Abstract: A patternable material can be prepared with an elastomeric relief image-forming layer. The patternable material has a relief image-forming elastomeric layer and also has a layer disposed on the entire surface of this elastomeric layer. This layer includes a reaction product of a non-fluorinated metal oxide precursor and a hydrolyzable fluoroalkylsilane. The reaction product is formed by applying a reactive composition of the noted components over the entire surface.

Abstract: A patterned material can be prepared from a patterned material precursor having an elastomeric relief image-forming layer. The formed relief image comprises uppermost surfaces and relief recesses such as recess walls and recess floors. The patterned material also has a layer disposed on either a portion or the entire surface of the relief image in the elastomeric layer. This layer includes a reaction product of a non-fluorinated metal oxide precursor and a hydrolyzable fluoroalkylsilane. The reaction product is formed by applying a reactive composition of the noted components over the entire relief image in the patterned material precursor, following by drying and curing.