Patents by Inventor Maria Isabel DE LA FUENTE VALENTIN
Maria Isabel DE LA FUENTE VALENTIN has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 11947269Abstract: A method including: obtaining a detected representation of radiation redirected by each of a plurality of structures from a substrate additionally having a device pattern thereon, wherein each structure has an intentional different physical configuration of the respective structure than the respective nominal physical configuration of the respective structure, wherein each structure has geometric symmetry at the respective nominal physical configuration, wherein the intentional different physical configuration of the structure causes an asymmetric optical characteristic distribution and wherein a patterning process parameter measures change in the physical configuration; and determining a value, based on the detected representations and based on the intentional different physical configurations, to setup, monitor or correct a measurement recipe for determining the patterning process parameter.Type: GrantFiled: October 8, 2021Date of Patent: April 2, 2024Assignee: ASML NETHERLANDS B.V.Inventors: Anagnostis Tsiatmas, Paul Christiaan Hinnen, Elliott Gerard McNamara, Thomas Theeuwes, Maria Isabel De La Fuente Valentin, Mir Homayoun Shahrjerdy, Arie Jeffrey Den Boef, Shu-jin Wang
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Patent number: 11710668Abstract: A metrology target includes: a first structure arranged to be created by a first patterning process; and a second structure arranged to be created by a second patterning process, wherein the first structure and/or second structure is not used to create a functional aspect of a device pattern, and wherein the first and second structures together form one or more instances of a unit cell, the unit cell having geometric symmetry at a nominal physical configuration and wherein the unit cell has a feature that causes, at a different physical configuration than the nominal physical configuration due to a relative shift in pattern placement in the first patterning process, the second patterning process and/or another patterning process, an asymmetry in the unit cell.Type: GrantFiled: October 16, 2020Date of Patent: July 25, 2023Assignee: ASML NETHERLANDS B.V.Inventors: Adriaan Johan Van Leest, Anagnostis Tsiatmas, Paul Christiaan Hinnen, Elliott Gerard McNamara, Alok Verma, Thomas Theeuwes, Hugo Augustinus Joseph Cramer, Maria Isabel De La Fuente Valentin, Koen Van Witteveen, Martijn Maria Zaal, Shu-jin Wang
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Patent number: 11531274Abstract: A recipe selection method includes obtaining measurements from metrology targets, metrology targets positioned on a semiconductor substrate, obtaining measurements from in-device targets, in-device targets positioned on the semiconductor substrate, and determining a recipe for accurate metrology using both metrology target measurements and in-device metrology measurements.Type: GrantFiled: December 28, 2020Date of Patent: December 20, 2022Assignee: ASML NETHERLANDS B.V.Inventors: Mariya Vyacheslavivna Medvedyeva, Maria Isabel De La Fuente Valentin, Martijn Jongen, Giulio Bottegal, Thomai Zacharopoulou
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Patent number: 11506566Abstract: Methods for processing data from a metrology process and for obtaining calibration data are disclosed. In one arrangement, measurement data is obtained from a metrology process. The metrology process includes illuminating a target on a substrate with measurement radiation and detecting radiation redirected by the target. The measurement data includes at least a component of a detected pupil representation of an optical characteristic of the redirected radiation in a pupil plane. The method further includes analyzing the at least a component of the detected pupil representation to determine either or both of a position property and a focus property of a radiation spot of the measurement radiation relative to the target.Type: GrantFiled: December 10, 2018Date of Patent: November 22, 2022Assignee: ASML Netherlands B.V.Inventors: Mariya Vyacheslavivna Medvedyeva, Maria Isabel De La Fuente Valentin, Satej Subhash Khedekar, Bert Verstraeten, Bastiaan Onne Fagginer Auer
