wafer according to the beamlet control data results in exposing a pattern having a different set of the structures for different subsets of the electronic devices.
    Type: Application
    Filed: December 23, 2016
    Publication date: May 3, 2018
    Inventors: Marcel Nicolaas Jacobus van Kervinck, Vincent Sylvester Kuiper, Marco Jan-Jaco Wieland
  • Patent number: 9905322
    Abstract: The invention relates to a collimator electrode stack (70), comprising: —at least three collimator electrodes (71-80) for collimating a charged particle beam along an optical axis (A), wherein each collimator electrode comprises an electrode body with an electrode aperture for allowing passage to the charged particle beam, wherein the electrode bodies are spaced along an axial direction (Z) which is substantially parallel with the optical axis, and wherein the electrode apertures are coaxially aligned along the optical axis; and —a plurality of spacing structures (89) provided between each pair of adjacent collimator electrodes and made of an electrically insulating material, for positioning the collimator electrodes at predetermined distances along the axial direction. Each of the collimator electrodes (71-80) is electrically connected to a separate voltage output (151-160). The invention further relates to a method of operating a charged particle beam generator.
    Type: Grant
    Filed: November 14, 2014
    Date of Patent: February 27, 2018
    Assignee: MAPPER LITHOGRAPHY IP B.V.
    Inventors: Marco Jan-Jaco Wieland, Willem Henk Urbanus
  • Patent number: 9887707
    Abstract: The invention relates to a invention relates to a method and decoding device for receiving an input bit-stream comprising a sequence of n-bit pattern symbols as well as a unique n-bit comma symbol for synchronization, and for generating therefrom a synchronized output comprising a sequence of m-bit pattern words, with m<n. The comma symbol allows detection of bit-skip in the input bit-stream, so that the output to be synchronized to compensate for the bit-skip. The decoding device and method of decoding are particularly simple and may be applied in devices, e.g. in a beam modulator array comprising a plurality of decoding devices, and/or in a lithography system comprising such a beam modulator array, in which space and computational resources are scarce while still providing a synchronization capability.
    Type: Grant
    Filed: June 30, 2016
    Date of Patent: February 6, 2018
    Assignee: MAPPER LITHOGRAPHY IP B.V.
    Inventor: Marco Jan-Jaco Wieland
  • Publication number: 20180006668
    Abstract: The invention relates to a invention relates to a method and decoding device for receiving an input bit-stream comprising a sequence of n-bit pattern symbols as well as a unique n-bit comma symbol for synchronization, and for generating therefrom a synchronized output comprising a sequence of m-bit pattern words, with m<n. The comma symbol allows detection of bit-skip in the input bit-stream, so that the output to be synchronized to compensate for the bit-skip. The decoding device and method of decoding are particularly simple and may be applied in devices, e.g. in a beam modulator array comprising a plurality of decoding devices, and/or in a lithography system comprising such a beam modulator array, in which space and computational resources are scarce while still providing a synchronization capability.
    Type: Application
    Filed: June 30, 2016
    Publication date: January 4, 2018
    Inventor: Marco Jan-Jaco WIELAND
  • Publication number: 20180006765
    Abstract: The present invention relates to a method and encoding device for encoding a sequence of m-bit pattern words and outputting as a bit-stream a frame comprising corresponding n-bit symbols as well as a predetermined comma symbol, wherein m<n, wherein occurrences of false commas in the output bitstream are avoided.
    Type: Application
    Filed: June 29, 2016
    Publication date: January 4, 2018
    Inventor: Marco Jan-Jaco WIELAND
  • Publication number: 20170221674
    Abstract: The invention relates to charged particle beam generator comprising a charged particle source for generating a charged particle beam, a collimator system comprising a collimator structure with a plurality of collimator electrodes for collimating the charged particle beam, a beam source vacuum chamber comprising the charged particle source, and a generator vacuum chamber comprising the collimator structure and the beam source vacuum chamber within a vacuum, wherein the collimator system is positioned outside the beam source vacuum chamber. Each of the beam source vacuum chamber and the generator vacuum chamber may be provided with a vacuum pump.
    Type: Application
    Filed: April 21, 2017
    Publication date: August 3, 2017
    Inventors: Alexander Hendrik Vincent VAN VEEN, Willem Henk URBANUS, Marco Jan-Jaco WIELAND
  • Patent number: 9691589
    Abstract: A method for exposing a wafer using a plurality of charged particle beamlets. The method comprises identifying non-functional beamlets among the beamlets, allocating a first subset of the beamlets for exposing a first portion of the wafer, the first subset excluding the identified non-functional beamlets, performing a first scan for exposing the first portion of the wafer using the first subset of the beamlets, allocating a second subset of the beamlets for exposing a second portion of the wafer, the second subset also excluding the identified non-functional beamlets, and performing a second scan for exposing the second portion of the wafer using the second subset of the beamlets, wherein the first and second portions of the wafer do not overlap and together comprise the complete area of the wafer to be exposed.
