Patents by Inventor Maria Eugenia Cifuentes-Pagano

Maria Eugenia Cifuentes-Pagano has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Tetrahydroisoquinolines as selective NADPH oxidase 2 inhibitors
    Patent number: 10906876
    Abstract: Embodiments of bridged tetrahydroisoquinolines and methods for their use in selectively inhibiting nicotinamide adenine dinucleotide phosphate (NADPH) oxidase 2 are disclosed. The disclosed compounds have a structure according to general formula I or a pharmaceutically acceptable salt thereof: wherein “” represents a single or double bond, R1 is hydrogen, halogen, lower aliphatic, substituted or unsubstituted aryl, or substituted or unsubstituted heteroaryl; Ra is hydrogen, —CH2R2, R3, or —SO2R4; R2 is lower aliphatic, substituted or unsubstituted aryl, or substituted or unsubstituted heteroaryl; R3 is substituted or unsubstituted aryl, or substituted or unsubstituted heteroaryl; R4 is lower aliphatic, or substituted or unsubstituted aryl; and R5 is hydrogen, halogen, or lower aliphatic.
    Type: Grant
    Filed: June 18, 2019
    Date of Patent: February 2, 2021
    Assignee: University of Pittsburgh—of the Commonwealth System of Higher Education
    Inventors: Patrick Joseph Pagano, Peter Wipf, Maria Eugenia Cifuentes-Pagano, Erin M. Skoda
  • TETRAHYDROISOQUINOLINES AS SELECTIVE NADPH OXIDASE 2 INHIBITORS
    Publication number: 20200140387
    Abstract: Embodiments of bridged tetrahydroisoquinolines and methods for their use in selectively inhibiting nicotinamide adenine dinucleotide phosphate (NADPH) oxidase 2 are disclosed. The disclosed compounds have a structure according to general formula I or a pharmaceutically acceptable salt thereof: wherein “” represents a single or double bond, R1 is hydrogen, halogen, lower aliphatic, substituted or unsubstituted aryl, or substituted or unsubstituted heteroaryl; Ra is hydrogen, —CH2R2, R3, or —SO2R4; R2 is lower aliphatic, substituted or unsubstituted aryl, or substituted or unsubstituted heteroaryl; R3 is substituted or unsubstituted aryl, or substituted or unsubstituted heteroaryl; R4 is lower aliphatic, or substituted or unsubstituted aryl; and R5 is hydrogen, halogen, or lower aliphatic.
    Type: Application
    Filed: June 18, 2019
    Publication date: May 7, 2020
    Applicant: University of Pittsburgh - Of the Commonwealth System of Higher Education
    Inventors: Patrick Joseph Pagano, Peter Wipf, Maria Eugenia Cifuentes-Pagano, Erin M. Skoda