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Publication number: 20220066330Abstract: A method including: obtaining a detected representation of radiation redirected by each of a plurality of structures from a substrate additionally having a device pattern thereon, wherein each structure has an intentional different physical configuration of the respective structure than the respective nominal physical configuration of the respective structure, wherein each structure has geometric symmetry at the respective nominal physical configuration, wherein the intentional different physical configuration of the structure causes an asymmetric optical characteristic distribution and wherein a patterning process parameter measures change in the physical configuration; and determining a value, based on the detected representations and based on the intentional different physical configurations, to setup, monitor or correct a measurement recipe for determining the patterning process parameter.Type: ApplicationFiled: October 8, 2021Publication date: March 3, 2022Applicant: ASML NETHERLANDS B.V.Inventors: Anagnostis TSIATMAS, Paul Christiaan Hinnen, Elliott Gerard Mc Namara, Thomas Theeuwes, Maria Isabel De La Fuente Valentin, Mir Homayoun Shahrjerdy, Arie Jeffrey Den Boef, Shu-jin Wang
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Patent number: 11143972Abstract: A method including: obtaining a detected representation of radiation redirected by each of a plurality of structures from a substrate additionally having a device pattern thereon, wherein each structure has an intentional different physical configuration of the respective structure than the respective nominal physical configuration of the respective structure, wherein each structure has geometric symmetry at the respective nominal physical configuration, wherein the intentional different physical configuration of the structure causes an asymmetric optical characteristic distribution and wherein a patterning process parameter measures change in the physical configuration; and determining a value, based on the detected representations and based on the intentional different physical configurations, to setup, monitor or correct a measurement recipe for determining the patterning process parameter.Type: GrantFiled: November 2, 2018Date of Patent: October 12, 2021Assignee: ASML Netherlands B.V.Inventors: Anagnostis Tsiatmas, Paul Christiaan Hinnen, Elliott Gerard McNamara, Thomas Theeuwes, Maria Isabel De La Fuente Valentin, Mir Homayoun Shahrjerdy, Arie Jeffrey Den Boef, Shu-jin Wang
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Publication number: 20210191280Abstract: A recipe selection method includes obtaining measurements from metrology targets, metrology targets positioned on a semiconductor substrate, obtaining measurements from in-device targets, in-device targets positioned on the semiconductor substrate, and determining a recipe for accurate metrology using both metrology target measurements and in-device metrology measurements.Type: ApplicationFiled: December 28, 2020Publication date: June 24, 2021Applicant: ASML NETHERLANDS B.V.Inventors: Mariya Vyacheslavivna Medvedyeva, Maria Isabel De La Fuente Valentin, Martijn Jongen, Giulio Bottegal, Thomai Zacharopoulou
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Publication number: 20210035871Abstract: A metrology target includes: a first structure arranged to be created by a first patterning process; and a second structure arranged to be created by a second patterning process, wherein the first structure and/or second structure is not used to create a functional aspect of a device pattern, and wherein the first and second structures together form one or more instances of a unit cell, the unit cell having geometric symmetry at a nominal physical configuration and wherein the unit cell has a feature that causes, at a different physical configuration than the nominal physical configuration due to a relative shift in pattern placement in the first patterning process, the second patterning process and/or another patterning process, an asymmetry in the unit cell.Type: ApplicationFiled: October 16, 2020Publication date: February 4, 2021Applicant: ASML NETHERLANDS B.V.Inventors: Adriaan Johan VAN LEEST, Anagnostis TSIATMAS, Paul Christiaan HINNEN, Elliott Gerard Mc NAMARA, Alok VERMA, Thomas THEEUWES, Hugo Augustinus Joseph CRAMER, Maria Isabel DE LA FUENTE VALENTIN, Koen VAN WITTEVEEN, Martijn Maria ZAAL, Shu-jin WANG
