Patents by Inventor Marek Uncovsky
Marek Uncovsky has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20230245850Abstract: Various approaches are provided for transferring samples within an inert gas environment to and from a beam system. In one example, a sample transfer capsule includes a container configured to store a sample during transport, wherein the container is adjustable between a closed configuration and an open configuration, an inert gas storage chamber coupled to the container and configured to store an inert gas, and a valve coupled to the inert gas storage chamber and the container and configured to selectively allow the inert gas to flow from the inert gas storage chamber to the container when the container is in the closed configuration. In this way, samples may be maintained in an inert gas environment during transport and while beam system vacuum chambers are vented, thereby reducing exposure of the samples and subsequently reducing the rate of a chemical reaction, such as oxidation or nitridation, of the samples.Type: ApplicationFiled: January 31, 2022Publication date: August 3, 2023Applicant: FEI CompanyInventors: Libor Novák, Petr Glajc, Marek Uncovský
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Patent number: 11335536Abstract: An embodiment of electron microscope system is described that comprises an electron column pole piece and a light guide assembly operatively coupled together. The light guide assembly also includes one or more detectors, and a mirror with a pressure limiting aperture through which an electron beam from an electron source passes. The mirror is also configured to reflect light, as well as to collect back scattered electrons and secondary electrons.Type: GrantFiled: September 3, 2020Date of Patent: May 17, 2022Assignee: FEI CompanyInventors: Marek Uncovsky, Michal Geryk, Jan Lasko
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Patent number: 10978272Abstract: The invention relates to a method of determining the thickness of a sample. According to this method, a diffraction pattern image of a sample of a first material is obtained. Said diffraction pattern image comprises at least image values representative for the diffraction pattern obtained for said sample. A slope of said image values is then determined. The slope is compared to a relation between the thickness of said first material and the slope of image value of a corresponding diffraction pattern image of said first material. The determined slope and said relation are used to determine the thickness of said sample.Type: GrantFiled: September 23, 2019Date of Patent: April 13, 2021Assignee: FEI CompanyInventors: Tomas Vystavel, Pavel Stejskal, Marek Uncovsky
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Publication number: 20210082659Abstract: An embodiment of electron microscope system is described that comprises an electron column pole piece and a light guide assembly operatively coupled together. The light guide assembly also includes one or more detectors, and a mirror with a pressure limiting aperture through which an electron beam from an electron source passes. The mirror is also configured to reflect light, as well as to collect back scattered electrons and secondary electrons.Type: ApplicationFiled: September 3, 2020Publication date: March 18, 2021Inventors: Marek Uncovsky, Michal Geryk, Jan Lasko
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Publication number: 20200135427Abstract: The invention relates to a method of determining the thickness of a sample. According to this method, a diffraction pattern image of a sample of a first material is obtained. Said diffraction pattern image comprises at least image values representative for the diffraction pattern obtained for said sample. A slope of said image values is then determined. The slope is compared to a relation between the thickness of said first material and the slope of image value of a corresponding diffraction pattern image of said first material. The determined slope and said relation are used to determine the thickness of said sample.Type: ApplicationFiled: September 23, 2019Publication date: April 30, 2020Applicant: FEI CompanyInventors: Tomas Vystavel, Pavel Stejskal, Marek Uncovsky
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Publication number: 20190393013Abstract: A charged particle imaging apparatus comprising: A specimen holder, for holding a specimen; A particle-optical column, for: Producing a plurality of charged particle beams, by directing a progenitor charged particle beam onto an aperture plate having a corresponding plurality of apertures within a footprint of the progenitor beam; Directing said beams toward said specimen, wherein: Said aperture plate comprises a plurality of different zones, which comprise mutually different aperture patterns, arranged within said progenitor beam footprint; The particle-optical column comprises a selector device, located downstream of said aperture plate, for selecting a beam array from a chosen one of said zones to be directed onto the specimen.Type: ApplicationFiled: June 25, 2019Publication date: December 26, 2019Applicant: FEI CompanyInventors: Bohuslav Sed'a, Ali Mohammadi-Gheidari, Marek Uncovský
