Patents by Inventor Maria Reuhman-Huisken

Maria Reuhman-Huisken has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • System and method of monitoring and diagnosing system condition and performance
    Publication number: 20070002295
    Abstract: The invention is directed to a system and method of monitoring and/or diagnosing tool performance in real-time for system degradation. The invention issues alerts and provides a structured process for identifying the source of the problem and enabling action to be taken before defects are detected on the final product. The invention provides a hierarchical data structure including elements that are monitored based on key performance indicators and diagnostic data sets.
    Type: Application
    Filed: June 30, 2005
    Publication date: January 4, 2007
    Applicant: ASML Netherlands B.V.
    Inventors: Maria Reuhman-Huisken, Leon Levasier, Tasja Van Rhee, Rosaria Salpietro, Erik Schoemaker, Eric Jacqmin, Martin Prins, Marcel Nicolaas Van Kervinck, Timotheus Bootsma
  • Lithographic apparatus and device manufacturing method
    Publication number: 20060033898
    Abstract: A lithographic apparatus is disclosed having a liquid supply system configured to at least partly fill a space between a projection system of the lithographic apparatus and a substrate with liquid, a barrier member arranged to substantially contain the liquid within the space, and one or more elements to control and/or compensate for evaporation of liquid from the substrate.
    Type: Application
    Filed: August 17, 2005
    Publication date: February 16, 2006
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Theodorus Cadee, Johannes Jacobs, Nicolaas Kate, Erik Loopstra, Aschwin Lodewijk Vermeer, Jeroen Maria Mertens, Christianus De Mol, Marcel Hubertus Muitjens, Antonius Van Der Net, Joost Ottens, Johannes Quaedackers, Maria Reuhman-Huisken, Marco Stavenga, Patricius Tinnemans, Martinus Verhagen, Jacobus Johannus Hendricus Verspay, Frederik De Jong, Koen Goorman, Boris Menchtchikov, Herman Boom, Stoyan Nihtianov, Richard Moerman, Martin Smeets, Bart Schoondermark, Franciscus Janssen, Michel Riepen
  • Method of characterization, method of characterizing a process operation, and device manufacturing method
    Publication number: 20050031975
    Abstract: A system in which deformation of a substrate wafer is monitored during processing of the wafer is disclosed. In one embodiment, the distortion in the substrate wafer is measured after each exposure and processing operation by comparing the position of a plurality of reference marks to values in a database.
    Type: Application
    Filed: May 13, 2004
    Publication date: February 10, 2005
    Applicant: ASML Netherlands B. V.
    Inventors: Maria Reuhman-Huisken, Christianus De Mol, Hoite Tolsma