Patents by Inventor Marcus Kerkhof

Marcus Kerkhof has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Lithographic projection apparatus, device manufacturing methods and mask for use in a device manufacturing method
    Publication number: 20070081138
    Abstract: During an alignment calibration process in a lithographic apparatus using a sensor to detect a property of a projected image at substrate level, a diffuser is inserted into the illumination beam to increase the range of angles of radiation incident on the substrate. Thereby it can be ensured that sufficient radiation enters the sensor even when the is a mismatch between the illumination mode used and the acceptance NA of the sensor.
    Type: Application
    Filed: October 11, 2005
    Publication date: April 12, 2007
    Applicant: ASML Netherlands B.V.
    Inventors: Marcus Kerkhof, Bearrach Moest