Patents by Inventor Margaret Kathleen SWIECICKI

Margaret Kathleen SWIECICKI has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Wafer pre-aligner and method of pre-aligning wafer
    Patent number: 11929277
    Abstract: A pre-aligner for pre-aligning a wafer having a notch. The pre-aligner includes a wafer platform having a wafer receiving surface, and a drive device. A detector is provided to detect the notch, and a memory is provided to store a notch window defining a range of angles in which the notch is predicted to be located in relation to a start position. A controller performs a pre-alignment operation where the wafer is rotated from the start position to an alignment location. The controller performs the operation such that the wafer is rotated at maximum acceleration/deceleration values from the start position to a notch location detected by the detector: where the operation is limited to a maximum velocity for rotation of the wafer from the start position to a notch window; and where the operation is limited to a scanning velocity within the notch window until the notch location is detected.
    Type: Grant
    Filed: August 28, 2020
    Date of Patent: March 12, 2024
    Assignees: KABUSHIKI KAISHA YASKAWA DENKI, YASKAWA AMERICA, INC.
    Inventors: John Charles Rogers, Margaret Kathleen Swiecicki
  • WAFER PRE-ALIGNER AND METHOD OF PRE-ALIGNING WAFER
    Publication number: 20210074566
    Abstract: A pre-aligner for pre-aligning a wafer having a notch. The pre-aligner includes a wafer platform having a wafer receiving surface, and a drive device. A detector is provided to detect the notch, and a memory is provided to store a notch window defining a range of angles in which the notch is predicted to be located in relation to a start position. A controller performs a pre-alignment operation where the wafer is rotated from the start position to an alignment location. The controller performs the operation such that the wafer is rotated at maximum acceleration/deceleration values from the start position to a notch location detected by the detector: where the operation is limited to a maximum velocity for rotation of the wafer from the start position to a notch window; and where the operation is limited to a scanning velocity within the notch window until the notch location is detected.
    Type: Application
    Filed: August 28, 2020
    Publication date: March 11, 2021
    Applicants: Yaskawa America, Inc.
    Inventors: John Charles ROGERS, Margaret Kathleen SWIECICKI