Patents by Inventor Maria O. DeBeeck

Maria O. DeBeeck has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Photomask and pattern transfer method for transferring a pattern onto a substrate having different levels
    Patent number: 5384218
    Abstract: A photomask for projecting a transfer pattern onto a wafer having a plurality of regions with different surface levels includes a transparent substrate; a shielding member on the transparent substrate having a plurality of patterns for projection onto respective regions of the wafer; and an optical-path-length varying layer on at least one of the patterns corresponding to a region of the wafer other than a reference region of the wafer for changing the optical path length of light transmitted through the pattern by a length corresponding to the difference in surface level between the corresponding region and the reference region of the wafer.
    Type: Grant
    Filed: March 26, 1993
    Date of Patent: January 24, 1995
    Assignee: Mitsubishi Denki Kabushiki Kaisha
    Inventors: Akira Tokui, Maria O. DeBeeck