Patents by Inventor Marek Uncovsky

Marek Uncovsky has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11335536
    Abstract: An embodiment of electron microscope system is described that comprises an electron column pole piece and a light guide assembly operatively coupled together. The light guide assembly also includes one or more detectors, and a mirror with a pressure limiting aperture through which an electron beam from an electron source passes. The mirror is also configured to reflect light, as well as to collect back scattered electrons and secondary electrons.
    Type: Grant
    Filed: September 3, 2020
    Date of Patent: May 17, 2022
    Assignee: FEI Company
    Inventors: Marek Uncovsky, Michal Geryk, Jan Lasko
  • Patent number: 10978272
    Abstract: The invention relates to a method of determining the thickness of a sample. According to this method, a diffraction pattern image of a sample of a first material is obtained. Said diffraction pattern image comprises at least image values representative for the diffraction pattern obtained for said sample. A slope of said image values is then determined. The slope is compared to a relation between the thickness of said first material and the slope of image value of a corresponding diffraction pattern image of said first material. The determined slope and said relation are used to determine the thickness of said sample.
    Type: Grant
    Filed: September 23, 2019
    Date of Patent: April 13, 2021
    Assignee: FEI Company
    Inventors: Tomas Vystavel, Pavel Stejskal, Marek Uncovsky
  • Publication number: 20210082659
    Abstract: An embodiment of electron microscope system is described that comprises an electron column pole piece and a light guide assembly operatively coupled together. The light guide assembly also includes one or more detectors, and a mirror with a pressure limiting aperture through which an electron beam from an electron source passes. The mirror is also configured to reflect light, as well as to collect back scattered electrons and secondary electrons.
    Type: Application
    Filed: September 3, 2020
    Publication date: March 18, 2021
    Inventors: Marek Uncovsky, Michal Geryk, Jan Lasko
  • Publication number: 20200135427
    Abstract: The invention relates to a method of determining the thickness of a sample. According to this method, a diffraction pattern image of a sample of a first material is obtained. Said diffraction pattern image comprises at least image values representative for the diffraction pattern obtained for said sample. A slope of said image values is then determined. The slope is compared to a relation between the thickness of said first material and the slope of image value of a corresponding diffraction pattern image of said first material. The determined slope and said relation are used to determine the thickness of said sample.
    Type: Application
    Filed: September 23, 2019
    Publication date: April 30, 2020
    Applicant: FEI Company
    Inventors: Tomas Vystavel, Pavel Stejskal, Marek Uncovsky
  • Patent number: 9679741
    Abstract: An environmental cell for a charged particle beam system allows relative motion between the cell mounted on an X-Y stage and the optical axis of the focusing column, thereby eliminating the need for a sub-stage within the cell. A flexible cell configuration, such as a retractable lid, permits a variety of processes, including beam-induced and thermally-induced processes. Photoelectron yield spectroscopy performed in a charged particle beam system and using gas cascade amplification of the photoelectrons allows analysis of material in the cell and monitoring of processing in the cell. Luminescence analysis can be also performed using a retractable mirror.
    Type: Grant
    Filed: November 9, 2010
    Date of Patent: June 13, 2017
    Assignee: FEI Company
    Inventors: Libor Novak, Marek Uncovsky, Milos Toth, Martin Cafourek, William Parker, Marcus Straw, Mark Emerson
  • Publication number: 20170103868
    Abstract: A method of examining a specimen in a Charged Particle Microscope, comprising the following steps: Providing a specimen on a specimen holder; Heating the specimen to a temperature of at least 250° C.; Directing a beam of charged particles from a source through an illuminator so as to irradiate the specimen; Using a detector to detect a flux of electrons emanating from the specimen in response to said irradiation, wherein said detector comprises: A scintillator module, which produces photons in response to impingement by electrons in said flux; A photon sensor, for sensing said photons, and is configured to: Preferentially register a first category of photons, associated with impingement of electrons on said scintillator module; Selectively suppress a second category of photons, comprising thermal radiation from the heated specimen.
    Type: Application
    Filed: July 11, 2016
    Publication date: April 13, 2017
    Applicant: FEI Company
    Inventors: Libor Novak, Petr Hlavenka, Marek Uncovsky, Martin Cafourek
  • Patent number: 9153416
    Abstract: A method of investigating a sample using a charged-particle microscope is disclosed. By directing an imaging beam of charged particles at a sample, a resulting flux of output radiation is detected from the sample. At least a portion of the output radiation is examined using a detector, the detector comprising a Solid State Photo-Multiplier. The Solid State Photo-Multiplier is biased so that its gain is matched to the magnitude of output radiation flux.
