Patents by Inventor Marco Stavenga
Marco Stavenga has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20080049201Abstract: An immersion lithographic projection apparatus having a megasonic transducer configured to clean a surface and a method of using megasonic waves to clean a surface of an immersion lithographic projection apparatus are disclosed.Type: ApplicationFiled: May 18, 2007Publication date: February 28, 2008Applicant: ASML NETHERLANDS B.V.Inventors: Marco Stavenga, Hans Jansen, Peter Wanten, Johannes Leonardus Cuijpers, Raymond Beeren, Richard Bruls, Martinus Leenders, Anthonius Petrus De Jong
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Publication number: 20080002162Abstract: A method and apparatus for cleaning the inside of an immersion lithographic apparatus is disclosed. In particular, a liquid supply system of the lithographic apparatus may be used to introduce a cleaning fluid into a space between the projection system and the substrate table of the lithographic apparatus. Additionally or alternatively, a cleaning device may be provided on the substrate table and an ultrasonic emitter may be provided to create an ultrasonic cleaning liquid.Type: ApplicationFiled: January 23, 2007Publication date: January 3, 2008Applicant: ASML NETHERLANDS B.V.Inventors: Hans Jansen, Johannes Baselmans, Sjoerd Donders, Christiaan Hoogendam, Jeroen Mertens, Johannes Mulkens, Marco Stavenga, Bob Streefkerk, Jan Van Der Hoeven, Cedric Grouwstra
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Publication number: 20070002297Abstract: A lithographic apparatus comprises a substrate table that supports a substrate and a substrate handler that moves the substrate relative to the substrate table. The substrate handler is adapted to load substrates on to and unload substrates from the substrate table before and after exposure. Also, a clean gas supply system supplies a clean gas to at least one location at which the substrate is located. The clean gas supply system is moveably mounted. A device manufacturing method utilizing the lithographic apparatus can be used to manufacture at least one of a flat panel display and an integrated circuit device.Type: ApplicationFiled: June 29, 2005Publication date: January 4, 2007Applicant: ASML Netherlands B.V.Inventors: Bernardus Luttikhuis, Petrus Bartray, Wilhelmus Box, Marco Stavenga, Thijs Harink
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Publication number: 20060186057Abstract: A method for filtering a fluid to obtain a fluid having a known purity is described. The fluid is filtered with a filtration system, and upstream of a final filtration stage of the filtration system, a purity of the fluid is measured. A purity of the fluid filtered by the filtration system is determined by correcting the measured purity with a filtration behavior of the final filtration stage. In an embodiment, the fluid comprises an ultra pure water for use as an immersion liquid in a lithographic apparatus.Type: ApplicationFiled: February 22, 2005Publication date: August 24, 2006Applicant: ASML NETHERLANDS B.V.Inventors: Martinus Verhagen, Roelof De Graaf, Johannes Henricus Jacobs, Hans Jansen, Marco Stavenga, Jacobus Johannus Leonardus Verspay
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Publication number: 20060187427Abstract: Various types of pressure regulating devices are disclosed to reduce a pressure gradient in a liquid supply system of a lithographic apparatus, the liquid supply system having a liquid confinement structure configured to at least partially confine a liquid between a projection system and a substrate table of the lithographic apparatus. A high pressure gradient may cause particulate contamination in the liquid supply system and/or liquid confinement structure. A pressure gradient can be reduced by, for example, the use of slow switching in one or more valves, a bleed flow around or through one or more valves, diversion of liquid to a drain rather than or in addition to switching a valve off, a pressure regulator or flow restrictor to prevent shock waves, and a buffer volume/damper to compensate for pressure fluctuation.Type: ApplicationFiled: February 22, 2005Publication date: August 24, 2006Applicant: ASML NETHERLANDS B.V.Inventors: Marco Stavenga, Martinus Verhagen, Johannes Jacobs, Hans Jansen
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Publication number: 20060132731Abstract: A method and apparatus for cleaning the inside of an immersion lithographic apparatus is disclosed. In particular, a liquid supply system of the lithographic apparatus may be used to introduce a cleaning fluid into a space between the projection system and the substrate table of the lithographic apparatus. Additionally or alternatively, a cleaning device may be provided on the substrate table and an ultrasonic emitter may be provided to create an ultrasonic cleaning liquid.Type: ApplicationFiled: December 20, 2004Publication date: June 22, 2006Applicant: ASML NETHERLANDS B.V.Inventors: Hans Jansen, Johannes Baselmans, Sjoerd Donders, Christiaan Hoogendam, Jeroen Johannes Mertens, Johannes Mulkens, Marco Stavenga, Bob Streefkerk, Jan Cornelis Hoeven, Cedric Grouwstra