    Type: Grant
    Filed: November 10, 2011
    Date of Patent: June 27, 2017
    Assignee: MAPPER LITHOGRAPHY IP B.V.
    Inventors: Teunis Van De Peut, Marco Jan-Jaco Wieland
  • Publication number: 20160370704
    Abstract: The invention relates to a substrate handling and exposure arrangement comprising a plurality of lithography apparatus, a clamp preparation unit for clamping a wafer on a wafer support structure, a wafer track, wherein the clamp preparation unit is configured for accepting a wafer from the wafer track, and an additional wafer track for transferring the clamp towards the plurality of lithography apparatus.
    Type: Application
    Filed: August 30, 2016
    Publication date: December 22, 2016
    Inventors: Hendrik Jan DE JONG, Marco Jan-Jaco WIELAND
  • Patent number: 9460954
    Abstract: The invention relates to a method of clamping a substrate on a surface of a substrate support structure. First, a liquid is applied on a surface of the substrate support structure. The surface is provided with a plurality of contact elements. The liquid is applied such that the contact elements are fully covered by a liquid layer. Then the substrate is provided and placed onto the liquid layer. Finally, liquid underneath the substrate is removed such that the substrate rests on the plurality of contact elements and is clamped by means of a capillary clamping force exerted by a capillary layer of the liquid between the substrate and the surface of the substrate support structure.
    Type: Grant
    Filed: February 19, 2010
    Date of Patent: October 4, 2016
    Assignee: MAPPER LITHOGRAPHY IP B.V.
    Inventors: Hendrik Jan De Jong, Marco Jan-Jaco Wieland
  • Patent number: 9460260
    Abstract: A method for processing exposure data (40) for exposing a pattern on a target (30) using a plurality of charged particle beams (24), the exposure data comprising pattern data (42) representing one or more features (60) to be written on the target (30) and exposure dose data (52) describing exposure dose of the charged particle beams.
    Type: Grant
    Filed: February 16, 2015
    Date of Patent: October 4, 2016
    Assignee: MAPPER LITHOGRAPHY IP B.V.
    Inventor: Marco Jan-Jaco Wieland
  • Patent number: 9362084
    Abstract: The invention relates to a charged particle system for processing a target surface with at least one charged particle beam. The system comprises an optical column with a beam generator module for generating a plurality of charged particle beams, a beam modulator module for switching on and off said plurality of beams and a beam projector module for projecting beams or subbeams on said target surface. The system further comprises a frame supporting each of said modules in a fixed position and alignment elements for aligning at least one of beams and/or subbeams with a downstream module element.
    Type: Grant
    Filed: April 27, 2012
    Date of Patent: June 7, 2016
    Assignee: MAPPER LITHOGRAPHY IP B.V.
    Inventors: Alrik van den Brom, Stijn Willem Herman Karel Steenbrink, Marco Jan-Jaco Wieland, Guido De Boer, Pieter Kappelhof
  • Patent number: 9355751
    Abstract: The invention relates to an electrode stack (70) comprising stacked electrodes (71-80) for manipulating a charged particle beam along an optical axis (A). Each electrode comprises an electrode body with an aperture for the charged particle beam. The electrode bodies are mutually spaced and the electrode apertures are coaxially aligned along the optical axis. The electrode stack comprises electrically insulating spacing structures (89) between each pair of adjacent electrodes for positioning the electrodes (71-80) at predetermined mutual distances along the axial direction (Z). A first electrode and a second electrode each comprise an electrode body with one or more support portions (86), wherein each support portion is configured to accommodate at least one spacing structure (89). The electrode stack has at least one clamping member (91-91c) configured to hold the support portions (86) of the first and second electrodes, as well as the intermediate spacing structure (89) together.
    Type: Grant
    Filed: November 14, 2014
    Date of Patent: May 31, 2016
    Assignee: MAPPER LITHOGRAPHY IP B.V.
    Inventors: Willem Henk Urbanus, Marco Jan-Jaco Wieland
  • Patent number: 9305747
    Abstract: The invention relates to a maskless lithography system for patterning a target using a plurality of charged particle beamlets. The system comprises an electron optical column including a blanker array for modulating the beamlets. The blanker array includes receivers for receiving data signals and blanker elements for modulating the beamlets in accordance with the data signals. The system further comprises a data path comprising a preprocessing system for processing pattern data and a plurality of transmission channels for transmitting processed pattern data to the blanker elements. The data path further comprises a pattern streaming system for receiving pattern data and generating data signals. First and second channel selectors connect a subset of selected transmission channels for pattern data transmission. The first channel selector is connected between the preprocessing system and the transmission channels. The second channel selector is connected between the channels and the blanker elements.
    Type: Grant
    Filed: November 7, 2011
    Date of Patent: April 5, 2016
    Assignee: MAPPER LITHOGRAPHY IP B.V.
    Inventors: Marco Jan-Jaco Wieland, Teunis Van De Peut, Floris Pepijn Van Der Wilt, Ernst Habekotte