Patents by Inventor Marcus Zehetbauer

Marcus Zehetbauer has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Process for the decontamination of microlithographic projection exposure devices
    Patent number: 6936825
    Abstract: UV light and a fluid are used in a process for the decontamination of microlithographic projection exposure devices with optical elements or portions thereof, in particular of the surfaces of optical elements. A second UV light source is directed for decontamination, in intervals between exposures, toward at least a portion of the optical elements.
    Type: Grant
    Filed: January 3, 2001
    Date of Patent: August 30, 2005
    Assignee: Carl Zeiss SMT AG
    Inventors: Michael Gerhard, Nils Dieckmann, Christine Sieler, Marcus Zehetbauer, Martin Schriever, Gerd Reisinger
  • Process for the decontamination of microlithographic projection exposure devices
    Publication number: 20010026402
    Abstract: UV light and a fluid are used in a process for the decontamination of microlithographic projection exposure devices with optical elements or portions thereof, in particular of the surfaces of optical elements. A second UV light source is directed for decontamination, in intervals between exposures, toward at least a portion of the optical elements.
    Type: Application
    Filed: January 3, 2001
    Publication date: October 4, 2001
    Inventors: Michael Gerhard, Nils Dieckmann, Christine Sieler, Marcus Zehetbauer, Martin Schriever, Gerd Reisinger