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Publication number: 20180100815Abstract: A method of investigating a specimen using X-ray tomography, comprising (a) mounting the specimen to a specimen holder, (b) irradiating the specimen with a beam of X-rays along a first line of sight through the specimen, and (c) detecting a flux of X-rays transmitted through the specimen and forming a first image. Then (d) repeating the steps (b) and (c) for a series of different lines of sight through the specimen, thereby producing a corresponding series of images.Type: ApplicationFiled: October 9, 2017Publication date: April 12, 2018Applicant: FEI CompanyInventors: Pavel Stejskal, Marek Uncovský, Tomás Vystavel, Alan Frank de Jong, Bart Buijsse, Pierre Bleuet
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Publication number: 20180061613Abstract: A charged-particle microscope having a vacuum chamber comprises a specimen holder, a particle-optical column, a detector and an exchangeable column extending element. The specimen holder is for holding a specimen. The particle-optical column is for producing and directing a beam of charged particles along an axis so as to irradiate the specimen. The column has a terminal pole piece at an extremity facing the specimen holder. The detector is for detecting a flux of radiation emanating from the specimen in response to irradiation by the beam. The exchangeable column extending element is magnetically mounted on the pole piece in a space between the pole piece and the specimen holder. Methods of using the microscope are also disclosed.Type: ApplicationFiled: August 22, 2017Publication date: March 1, 2018Inventors: Bohuslav Sed'a, Lubomír Tuma, Petr Hlavenka, Marek Uncovský, Radovan Vasina, Jan Trojek, Mostafa Maazouz
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Patent number: 9679741Abstract: An environmental cell for a charged particle beam system allows relative motion between the cell mounted on an X-Y stage and the optical axis of the focusing column, thereby eliminating the need for a sub-stage within the cell. A flexible cell configuration, such as a retractable lid, permits a variety of processes, including beam-induced and thermally-induced processes. Photoelectron yield spectroscopy performed in a charged particle beam system and using gas cascade amplification of the photoelectrons allows analysis of material in the cell and monitoring of processing in the cell. Luminescence analysis can be also performed using a retractable mirror.Type: GrantFiled: November 9, 2010Date of Patent: June 13, 2017Assignee: FEI CompanyInventors: Libor Novak, Marek Uncovsky, Milos Toth, Martin Cafourek, William Parker, Marcus Straw, Mark Emerson
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Publication number: 20170103868Abstract: A method of examining a specimen in a Charged Particle Microscope, comprising the following steps: Providing a specimen on a specimen holder; Heating the specimen to a temperature of at least 250° C.; Directing a beam of charged particles from a source through an illuminator so as to irradiate the specimen; Using a detector to detect a flux of electrons emanating from the specimen in response to said irradiation, wherein said detector comprises: A scintillator module, which produces photons in response to impingement by electrons in said flux; A photon sensor, for sensing said photons, and is configured to: Preferentially register a first category of photons, associated with impingement of electrons on said scintillator module; Selectively suppress a second category of photons, comprising thermal radiation from the heated specimen.Type: ApplicationFiled: July 11, 2016Publication date: April 13, 2017Applicant: FEI CompanyInventors: Libor Novak, Petr Hlavenka, Marek Uncovsky, Martin Cafourek
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Publication number: 20160054240Abstract: The invention relates to a method of acquiring an Energy Backscattering Pattern image of a sample in a charged particle apparatus, the sample showing a flat surface, the charged particle apparatus equipped with an electron column for producing a finely focused electron beam, a position sensitive detector for detecting EBSP patterns, and a sample holder for holding and positioning the sample, the method comprising the steps of: Positioning the sample with respect to the electron beam, Directing the electron beam to an impact point on the sample, thereby causing backscattered electrons to irradiate the detector, and Acquiring the signal from the detector while the beam is kept stationary, in which The detector is equipped to selectively detect electrons with an energy above a predefined threshold, and The signal of the electrons with an energy above said threshold is used to form an EBSP image.Type: ApplicationFiled: August 24, 2015Publication date: February 25, 2016Applicant: FEI CompanyInventors: Marek Uncovský, Pavel Stejskal, Tomás Vystavel
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Patent number: 9153416Abstract: A method of investigating a sample using a charged-particle microscope is disclosed. By directing an imaging beam of charged particles at a sample, a resulting flux of output radiation is detected from the sample. At least a portion of the output radiation is examined using a detector, the detector comprising a Solid State Photo-Multiplier. The Solid State Photo-Multiplier is biased so that its gain is matched to the magnitude of output radiation flux.Type: GrantFiled: May 23, 2014Date of Patent: October 6, 2015Assignee: FEI CompanyInventors: Petr Hlavenka, Marek Uncovsky
