Patents by Inventor Marco Kitsche

Marco Kitsche has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Planarization of a material system in a semiconductor device by using a non-selective in situ prepared slurry
    Patent number: 8585465
    Abstract: For complex CMP processes requiring the removal of different dielectric materials, possibly in the presence of a polysilicon material, a slurry material may be adapted at the point of use by selecting an appropriate pH value and avoiding agglomeration of the abrasive particles. The in situ preparation of the slurry material may also enable a highly dynamic adaptation of the removal conditions, for instance when exposing the polysilicon material of gate electrode structures in replacement gate approaches.
    Type: Grant
    Filed: December 16, 2010
    Date of Patent: November 19, 2013
    Assignee: GLOBALFOUNDRIES Inc.
    Inventors: Johannes Groschopf, Rico Hueselitz, Marco Kitsche, Katja Steffen
  • Planarization of a Material System in a Semiconductor Device by Using a Non-Selective In Situ Prepared Slurry
    Publication number: 20110269381
    Abstract: For complex CMP processes requiring the removal of different dielectric materials, possibly in the presence of a polysilicon material, a slurry material may be adapted at the point of use by selecting an appropriate pH value and avoiding agglomeration of the abrasive particles. The in situ preparation of the slurry material may also enable a highly dynamic adaptation of the removal conditions, for instance when exposing the polysilicon material of gate electrode structures in replacement gate approaches.
    Type: Application
    Filed: December 16, 2010
    Publication date: November 3, 2011
    Applicant: GLOBALFOUNDRIES INC.
    Inventors: Johannes Groschopf, Rico Hueselitz, Marco Kitsche, Katja Steffen