Patents by Inventor Marcus Ward

Marcus Ward has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Athletic Activity Monitoring Device with Energy Capture
    Publication number: 20160351773
    Abstract: Aspects relate to an energy harvesting device adapted for use by an athlete while exercising. The device may utilize a mass of phase-change material to store heat energy, the stored heat energy subsequently converted into electrical energy by one or more thermoelectric generator modules. The energy harvesting device may be integrated into an item of clothing, and such that the mass of phase change material may store heat energy as the item of clothing is laundered.
    Type: Application
    Filed: May 26, 2016
    Publication date: December 1, 2016
    Inventors: Summer Schneider, Vikram Malhotra, Marcus Ward, Jerry Wiant
  • Nanostructured titania
    Patent number: 7718552
    Abstract: A method and device of nanostructured titania that is crack free. A method in accordance with the present invention comprises depositing a Ti film on a surface, depositing a masking layer on the Ti film, etching said masking layer to expose a limited region of the Ti film, the limited region being of an area less than a threshold area, oxidizing the exposed limited region of the Th.ucsbi film, and annealing the exposed limited region of the Ti film.
    Type: Grant
    Filed: April 4, 2006
    Date of Patent: May 18, 2010
    Assignee: The Regents of the University of California
    Inventors: Zuruzi Abu Samah, Noel C. MacDonald, Marcus Ward, Martin Moskovits, Andrei Kolmakov, Cyrus R. Safinya
  • NANOSTRUCTURED TITANIA
    Publication number: 20100086734
    Abstract: A method and device of nanostructured titania that is crack free. A method in accordance with the present invention comprises depositing a Ti film on a surface, depositing a masking layer on the Ti film, etching said masking layer to expose a limited region of the Ti film, the limited region being of an area less than a threshold area, oxidizing the exposed limited region of the Th.ucsbi film, and annealing the exposed limited region of the Ti film.
    Type: Application
    Filed: April 4, 2006
    Publication date: April 8, 2010
    Inventors: Zuruzi Abu Samah, Noel C. MacDonald, Marcus Ward, Martin Moskovits, Andrei Kolmakov, Cyrus R. Safinya