Patents by Inventor Mari Koizumi
Mari Koizumi has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
-
Patent number: 9134617Abstract: A solvent developing negative-tone resist composition containing a base component (A) which exhibits increased polarity and reduced solubility in an organic solvent under action of an acid and an acid generator component (B) which generates an acid upon exposure, the component (A) including a resin component (A1) containing: a structural unit (a2) derived from an acrylate ester containing a 4- to 12-membered lactone-containing cyclic group, a 3- to 7-membered ether-containing cyclic group or a 5- to 7-membered carbonate-containing cyclic group; and a structural unit (a1) derived from an acrylate ester containing an acid decomposable group which exhibited increased polarity by the action of acid, and the acid generator component (B) including an acid generator (B1) containing a compound which generates a sulfonic acid upon exposure.Type: GrantFiled: June 8, 2012Date of Patent: September 15, 2015Assignees: TOKYO OHKA KOGYO CO., LTD., RIKENInventors: Takahiro Senzaki, Ken Miyagi, Shigenori Fujikawa, Mari Koizumi, Harumi Hayakawa
-
Patent number: 9051648Abstract: A method of producing a substrate provided with a metal nanostructure on the surface thereof, including: forming a layer containing a block copolymer having a plurality of polymers bonded on a surface of a substrate, and subjecting the layer to phase separation, selectively removing a phase of at least one polymer of the plurality of copolymers constituting the block copolymer from the layer to expose part of the surface of the substrate, and allowing a metal ion to come into contact with the exposed surface of the substrate to effect an electrochemical reaction between the surface of the substrate and the metal ion, thereby depositing a metal on the surface of the substrate; and a substrate provided with a metal nanostructure on the surface thereof produced by the same method.Type: GrantFiled: August 25, 2011Date of Patent: June 9, 2015Assignees: Riken, Tokyo Ohka Kogyo Co., Ltd.Inventors: Shigenori Fujikawa, Mari Koizumi, Takahiro Senzaki, Takahiro Dazai, Ken Miyagi
-
Patent number: 8999631Abstract: An undercoat agent usable in phase separation of a layer formed on a substrate, the layer containing a block copolymer having a plurality of polymers bonded, the undercoat agent including a resin component, and 20 mol % to 80 mol % of all the structural units of the resin component being a structural unit derived from an aromatic ring-containing monomer; and a method of forming a pattern of a layer containing a block copolymer, the method including: step (1) coating the undercoat agent on a substrate (1), thereby forming a layer (2) composed of the undercoat agent, step (2) forming a layer (3) containing a block copolymer having a plurality of polymers bonded on the surface of the layer (2) composed of the undercoat agent, and subjecting the layer (3) containing the block copolymer to phase separation, and step (3) selectively removing a phase (3a) of at least one polymer of the plurality of copolymers constituting the block copolymer from the layer (3) containing the block copolymer.Type: GrantFiled: September 12, 2011Date of Patent: April 7, 2015Assignees: Tokyo Ohka Kogyo Co., Ltd., RikenInventors: Takahiro Senzaki, Takahiro Dazai, Ken Miyagi, Shigenori Fujikawa, Harumi Hayakawa, Mari Koizumi
-
Patent number: 8956810Abstract: An undercoat agent usable in phase separation of a layer formed on a substrate, the layer containing a block copolymer having a plurality of polymers bonded, the undercoat agent including a resin component, and 20 mol % to 80 mol % of all the structural units of the resin component being a structural unit derived from an aromatic ring-containing monomer; and a method of forming a pattern of a layer containing a block copolymer, the method including: step (1) coating the undercoat agent on a substrate (1), thereby forming a layer (2) composed of the undercoat agent, step (2) forming a layer (3) containing a block copolymer having a plurality of polymers bonded on the surface of the layer (2) composed of the undercoat agent, and subjecting the layer (3) containing the block copolymer to phase separation, and step (3) selectively removing a phase (3a) of at least one polymer of the plurality of copolymers constituting the block copolymer from the layer (3) containing the block copolymer.Type: GrantFiled: September 12, 2011Date of Patent: February 17, 2015Assignees: Tokyo Ohka Kogyo Co., Ltd., RikenInventors: Takahiro Senzaki, Takahiro Dazai, Ken Miyagi, Shigenori Fujikawa, Harumi Hayakawa, Mari Koizumi
-
Publication number: 20140127626Abstract: A negative tone-development resist composition for forming a guide pattern, including a base component (A) and an acid generator component (B), the base component (A) including a resin component (A1) having a structural unit (a1) derived from an acrylate ester containing an acid dissociable group, and at least one of the following structural units (a2): a structural unit derived from an acrylic acid ester containing a lactone-containing cyclic group, a structural unit derived from an acrylic acid ester containing an ether-containing cyclic group and a structural unit derived from an acrylic acid ester containing a carbonate-containing cyclic group, and a constituent unit (a1) derived from an acrylic acid ester containing an acid-labile group, the acid generator component (B) including an acid generator (B1) including at least one compound represented by general formula (b1) or (b2) shown belowType: ApplicationFiled: October 5, 2011Publication date: May 8, 2014Applicants: RIKEN, TOKYO OHKA KOGYO CO., LTD.Inventors: Takahiro Senzaki, Takahiro Dazai, Ken Miyagi, Shigenori Fujikawa, Mari Koizumi, Harumi Hayakawa
-
