Patents by Inventor Marcus Hagting

Marcus Hagting has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patterning device
    Patent number: 7593094
    Abstract: A system and method allow for a more effective and efficient patterning device architecture and control arrangement. A lithography apparatus comprises an illumination system, a patterning device, and a projection system. The illumination system is configured to condition a beam of radiation. The patterning device is configured to pattern the beam of radiation. The patterning device comprises a control system and an array of individually controllable elements. The control system is configured to convert analog signals having respective first voltage values to corresponding differential control signals having second, higher voltage values. Corresponding ones of the individually controllable elements in the array of individually controllable elements are configured to actuate based on receiving a corresponding one of the differential control signals. The projection system is configured to project the patterned beam onto a target area of a substrate.
    Type: Grant
    Filed: June 26, 2006
    Date of Patent: September 22, 2009
    Assignee: ASML Netherlands B.V.
    Inventors: Bert Pieter Van Drieënhuizen, Antonius Johannes Maria Montagne, Jeroen-Frank Dekkers, Paul Klatser, Marcus Hagting
  • Patterning device
    Publication number: 20070296944
    Abstract: A system and method allow for a more effective and efficient patterning device architecture and control arrangement. A lithography apparatus comprises an illumination system, a patterning device, and a projection system. The illumination system is configured to condition a beam of radiation. The patterning device is configured to pattern the beam of radiation. The patterning device comprises a control system and an array of individually controllable elements. The control system is configured to convert analog signals having respective first voltage values to corresponding differential control signals having second, higher voltage values. Corresponding ones of the individually controllable elements in the array of individually controllable elements are configured to actuate based on receiving a corresponding one of the differential control signals. The projection system is configured to project the patterned beam onto a target area of a substrate.
    Type: Application
    Filed: June 26, 2006
    Publication date: December 27, 2007
    Applicant: ASML Netherlands B.V.
    Inventors: Bert Pieter Van Drieenhuizen, Anton Montagne, Jeroen-Frank Dekkers, Paul Klatser, Marcus Hagting