    Type: Grant
    Filed: May 23, 2014
    Date of Patent: October 6, 2015
    Assignee: FEI Company
    Inventors: Petr Hlavenka, Marek Uncovsky
  • Publication number: 20140374593
    Abstract: A method of investigating a sample using a charged-particle microscope is disclosed. By directing an imaging beam of charged particles at a sample, a resulting flux of output radiation is detected from the sample. At least a portion of the output radiation is examined using a detector, the detector comprising a Solid State Photo-Multiplier. The Solid State Photo-Multiplier is biased so that its gain is matched to the magnitude of output radiation flux.
    Type: Application
    Filed: May 23, 2014
    Publication date: December 25, 2014
    Applicant: FEI Company
    Inventors: Petr Hlavenka, Marek Uncovsky
  • Patent number: 8735849
    Abstract: A method of investigating a sample using a charged-particle microscope is disclosed. By directing an imaging beam of charged particles at a sample, a resulting flux of output radiation is detected from the sample. At least a portion of the output radiation is examined using a detector, the detector comprising a Solid State Photo-Multiplier. The Solid State Photo-Multiplier is biased so that its gain is matched to the magnitude of output radiation flux.
    Type: Grant
    Filed: February 14, 2012
    Date of Patent: May 27, 2014
    Assignee: FEI Company
    Inventors: Petr Hlavenka, Marek Uncovsky
  • Publication number: 20120205539
    Abstract: A method of investigating a sample using a charged-particle microscope is disclosed. By directing an imaging beam of charged particles at a sample, a resulting flux of output radiation is detected from the sample. At least a portion of the output radiation is examined using a detector, the detector comprising a Solid State Photo-Multiplier. The Solid State Photo-Multiplier is biased so that its gain is matched to the magnitude of output radiation flux.
    Type: Application
    Filed: February 14, 2012
    Publication date: August 16, 2012
    Applicant: FEI COMPANY
    Inventors: Petr Hlavenka, Marek Uncovsky
  • Publication number: 20120112062
    Abstract: An environmental cell for a charged particle beam system allows relative motion between the cell mounted on an X-Y stage and the optical axis of the focusing column, thereby eliminating the need for a sub-stage within the cell. A flexible cell configuration, such as a retractable lid, permits a variety of processes, including beam-induced and thermally-induced processes. Photon yield spectroscopy performed in a charged particle beam system and using gas cascade amplification of the photoelectrons allows analysis of material in the cell and monitoring of processing in the cell. Luminescence analysis can be also performed using a retractable minor.
    Type: Application
    Filed: November 9, 2010
    Publication date: May 10, 2012
    Applicant: FEI COMPANY
    Inventors: Libor Novak, Marek Uncovsky, Milos Toth, Martin Cafourek, William Parker, Marcus Straw, Mark Emerson
  • Patent number: 7791020
    Abstract: A novel detector for a charged particle beam system which includes multiple gas amplification stages. The stages are typically defined by conductors to which voltage are applied relative to the sample or to a previous stage. By creating cascades of secondary electrons in multiple stages, the gain can be increased without causing dielectric breakdown of the gas.
    Type: Grant
    Filed: March 31, 2008
    Date of Patent: September 7, 2010
    Assignee: FEI Company
    Inventors: Marek Uncovsky, Milos Toth, William Ralph Knowles
  • Patent number: 7009187
    Abstract: A particle detector switchable from an ion detector to an electron detector includes an ion-to-electron converter and a scintillator detector. With one set of voltages on the components, the converter has minimal impact on the electron trajectories so the electrons are efficiently detected by the scintillator detector. With different voltage settings on the components, the detector can be operated in positive ion mode to collect positive ions with adequate efficiency for most FIB applications.
    Type: Grant
    Filed: June 26, 2003
    Date of Patent: March 7, 2006
    Assignee: FEI Company
    Inventors: Robert L. Gerlach, Mark W. Utlaut, Trevor Dingle, Marek Uncovsky
  • Publication number: 20040262531
    Abstract: A particle detector switchable from an ion detector to an electron detector includes an ion-to-electron converter and a scintillator detector. With one set of voltages on the components, the converter has minimal impact on the electron trajectories so the electrons are efficiently detected by the scintillator detector. With different voltage settings on the components, the detector can be operated in positive ion mode to collect positive ions with adequate efficiency for most FIB applications.
    Type: Application
    Filed: June 26, 2003
    Publication date: December 30, 2004
    Inventors: Robert L. Gerlach, Mark W. Utlaut, Trevor Dingle, Marek Uncovsky