Patents by Inventor Marcus Dankelmann

Marcus Dankelmann has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Method for producing a self-aligning masking layer
    Patent number: 10468248
    Abstract: In various embodiments, a method is provided. The method may include forming a buried electrically charged region at a predefined position in a first layer in such a way that the buried electrically charged region generates an electric field having a lateral inhomogeneous field distribution above the first layer, and forming a second layer above the first layer using the field distribution in such a way that a structure of the second layer correlates with the position of the buried electrically charged region.
    Type: Grant
    Filed: April 12, 2017
    Date of Patent: November 5, 2019
    Assignee: Infineon Technologies AG
    Inventors: Heiko Aßmann, Felix Braun, Marcus Dankelmann, Stefan Doering, Karsten Friedrich, Udo Goetschkes, Andreas Greiner, Ralf Rudolf, Jens Schneider
  • METHOD FOR PRODUCING A SELF-ALIGNING MASKING LAYER
    Publication number: 20170294299
    Abstract: In various embodiments, a method is provided. The method may include forming a buried electrically charged region at a predefined position in a first layer in such a way that the buried electrically charged region generates an electric field having a lateral inhomogeneous field distribution above the first layer, and forming a second layer above the first layer using the field distribution in such a way that a structure of the second layer correlates with the position of the buried electrically charged region.
    Type: Application
    Filed: April 12, 2017
    Publication date: October 12, 2017
    Inventors: Heiko Assmann, Felix Braun, Marcus Dankelmann, Stefan Doering, Karsten Friedrich, Udo Goetschkes, Andreas Greiner, Ralf Rudolf, Jens Schneider