Patents by Inventor Marek Uncovsky
Marek Uncovsky has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 11335536Abstract: An embodiment of electron microscope system is described that comprises an electron column pole piece and a light guide assembly operatively coupled together. The light guide assembly also includes one or more detectors, and a mirror with a pressure limiting aperture through which an electron beam from an electron source passes. The mirror is also configured to reflect light, as well as to collect back scattered electrons and secondary electrons.Type: GrantFiled: September 3, 2020Date of Patent: May 17, 2022Assignee: FEI CompanyInventors: Marek Uncovsky, Michal Geryk, Jan Lasko
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Patent number: 10978272Abstract: The invention relates to a method of determining the thickness of a sample. According to this method, a diffraction pattern image of a sample of a first material is obtained. Said diffraction pattern image comprises at least image values representative for the diffraction pattern obtained for said sample. A slope of said image values is then determined. The slope is compared to a relation between the thickness of said first material and the slope of image value of a corresponding diffraction pattern image of said first material. The determined slope and said relation are used to determine the thickness of said sample.Type: GrantFiled: September 23, 2019Date of Patent: April 13, 2021Assignee: FEI CompanyInventors: Tomas Vystavel, Pavel Stejskal, Marek Uncovsky
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Publication number: 20210082659Abstract: An embodiment of electron microscope system is described that comprises an electron column pole piece and a light guide assembly operatively coupled together. The light guide assembly also includes one or more detectors, and a mirror with a pressure limiting aperture through which an electron beam from an electron source passes. The mirror is also configured to reflect light, as well as to collect back scattered electrons and secondary electrons.Type: ApplicationFiled: September 3, 2020Publication date: March 18, 2021Inventors: Marek Uncovsky, Michal Geryk, Jan Lasko
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Publication number: 20200135427Abstract: The invention relates to a method of determining the thickness of a sample. According to this method, a diffraction pattern image of a sample of a first material is obtained. Said diffraction pattern image comprises at least image values representative for the diffraction pattern obtained for said sample. A slope of said image values is then determined. The slope is compared to a relation between the thickness of said first material and the slope of image value of a corresponding diffraction pattern image of said first material. The determined slope and said relation are used to determine the thickness of said sample.Type: ApplicationFiled: September 23, 2019Publication date: April 30, 2020Applicant: FEI CompanyInventors: Tomas Vystavel, Pavel Stejskal, Marek Uncovsky
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Patent number: 9679741Abstract: An environmental cell for a charged particle beam system allows relative motion between the cell mounted on an X-Y stage and the optical axis of the focusing column, thereby eliminating the need for a sub-stage within the cell. A flexible cell configuration, such as a retractable lid, permits a variety of processes, including beam-induced and thermally-induced processes. Photoelectron yield spectroscopy performed in a charged particle beam system and using gas cascade amplification of the photoelectrons allows analysis of material in the cell and monitoring of processing in the cell. Luminescence analysis can be also performed using a retractable mirror.Type: GrantFiled: November 9, 2010Date of Patent: June 13, 2017Assignee: FEI CompanyInventors: Libor Novak, Marek Uncovsky, Milos Toth, Martin Cafourek, William Parker, Marcus Straw, Mark Emerson
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Publication number: 20170103868Abstract: A method of examining a specimen in a Charged Particle Microscope, comprising the following steps: Providing a specimen on a specimen holder; Heating the specimen to a temperature of at least 250° C.; Directing a beam of charged particles from a source through an illuminator so as to irradiate the specimen; Using a detector to detect a flux of electrons emanating from the specimen in response to said irradiation, wherein said detector comprises: A scintillator module, which produces photons in response to impingement by electrons in said flux; A photon sensor, for sensing said photons, and is configured to: Preferentially register a first category of photons, associated with impingement of electrons on said scintillator module; Selectively suppress a second category of photons, comprising thermal radiation from the heated specimen.Type: ApplicationFiled: July 11, 2016Publication date: April 13, 2017Applicant: FEI CompanyInventors: Libor Novak, Petr Hlavenka, Marek Uncovsky, Martin Cafourek
