Patents by Inventor Marcus Agnes Johannes Smits

Marcus Agnes Johannes Smits has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Lithographic apparatus, a method of controlling the apparatus and a device manufacturing method
    Patent number: 8405817
    Abstract: A method of operating a lithographic apparatus is disclosed. The method includes moving a substrate table supporting a substrate relative to a projection system and adjusting the scanning speed between the substrate table and the projection system during imaging of a target within a predefined area at or near an edge of the substrate, or adjusting the stepping speed between adjacent target positions in a predefined area at or near the edge of the substrate, or both. The adjusting the scanning and/or stepping speed may comprise lowering the speed. The projection system is configured to project a patterned beam of radiation on to a target portion of the substrate.
    Type: Grant
    Filed: February 1, 2010
    Date of Patent: March 26, 2013
    Assignee: ASML Netherlands B.V.
    Inventors: Marco Koert Stavenga, Nicolaas Rudolf Kemper, Martinus Hendrikus Antonius Leenders, Paulus Martinus Maria Liebregts, Johannes Catharinus Hubertus Mulkens, Erik Henricus Egidius Catharina Eummelen, Richard Moerman, Michel Riepen, Sergei Shulepov, Gert-Jan Gerardus Johannes Thomas Brands, Koen Steffens, Jan Willem Cromwijk, Ralph Joseph Meijers, Fabrizio Evangelista, David Bessems, Hua Li, Marinus Jochemsen, Pieter Lein Joseph Gunter, Franciscus Wilhelmus Bell, Erik Witberg, Marcus Agnes Johannes Smits, Zhenhua Ma
  • LITHOGRAPHIC APPARATUS, A METHOD OF CONTROLLING THE APPARATUS AND A DEVICE MANUFACTURING METHOD
    Publication number: 20100214543
    Abstract: A method of operating a lithographic apparatus is disclosed. The method includes moving a substrate table supporting a substrate relative to a projection system and adjusting the scanning speed between the substrate table and the projection system during imaging of a target within a predefined area at or near an edge of the substrate, or adjusting the stepping speed between adjacent target positions in a predefined area at or near the edge of the substrate, or both. The adjusting the scanning and/or stepping speed may comprise lowering the speed. The projection system is configured to project a patterned beam of radiation on to a target portion of the substrate.
    Type: Application
    Filed: February 1, 2010
    Publication date: August 26, 2010
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Marco Koert Stavenga, Nicolaas Rudolf Kemper, Martinus Hendrikus Antonius Leenders, Paulus Martinus Maria Liebregts, Johannes Catharinus Hubertus Mulkens, Erik Henricus Egidius Catharina Eummelen, Richard Moerman, Michel Riepen, Sergei Shulepov, Gert-Jan Gerardus Johannes Thomas Brands, Koen Steffens, Jan Willem Cromwijk, Ralph Joseph Meijers, Fabrizio Evangelista, David Bessems, Hua Li, Marinus Jochemsen, Pieter Lein Joseph Gunter, Franciscus Wilhelmus Bell, Erik Witberg, Marcus Agnes Johannes Smits, Zhenhua Ma