Abstract: The disclosed techniques relate to a residual gas analyzer, in particular for analyzing a residual gas in an EUB projection exposure apparatus, including a mass spectrometer and an admission device for admitting ionized constituents of the residual gas from a vacuum environment into the mass spectrometer. The admission device includes an ion decelerator, with the ion decelerator having an adjustable deceleration voltage in order to subject the ionized constituents to selection with respect to kinetic energy before being transferred into the mass spectrometer. The disclosed techniques also relate to a projection exposure apparatus including such a residual gas analyzer, and a method for residual gas analysis.

Abstract: This disclosure is directed to a residual gas analyser, in particularly, a residual gas analyser for analysing a residual gas in a microlithography projection exposure apparatus. The residual gas analyser includes a mass spectrometer and an admission device for admitting constituents of the residual gas from a vacuum environment into the mass spectrometer. The admission device includes a switchable ion source. The ion source in a first switching state allows ionized constituents of the residual gas to pass through. The ion source in a second switching state ionizes neutral constituents of the residual gas. The disclosed techniques also relate to a projection exposure apparatus including such a residual gas analyser and to a method of residual gas analysis.

Abstract: The invention relates to an ionization device with an ionization space formed in a container, an inlet system for supplying a gas to be ionized to the ionization space, an electron source having at least one filament for supply of an electron beam to the ionization space, and an outlet system for letting the ionized gas out of the ionization space. Electron optics having at least two electrodes are disposed between the filament and the ionization space.

Abstract: The invention relates to an ionization device with an ionization space formed in a container, an inlet system for supplying a gas to be ionized to the ionization space, an electron source having at least one filament for supply of an electron beam to the ionization space, and an outlet system for letting the ionized gas out of the ionization space.