Patents by Inventor Mari Tanabe

Mari Tanabe has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 9696574
    Abstract: A transparent conductive laminate includes a coating film including a first transparent resin film and a coating layer or layers provided on one or both sides of the first transparent resin film; a transparent conductive film including a second transparent resin film and a transparent conductive layer provided on one side of the second transparent resin film; and a pressure-sensitive adhesive layer interposed between the coating film and the transparent conductive film, wherein the coating layer of the coating film is laminated with the pressure-sensitive adhesive layer to a side of the transparent conductive film where the transparent conductive layer is not provided, the pressure-sensitive adhesive layer has a storage elastic modulus of 80,000 Pa or less at 120° C., and the adhesive strength between the pressure-sensitive adhesive layer and the coating layer is from 5 N/25 mm to 20 N/25 mm.
    Type: Grant
    Filed: May 1, 2012
    Date of Patent: July 4, 2017
    Inventors: Mari Tanabe, Hidehiko Andou, Hideo Sugawara
  • Patent number: 9406415
    Abstract: A method of manufacturing a transparent conductive film has the steps of: preparing a laminated body in which a transparent conductive layer that is not patterned is formed on a flexible transparent base, removing a part of the transparent conductive layer to form the pattern forming part having the transparent conductive layer on the flexible transparent base and the pattern opening part not having the transparent conductive layer on the flexible transparent base, and heating the laminated body in which the transparent conductive layer is patterned. The absolute value of the difference H1?H2 of the dimensional change rate H1 of the pattern forming part and the dimensional change rate H2 of the pattern opening part in the heat treatment step is preferably less than 0.03%.
    Type: Grant
    Filed: September 30, 2013
    Date of Patent: August 2, 2016
    Assignee: NITTO DENKO CORPORATION
    Inventors: Mari Tanabe, Hidehiko Andou, Hideo Sugawara
  • Publication number: 20140078422
    Abstract: A transparent conductive laminate includes a coating film including a first transparent resin film and a coating layer or layers provided on one or both sides of the first transparent resin film; a transparent conductive film including a second transparent resin film and a transparent conductive layer provided on one side of the second transparent resin film; and a pressure-sensitive adhesive layer interposed between the coating film and the transparent conductive film, wherein the coating layer of the coating film is laminated with the pressure-sensitive adhesive layer to a side of the transparent conductive film where the transparent conductive layer is not provided, the pressure-sensitive adhesive layer has a storage elastic modulus of 80,000 Pa or less at 120° C., and the adhesive strength between the pressure-sensitive adhesive layer and the coating layer is from 5 N/25 mm to 20 N/25 mm.
    Type: Application
    Filed: May 1, 2012
    Publication date: March 20, 2014
    Applicant: NITTO DENKO CORPORATION
    Inventors: Mari Tanabe, Hidehiko Andou, Hideo Sugawara
  • Publication number: 20140027405
    Abstract: A method of manufacturing a transparent conductive film has the steps of: preparing a laminated body in which a transparent conductive layer that is not patterned is formed on a flexible transparent base, removing a part of the transparent conductive layer to form the pattern forming part having the transparent conductive layer on the flexible transparent base and the pattern opening part not having the transparent conductive layer on the flexible transparent base, and heating the laminated body in which the transparent conductive layer is patterned. The absolute value of the difference H1?H2 of the dimensional change rate H1 of the pattern forming part and the dimensional change rate H2 of the pattern opening part in the heat treatment step is preferably less than 0.
    Type: Application
    Filed: September 30, 2013
    Publication date: January 30, 2014
    Applicant: NITTO DENKO CORPORATION
    Inventors: Mari Tanabe, Hidehiko Andou, Hideo Sugawara
  • Patent number: 8568603
    Abstract: A method of manufacturing a transparent conductive film has the steps of: preparing a laminated body in which a transparent conductive layer that is not patterned is formed on a flexible transparent base, removing a part of the transparent conductive layer to form the pattern forming part having the transparent conductive layer on the flexible transparent base and the pattern opening part not having the transparent conductive layer on the flexible transparent base, and heating the laminated body in which the transparent conductive layer is patterned. The absolute value of the difference H1-H2 of the dimensional change rate H1 of the pattern forming part and the dimensional change rate H2 of the pattern opening part in the heat treatment step is preferably less than 0.03%.
    Type: Grant
    Filed: August 24, 2012
    Date of Patent: October 29, 2013
    Assignee: Nitto Denko Corporation
    Inventors: Mari Tanabe, Hidehiko Andou, Hideo Sugawara
  • Publication number: 20130048597
    Abstract: A method of manufacturing a transparent conductive film has the steps of: preparing a laminated body in which a transparent conductive layer that is not patterned is formed on a flexible transparent base, removing a part of the transparent conductive layer to form the pattern forming part having the transparent conductive layer on the flexible transparent base and the pattern opening part not having the transparent conductive layer on the flexible transparent base, and heating the laminated body in which the transparent conductive layer is patterned. The absolute value of the difference H1-H2 of the dimensional change rate H1 of the pattern forming part and the dimensional change rate H2 of the pattern opening part in the heat treatment step is preferably less than 0.03%.
    Type: Application
    Filed: August 24, 2012
    Publication date: February 28, 2013
    Applicant: NITTO DENKO CORPORATION
    Inventors: Mari Tanabe, Hidehiko Andou, Hideo Sugawara