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Patent number: 9153416Abstract: A method of investigating a sample using a charged-particle microscope is disclosed. By directing an imaging beam of charged particles at a sample, a resulting flux of output radiation is detected from the sample. At least a portion of the output radiation is examined using a detector, the detector comprising a Solid State Photo-Multiplier. The Solid State Photo-Multiplier is biased so that its gain is matched to the magnitude of output radiation flux.Type: GrantFiled: May 23, 2014Date of Patent: October 6, 2015Assignee: FEI CompanyInventors: Petr Hlavenka, Marek Uncovsky
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Publication number: 20140374593Abstract: A method of investigating a sample using a charged-particle microscope is disclosed. By directing an imaging beam of charged particles at a sample, a resulting flux of output radiation is detected from the sample. At least a portion of the output radiation is examined using a detector, the detector comprising a Solid State Photo-Multiplier. The Solid State Photo-Multiplier is biased so that its gain is matched to the magnitude of output radiation flux.Type: ApplicationFiled: May 23, 2014Publication date: December 25, 2014Applicant: FEI CompanyInventors: Petr Hlavenka, Marek Uncovsky
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Patent number: 8735849Abstract: A method of investigating a sample using a charged-particle microscope is disclosed. By directing an imaging beam of charged particles at a sample, a resulting flux of output radiation is detected from the sample. At least a portion of the output radiation is examined using a detector, the detector comprising a Solid State Photo-Multiplier. The Solid State Photo-Multiplier is biased so that its gain is matched to the magnitude of output radiation flux.Type: GrantFiled: February 14, 2012Date of Patent: May 27, 2014Assignee: FEI CompanyInventors: Petr Hlavenka, Marek Uncovsky
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Publication number: 20120205539Abstract: A method of investigating a sample using a charged-particle microscope is disclosed. By directing an imaging beam of charged particles at a sample, a resulting flux of output radiation is detected from the sample. At least a portion of the output radiation is examined using a detector, the detector comprising a Solid State Photo-Multiplier. The Solid State Photo-Multiplier is biased so that its gain is matched to the magnitude of output radiation flux.Type: ApplicationFiled: February 14, 2012Publication date: August 16, 2012Applicant: FEI COMPANYInventors: Petr Hlavenka, Marek Uncovsky
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Publication number: 20120112062Abstract: An environmental cell for a charged particle beam system allows relative motion between the cell mounted on an X-Y stage and the optical axis of the focusing column, thereby eliminating the need for a sub-stage within the cell. A flexible cell configuration, such as a retractable lid, permits a variety of processes, including beam-induced and thermally-induced processes. Photon yield spectroscopy performed in a charged particle beam system and using gas cascade amplification of the photoelectrons allows analysis of material in the cell and monitoring of processing in the cell. Luminescence analysis can be also performed using a retractable minor.Type: ApplicationFiled: November 9, 2010Publication date: May 10, 2012Applicant: FEI COMPANYInventors: Libor Novak, Marek Uncovsky, Milos Toth, Martin Cafourek, William Parker, Marcus Straw, Mark Emerson
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Patent number: 7791020Abstract: A novel detector for a charged particle beam system which includes multiple gas amplification stages. The stages are typically defined by conductors to which voltage are applied relative to the sample or to a previous stage. By creating cascades of secondary electrons in multiple stages, the gain can be increased without causing dielectric breakdown of the gas.Type: GrantFiled: March 31, 2008Date of Patent: September 7, 2010Assignee: FEI CompanyInventors: Marek Uncovsky, Milos Toth, William Ralph Knowles
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Patent number: 7009187Abstract: A particle detector switchable from an ion detector to an electron detector includes an ion-to-electron converter and a scintillator detector. With one set of voltages on the components, the converter has minimal impact on the electron trajectories so the electrons are efficiently detected by the scintillator detector. With different voltage settings on the components, the detector can be operated in positive ion mode to collect positive ions with adequate efficiency for most FIB applications.Type: GrantFiled: June 26, 2003Date of Patent: March 7, 2006Assignee: FEI CompanyInventors: Robert L. Gerlach, Mark W. Utlaut, Trevor Dingle, Marek Uncovsky
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Publication number: 20040262531Abstract: A particle detector switchable from an ion detector to an electron detector includes an ion-to-electron converter and a scintillator detector. With one set of voltages on the components, the converter has minimal impact on the electron trajectories so the electrons are efficiently detected by the scintillator detector. With different voltage settings on the components, the detector can be operated in positive ion mode to collect positive ions with adequate efficiency for most FIB applications.Type: ApplicationFiled: June 26, 2003Publication date: December 30, 2004Inventors: Robert L. Gerlach, Mark W. Utlaut, Trevor Dingle, Marek Uncovsky