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Patent number: 10811323Abstract: A metrology target includes: a first structure arranged to be created by a first patterning process; and a second structure arranged to be created by a second patterning process, wherein the first structure and/or second structure is not used to create a functional aspect of a device pattern, and wherein the first and second structures together form one or more instances of a unit cell, the unit cell having geometric symmetry at a nominal physical configuration and wherein the unit cell has a feature that causes, at a different physical configuration than the nominal physical configuration due to a relative shift in pattern placement in the first patterning process, the second patterning process and/or another patterning process, an asymmetry in the unit cell.Type: GrantFiled: February 28, 2017Date of Patent: October 20, 2020Assignee: ASML Netherlands B.V.Inventors: Adriaan Johan Van Leest, Anagnostis Tsiatmas, Paul Christiaan Hinnen, Elliott Gerard McNamara, Alok Verma, Thomas Theeuwes, Hugo Augustinus Joseph Cramer, Maria Isabel De La Fuente Valentin, Koen Van Witteveen, Martijn Maria Zaal, Shu-jin Wang
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Publication number: 20190204180Abstract: Methods for processing data from a metrology process and for obtaining calibration data are disclosed. In one arrangement, measurement data is obtained from a metrology process. The metrology process includes illuminating a target on a substrate with measurement radiation and detecting radiation redirected by the target. The measurement data includes at least a component of a detected pupil representation of an optical characteristic of the redirected radiation in a pupil plane. The method further includes analyzing the at least a component of the detected pupil representation to determine either or both of a position property and a focus property of a radiation spot of the measurement radiation relative to the target.Type: ApplicationFiled: December 10, 2018Publication date: July 4, 2019Applicant: ASML NETHERLANDS B.V.Inventors: Mariya Vyacheslavivna MEDVEDYEVA, Maria Isabel DE LA FUENTE VALENTIN, Satej Subhash KHEDEKAR, Bert VERSTRAETEN, Bastiaan Onne FAGGINGER AUER
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Publication number: 20190155173Abstract: A method including: obtaining a detected representation of radiation redirected by each of a plurality of structures from a substrate additionally having a device pattern thereon, wherein each structure has an intentional different physical configuration of the respective structure than the respective nominal physical configuration of the respective structure, wherein each structure has geometric symmetry at the respective nominal physical configuration, wherein the intentional different physical configuration of the structure causes an asymmetric optical characteristic distribution and wherein a patterning process parameter measures change in the physical configuration; and determining a value, based on the detected representations and based on the intentional different physical configurations, to setup, monitor or correct a measurement recipe for determining the patterning process parameter.Type: ApplicationFiled: November 2, 2018Publication date: May 23, 2019Applicant: ASML Netherlands B.V.Inventors: Anagnostis Tsiatmas, Paul Christiaan Hinnen, Elliott Gerard Mc Namara, Thomas Theeuwes, Maria Isabel De La Fuente Valentin, Mir Homayoun Shahrjerdy, Arie Jeffrey Den Boef, Shu-jin Wang
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Publication number: 20170255112Abstract: A metrology target includes: a first structure arranged to be created by a first patterning process; and a second structure arranged to be created by a second patterning process, wherein the first structure and/or second structure is not used to create a functional aspect of a device pattern, and wherein the first and second structures together form one or more instances of a unit cell, the unit cell having geometric symmetry at a nominal physical configuration and wherein the unit cell has a feature that causes, at a different physical configuration than the nominal physical configuration due to a relative shift in pattern placement in the first patterning process, the second patterning process and/or another patterning process, an asymmetry in the unit cell.Type: ApplicationFiled: February 28, 2017Publication date: September 7, 2017Applicant: ASML NETHERLANDS B.V.Inventors: Adriaan Johan VAN LEEST, Anagnostis TSIATMAS, Paul Christiaan HINNEN, Elliott Gerard McNAMARA, Alok VERMA, Thomas THEEUWES, Hugo Augustinus Joseph CRAMER, Maria Isabel DE LA FUENTE VALENTIN, Koen VAN WITTEVEEN, Martijn Maria ZAAL, Shu-jin WANG