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Publication number: 20060119809Abstract: A lithographic apparatus is disclosed wherein a liquid supply system is configured to at least partly fill a region between a substrate and a projection system of the lithographic apparatus with a liquid and having a liquid confinement structure fixed in a plane substantially perpendicular to an optical axis of the projection system and configured to cooperate with a substrate table configured to hold the substrate in order to restrict the liquid to a region above an upper surface of the substrate table so that a side of the substrate to be exposed is substantially covered in the liquid during exposure.Type: ApplicationFiled: December 7, 2004Publication date: June 8, 2006Applicant: ASML NETHERLANDS B.V.Inventors: Martinus Cornelis Maria Verhagen, Hans Jansen, Marco Stavenga, Jacobus Johannus Verspay
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Publication number: 20060103821Abstract: In an immersion lithography apparatus in which immersion liquid is supplied to a localized space, the space is substantially polygonal in plan substantially parallel to the substrate. In an embodiment, two corners of the space have a radius of curvature no greater than the width of a transition zone between the space configured to contain liquid and a surrounding configured not to contain liquid.Type: ApplicationFiled: November 12, 2004Publication date: May 18, 2006Applicant: ASML NETHERLANDS B.V.Inventors: Jacobus Johannus Hendricus Verspay, Hans Jansen, Marco Stavenga
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Publication number: 20060033892Abstract: A lithographic apparatus is disclosed. The apparatus includes an illumination system configured to condition a radiation beam, and a support constructed to support a patterning device. The patterning device is capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam. The apparatus also includes a substrate table constructed to hold a substrate, a projection system configured to project the patterned radiation beam onto a target portion of the substrate, a liquid supply system configured to at least partly fill a space between the projection system and the substrate with liquid, a seal member arranged to substantially contain the liquid within the space, and elements to control and/or compensate for evaporation of immersion liquid from the substrate.Type: ApplicationFiled: August 13, 2004Publication date: February 16, 2006Applicant: ASML NETHERLANDS B.V.Inventors: Theodorus Cadee, Joost Ottens, Jeroen Johannes Mertens, Frederick De Jong, Koen Goorman, Boris Menchtchikov, Marco Stavenga, Martin Smeets, Aschwin Lodewijk Van Meer, Bart Schoondermark, Patricius Tinnemans, Stoyan Nihtianov
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Publication number: 20060033898Abstract: A lithographic apparatus is disclosed having a liquid supply system configured to at least partly fill a space between a projection system of the lithographic apparatus and a substrate with liquid, a barrier member arranged to substantially contain the liquid within the space, and one or more elements to control and/or compensate for evaporation of liquid from the substrate.Type: ApplicationFiled: August 17, 2005Publication date: February 16, 2006Applicant: ASML NETHERLANDS B.V.Inventors: Theodorus Cadee, Johannes Jacobs, Nicolaas Kate, Erik Loopstra, Aschwin Lodewijk Vermeer, Jeroen Maria Mertens, Christianus De Mol, Marcel Hubertus Muitjens, Antonius Van Der Net, Joost Ottens, Johannes Quaedackers, Maria Reuhman-Huisken, Marco Stavenga, Patricius Tinnemans, Martinus Verhagen, Jacobus Johannus Hendricus Verspay, Frederik De Jong, Koen Goorman, Boris Menchtchikov, Herman Boom, Stoyan Nihtianov, Richard Moerman, Martin Smeets, Bart Schoondermark, Franciscus Janssen, Michel Riepen
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Publication number: 20050078286Abstract: In a lithographic projection apparatus, a liquid supply system maintains liquid in a space between the projection system and the substrate. The liquid supply system may further include a de-mineralizing unit, a distillation unit, a de-hydrocarbonating unit, a UV radiation source, and/or a filter configured to purify the liquid. A gas content reduction device may be provided to reduce a gas content of the liquid. A chemical may be added to the liquid using an adding device to inhibit lifeform growth and components of the liquid supply system may be made of a material which is non-transparent to visible light such that growth of lifeforms may be reduced.Type: ApplicationFiled: August 24, 2004Publication date: April 14, 2005Applicant: ASML NETHERLANDS B.V.Inventors: Marcel Mathijs Theodore Marie Dierichs, Sjoerd Nicolaas Lambertus Donders, Johannes Henricus Wilhelmus Jacobs, Hans Jansen, Erik Loopstra, Jeroen Johannes Sophia Maria Mertens, Marco Stavenga, Bob Streefkerk, Martinus Cornelis Maria Verhagen, Lejla Seuntiens-Gruda