Publication number: 20140113236Abstract: A solvent developing negative-tone resist composition containing a base component (A) which exhibits increased polarity and reduced solubility in an organic solvent under action of an acid and an acid generator component (B) which generates an acid upon exposure, the component (A) including a resin component (A1) containing: a structural unit (a2) derived from an acrylate ester containing a 4- to 12-membered lactone-containing cyclic group, a 3- to 7-membered ether-containing cyclic group or a 5- to 7-membered carbonate-containing cyclic group; and a structural unit (a1) derived from an acrylate ester containing an acid decomposable group which exhibited increased polarity by the action of acid, and the acid generator component (B) including an acid generator (B1) containing a compound which generates a sulfonic acid upon exposure.Type: ApplicationFiled: June 8, 2012Publication date: April 24, 2014Applicants: Riken, Tokyo Ohka Kogyo Co., LtdInventors: Takahiro Senzaki, Ken Miyagi, Shigenori Fujikawa, Mari Koizumi, Harumi Hayakawa
-
Publication number: 20140030652Abstract: An undercoat agent usable in phase separation of a layer formed on a substrate, the layer containing a block copolymer having a plurality of polymers bonded, the undercoat agent including a resin component, and 20 mol % to 80 mol % of all the structural units of the resin component being a structural unit derived from an aromatic ring-containing monomer; and a method of forming a pattern of a layer containing a block copolymer, the method including: step (1) coating the undercoat agent on a substrate (1), thereby forming a layer (2) composed of the undercoat agent, step (2) forming a layer (3) containing a block copolymer having a plurality of polymers bonded on the surface of the layer (2) composed of the undercoat agent, and subjecting the layer (3) containing the block copolymer to phase separation, and step (3) selectively removing a phase (3a) of at least one polymer of the plurality of copolymers constituting the block copolymer from the layer (3) containing the block copolymer.Type: ApplicationFiled: September 12, 2011Publication date: January 30, 2014Applicants: Riken, Tokyo Ohka Kogyo Co.,Ltd.Inventors: Takahiro Senzaki, Takahiro Dazai, Ken Miyagi, Shigenori Fujikawa, Harumi Hayakawa, Mari Koizumi
-
Publication number: 20120048738Abstract: A method of producing a substrate provided with a metal nanostructure on the surface thereof, including: forming a layer containing a block copolymer having a plurality of polymers bonded on a surface of a substrate, and subjecting the layer to phase separation, selectively removing a phase of at least one polymer of the plurality of copolymers constituting the block copolymer from the layer to expose part of the surface of the substrate, and allowing a metal ion to come into contact with the exposed surface of the substrate to effect an electrochemical reaction between the surface of the substrate and the metal ion, thereby depositing a metal on the surface of the substrate; and a substrate provided with a metal nanostructure on the surface thereof produced by the same method.Type: ApplicationFiled: August 25, 2011Publication date: March 1, 2012Applicants: Tokyo Ohka Kogyo Co., Ltd., RikenInventors: Shigenori Fujikawa, Mari Koizumi, Takahiro Senzaki, Takahiro Dazai, Ken Miyagi
-
Patent number: 8025923Abstract: A method of manufacturing a structure, including forming a composite film composed of a coating film and an organic or inorganic film on top of a substrate by forming the coating film on the surface of a template provided on top of the substrate; forming the organic or inorganic film on the surface of the coating film, and removing a portion of the organic or inorganic film and a portion of the coating film; forming a second coating film on the surface of the composite film; forming an organic coating film on the substrate that covers the second coating film; removing a portion of the second coating film; and forming a structure composed of a metal or metal oxide later on the substrate by removing all residues left on the substrate except for the coating film and the second coating film.Type: GrantFiled: September 2, 2008Date of Patent: September 27, 2011Assignees: Tokyo Ohka Kogyo Co., Ltd., RikenInventors: Shigenori Fujikawa, Toyoki Kunitake, Hiromi Takaemoto, Mari Koizumi, Hideo Hada, Sanae Furuya
-
Publication number: 20090087625Abstract: A method of producing a structure, including: a composite film formation step that forms a composite film composed of a coating film and an organic film or inorganic film on top of a substrate by conducting Steps (1) to (3) below: (1) forming the coating film composed of a metal layer or a metal oxide layer on the surface of a template provided on top of the substrate, (2) forming the organic film or inorganic film on the surface of the coating film, and (3) removing a portion of the organic film or inorganic film and the coating film; a second coating film formation step that forms a second coating film composed of a metal layer or a metal oxide layer on the surface of the composite film; a coating step that, following formation of the second coating film, forms an organic coating film on the substrate that covers the surface of the substrate; a removal step that removes a portion of the second coating film, the side surfaces of which are at least partially supported by the organic coating film; and a strType: ApplicationFiled: September 2, 2008Publication date: April 2, 2009Applicants: TOKYO OHKA KOGYO CO., LTD., RIKENInventors: Shigenori Fujikawa, Toyoki Kunitake, Hiromi Takemoto, Mari Koizumi, Hideo Hada, Sanae Furuya
-
Patent number: 6229949Abstract: The following are disclosed: An optical wave-guide constituted out of polymers, an optical integrated circuit, an optical module, and an optical communication system (optical communication apparatus) using these. In the polymer optical waveguide which is fabricated on a substrate having an inorganic material on at least a part of the surface thereof and in which a core layer and a clad layer positioned closer to the base than the core layer are composed of polymers, a buffer layer, which is composed of a polymer different from that of the clad layer, is provided between the clad layer and the base.Type: GrantFiled: February 26, 1999Date of Patent: May 8, 2001Assignee: Hitachi, Ltd.Inventors: Tatemi Ido, Hideaki Takano, Mari Koizumi