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Publication number: 20140374593Abstract: A method of investigating a sample using a charged-particle microscope is disclosed. By directing an imaging beam of charged particles at a sample, a resulting flux of output radiation is detected from the sample. At least a portion of the output radiation is examined using a detector, the detector comprising a Solid State Photo-Multiplier. The Solid State Photo-Multiplier is biased so that its gain is matched to the magnitude of output radiation flux.Type: ApplicationFiled: May 23, 2014Publication date: December 25, 2014Applicant: FEI CompanyInventors: Petr Hlavenka, Marek Uncovsky
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Patent number: 8735849Abstract: A method of investigating a sample using a charged-particle microscope is disclosed. By directing an imaging beam of charged particles at a sample, a resulting flux of output radiation is detected from the sample. At least a portion of the output radiation is examined using a detector, the detector comprising a Solid State Photo-Multiplier. The Solid State Photo-Multiplier is biased so that its gain is matched to the magnitude of output radiation flux.Type: GrantFiled: February 14, 2012Date of Patent: May 27, 2014Assignee: FEI CompanyInventors: Petr Hlavenka, Marek Uncovsky
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Publication number: 20120205539Abstract: A method of investigating a sample using a charged-particle microscope is disclosed. By directing an imaging beam of charged particles at a sample, a resulting flux of output radiation is detected from the sample. At least a portion of the output radiation is examined using a detector, the detector comprising a Solid State Photo-Multiplier. The Solid State Photo-Multiplier is biased so that its gain is matched to the magnitude of output radiation flux.Type: ApplicationFiled: February 14, 2012Publication date: August 16, 2012Applicant: FEI COMPANYInventors: Petr Hlavenka, Marek Uncovsky
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Publication number: 20120112062Abstract: An environmental cell for a charged particle beam system allows relative motion between the cell mounted on an X-Y stage and the optical axis of the focusing column, thereby eliminating the need for a sub-stage within the cell. A flexible cell configuration, such as a retractable lid, permits a variety of processes, including beam-induced and thermally-induced processes. Photon yield spectroscopy performed in a charged particle beam system and using gas cascade amplification of the photoelectrons allows analysis of material in the cell and monitoring of processing in the cell. Luminescence analysis can be also performed using a retractable minor.Type: ApplicationFiled: November 9, 2010Publication date: May 10, 2012Applicant: FEI COMPANYInventors: Libor Novak, Marek Uncovsky, Milos Toth, Martin Cafourek, William Parker, Marcus Straw, Mark Emerson
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Patent number: 7791020Abstract: A novel detector for a charged particle beam system which includes multiple gas amplification stages. The stages are typically defined by conductors to which voltage are applied relative to the sample or to a previous stage. By creating cascades of secondary electrons in multiple stages, the gain can be increased without causing dielectric breakdown of the gas.Type: GrantFiled: March 31, 2008Date of Patent: September 7, 2010Assignee: FEI CompanyInventors: Marek Uncovsky, Milos Toth, William Ralph Knowles
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Publication number: 20090242758Abstract: A novel detector for a charged particle beam system which includes multiple gas amplification stages. The stages are typically defined by conductors to which voltage are applied relative to the sample or to a previous stage. By creating cascades of secondary electrons in multiple stages, the gain can be increased without causing dielectric breakdown of the gas.Type: ApplicationFiled: March 31, 2008Publication date: October 1, 2009Applicant: FEI COMPANYInventors: MAREK UNCOVSKY, MILOS TOTH, WILLIAM RALPH KNOWLES
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Patent number: 7009187Abstract: A particle detector switchable from an ion detector to an electron detector includes an ion-to-electron converter and a scintillator detector. With one set of voltages on the components, the converter has minimal impact on the electron trajectories so the electrons are efficiently detected by the scintillator detector. With different voltage settings on the components, the detector can be operated in positive ion mode to collect positive ions with adequate efficiency for most FIB applications.Type: GrantFiled: June 26, 2003Date of Patent: March 7, 2006Assignee: FEI CompanyInventors: Robert L. Gerlach, Mark W. Utlaut, Trevor Dingle, Marek Uncovsky
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Publication number: 20040262531Abstract: A particle detector switchable from an ion detector to an electron detector includes an ion-to-electron converter and a scintillator detector. With one set of voltages on the components, the converter has minimal impact on the electron trajectories so the electrons are efficiently detected by the scintillator detector. With different voltage settings on the components, the detector can be operated in positive ion mode to collect positive ions with adequate efficiency for most FIB applications.Type: ApplicationFiled: June 26, 2003Publication date: December 30, 2004Inventors: Robert L. Gerlach, Mark W. Utlaut, Trevor Dingle, Marek Uncovsky